硅基底自组装双层膜制备与摩擦磨损性能研究

用自组装方法在羟基化硅基底表面制备十八胺／环氧硅烷双层膜，采用接触角测定仪、椭圆偏光仪、红外光谱仪、原子力显微镜、X射线光电子能谱（XPS）和UMT-2MT型摩擦试验机，评价了薄膜结构和摩擦磨损特性。结果表明：自组装双层膜对水的接触角为100°，膜厚3．2nm，双层膜中烷基链呈现较好的有序性；其表面均方根粗糙度为0．241nm；分子内存在C—N化学键，分子间存在氢键；十八胺／环氧硅烷自组装双层膜能够有效把基底的摩擦系数从0．6降低到0．08，0．5N载荷下，摩擦系数随速度增加而增加，在0．5N、1．5N和3N载荷下，耐磨寿命分别为17800个循环以上，2400个循环和1600个循环，呈现良好的耐磨性。

Preparation and Tribological Behavior of a Self-assembled Dual Layer Film on Silicon

A self - assembled dual layer film was successfully prepared on single - crystal siliconsubstrate by chemical adsorption of Octadecylamine （OTA） molecules on self - assembled monolayer of （ 3 - glycidoxypropyl） trimethoxysi- lane（GPS） with terminal epoxy group. The structure and morphology of the film were characterized by means of contact - angle measurement, ellipsometric thickness measurement, fourier transformation infrared spectrometric analysis, atomic force microscopic analysis and X - ray photoelectron spectroscopy. The tribological properties of the dual layer film were also investigated. As the results, the dual layer OTA - GPS film was hydrophobic with the contact angle for water to be 100℃ and the overall thickness about 3.2nm. The FT - IR spectra indicated that the dual layer film has local order structure. Atomic force microscopic image showed that the dual layer film was relatively smooth and homogeneous with RMS of 0.241nm. The reaction of OTA with GPS via the formation of C - N functional groups and the interchain hydrogen bond were verified by XPS. The dual layer film could greatly reduce friction coefficient and possess better load - carrying capacity and antiwear ability.