Nanoporous Ultra‐Low‐Dielectric‐Constant Fluoropolymer Films via Selective UV Decomposition of Poly(pentafluorostyrene)‐block‐Poly(methyl methacrylate) Copolymers Prepared Using Atom Transfer Radical Polymerization

Block copolymers of poly(pentafluorostyrene) (PFS) and poly(methyl methacrylate) (PMMA) (PFS‐b‐PMMA) have been synthesized using atom transfer radical polymerization (ATRP). Then, nanoporous fluoropolymer films have been prepared via selective UV decomposition of the PMMA blocks in the PFS‐b‐PMMA copolymer films. The chemical composition and structure of the PFS homopolymers and copolymers have been characterized using nuclear magnetic resonance (NMR) spectroscopy, thermogravimetric analysis (TGA), X‐ray photoelectron spectroscopy (XPS), time‐of‐flight secondary‐ion mass spectrometry (ToF‐SIMS), and molecular‐weight measurements. The cross‐sectional and surface morphologies of the PFS‐b‐PMMA copolymer films before and after selective UV decomposition of the PMMA blocks have been studied using field‐emission scanning electron microscopy (FESEM). The nanoporous fluoropolymer films with pore sizes in the range 30–50 nm and porosity in the range 15–40 % have been obtained from the PFS‐b‐PMMA copolymers of different PMMA content. Dielectric constants approaching 1.8 have been achieved in the nanoporous fluoropolymer films which contain almost completely decomposed PMMA blocks.