Significantly improved dielectric properties of TiO2 ceramics through acceptor-doping and Ar/H2 annealing

The acceptor-doped rutile TiO₂ ceramics, x mol% M₂O₃-(1-x) mol% TiO₂ (M = Al³⁺, Ga³⁺, and In³⁺), were prepared by solid state reaction method. The influence of Ar/H₂ annealing on the structural and dielectric properties of the ceramics were systematically investigated. Our results reveal that the dielectric properties of the ceramics can be significantly improved by the Ar/H₂ annealing. Ga³⁺ is found to be the most suitable dopant with the best doping level of 5 mol%. Excellent dielectric properties of colossal and flat dielectric permittivity (~1.2 × 10⁵ (@1 kHz and 25 °C), low dielectric loss (~0.1), and good frequency stability were achieved over the temperature range of -70–150 °C in the Ar/H₂-annealed 5 mol% Ga₂O₃-95 mol% TiO₂ ceramic. This approach of acceptor-doping and Ar/H₂ annealing leads to two thermally activated relaxations in the sample. The low-temperature relaxation is argued to be a Maxwell-Wagner relaxation caused by frozen electrons, while the high-temperature relaxation is a glass-transition-like relaxation associated with the freezing process of the electrons. This work highlights that engineering low-temperature Maxwell-Wagner relaxation paves a new way other than the frequently used acceptor-donor dual doping to design superior dielectric properties in the TiO₂ system.