| 深紫外深度光刻蚀在LIGA工艺中的应用 |
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| 引用本文： | 余国彬,姚汉民,胡松,陈兴俊. 深紫外深度光刻蚀在LIGA工艺中的应用[J]. 微纳电子技术, 2002, 39(4): 30-32 |
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| 作者姓名： | 余国彬 姚汉民 胡松 陈兴俊 |
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| 作者单位： | 中国科学院光电技术研究所,四川,成都,610209 |
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| 摘 要： | 随着MEMS在各个领域的运用,人们也开始探讨低成本、操作方便的LIGA工艺。本文重点介绍了一种用于深紫外光深度光刻实验装置的设计,并将该实验装置成功地应用于LIGA工艺的深度光刻中,光刻实验结果表明深紫外光深度光刻具有很大的实用意义。
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| 关 键 词： | 微型机电系统 微细加工 LIGA工艺 深度光刻 |
| 文章编号： | 1671-4776(2002)04-0030-03 |
| 修稿时间： | 2001-11-19 |
Application of DUV deep lithography in LIGA process |
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| YU Guo-bin,YAO Han-min,HU Song,CHEN Xing-jun. Application of DUV deep lithography in LIGA process[J]. Micronanoelectronic Technology, 2002, 39(4): 30-32 |
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| Authors: | YU Guo-bin YAO Han-min HU Song CHEN Xing-jun |
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| Abstract: | LIGA process of low cost and convenience has been discussed along with the applica-tion of MEMS in many fields.In the paper DUV deep lithography apparatus is described.This ap-paratus is applied in deep lithography for LIGA process successfully.The lithography experiment result shows that DUV deep lithography is very practical to LIGA process. |
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| Keywords: | MEMS micro-fabrication LIGA process deep lithography |
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