| 水基清洗技术在彩管荫罩清洗中的应用 |
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| 引用本文： | 王建平,边辉,郭荒.水基清洗技术在彩管荫罩清洗中的应用[J].真空电子技术,2001(4):47-50. |
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| 作者姓名： | 王建平 边辉 郭荒 |
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| 作者单位： | 彩虹显示器件股份有限公司, |
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| 摘 要： | 本文结合生产实际，着重论述了将水基碱性清洗技术应用于成型荫罩的清洗工序，通过对工艺条件的摸索、对重大工艺不良采取了对策和对设备进行了必要的改造，最终达到了良好地清洗效果，从而结束了使用对臭氧层有破坏作用的三氯乙烷清洗荫罩的历史。
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| 关 键 词： | 清洗 水基碱性 三氯乙烷 彩管 荫罩 |
| 文章编号： | 1002-8935(2001)04-0047-04 |
| 修稿时间： | 2001年2月16日 |
The Application of Water Basis CleaningTechnology in the CPT Shadow Mask Cleaning |
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| WANG Jian-ping,BIAN Hui,GUO Huang.The Application of Water Basis CleaningTechnology in the CPT Shadow Mask Cleaning[J].Vacuum Electronics,2001(4):47-50. |
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| Authors: | WANG Jian-ping BIAN Hui GUO Huang |
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| Abstract: | Based on our experiences from production,this article emphatically dissertates the application of water basis alkalescence cleaning technology in the cleaning Procedure of molding mask.By investigating the technology conditions,exploring solutions to deal with production rejects and necessary rebuilding works of equipment,satisfied cleaning results have been obtained,that will bring the history of always using thichloroethane an ozonosphere destroying material to clean shadow mask to the end. |
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| Keywords: | Cleaning Water basis alkalescence Thichloroethane |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
