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Conductive SU8 Photoresist for Microfabrication |
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| Authors: | S. Jiguet A. Bertsch H. Hofmann P. Renaud |
| Abstract: | A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non‐conductive, negative‐tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.‐%. |
| Keywords: | Composite materials Electronics Nanocomposites Nanoparticles, metal Silver |