| Abstract: | Glow discharge polymerizations of tetramethoxysilane (TMOS), tetramethylsilane/oxygen mixture (½ molar ratio) (TMS/O2), hexamethyldisiloxane (HMDSO), and tetramethyldisiloxane (TMDSO) were carried out for the preparation of thin, polymeric films with siloxane structures. The chemical composition of the formed polymers was examined by elemental analysis, infrared spectroscopy, and electron spectroscopy for chemical analysis (ESCA) in connection with polymerization conditions, especially, a level of the radiofrequency (rf) input power per mass of the monomers (W/FM value). The polymers prepared from HMDSO at fairly low W/FM values resembled in chemical composition the conventionally polymerized polydimethylsiloxane. The surface properties of the formed polymers also were evaluated by the measurement of surface energy. |
