Cover Picture: Lithography‐Free,Self‐Aligned Inkjet Printing with Sub‐Hundred‐Nanometer Resolution (Adv. Mater. 8/2005)

The inherently low resolution of inkjet printing on unpatterned surfaces can be overcome by selective surface modification of a first printed pattern, resulting in hydrophobic repulsion of subsequently deposited aqueous polymer dispersions. This technique, reported by Sirringhaus and co‐workers on p. 997, is capable of achieving sub‐100 nm resolution without any lithographic step. The cover shows an array of polymer transistors patterned with this method on three different length scales, as well as a schematic of the process.