| 分立器件连续高速选择氨基磺酸盐镀镍工艺 |
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| 引用本文： | 许金围.分立器件连续高速选择氨基磺酸盐镀镍工艺[J].电镀与涂饰,2001,20(5):31-33. |
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| 作者姓名： | 许金围 |
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| 作者单位： | 厦门永红电子有限公司表面处理部, |
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| 摘 要： | 介绍了用于分立器件的氨基磺酸盐镀镍工艺。探讨了添加剂和工艺条件对镍镀层性能的影响。提出了镀镍液的维护及镀液中杂质的去除。
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| 关 键 词： | 镀镍 氨基磺酸盐 分立器件 连续高速 选择镀镍 |
| 文章编号： | 1001-227X(2001)05-0031-03 |
Continuous, high speed and selective nickel plating on discrete parts in aminosulfonate bath |
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| XU Jin-wei.Continuous, high speed and selective nickel plating on discrete parts in aminosulfonate bath[J].Electroplating & Finishing,2001,20(5):31-33. |
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| Authors: | XU Jin-wei |
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| Abstract: | Formula of Aminosulfonate nickel plating on discrete parts was described. The effect of additives and plating parameters on properties of nickel deposits was studied. Bath maintenance and the removal of impurities were discussed. |
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| Keywords: | nickel plating aminosulfonate discrete part continuous high speed |
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