| 30.4 nm Si/C多层膜反射镜的制备与测量 |
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| 引用本文： | 刘毅楠,马月英,裴舒. 30.4 nm Si/C多层膜反射镜的制备与测量[J]. 真空科学与技术学报, 2000, 20(6): 423-424 |
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| 作者姓名： | 刘毅楠 马月英 裴舒 |
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| 作者单位： | 中国科学院长春光学精密机械研究所应用光学国家重点实验室!长春130022，中国科学院长春光学精密机械研究所应用光学国家重点实验室!长春130022，中国科学院长春光学精密机械研究所应用光学国家重点实验室!长春130022，中国科学院长春光学精密机械研究所应用光学国家重点实验室!长 |
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| 摘 要： | 采用离子束溅射镀膜装置制备了一种新的材料组合Si/C多层膜 ,用于 30 4nm波段的正入射多层膜反射镜。并用软X射线反射率计测得其反射比最大值为 0 14。有效地抑制了 15 0nm处的二级衍射峰。
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| 关 键 词： | 软X射线多层膜 离子束溅射 二级衍射峰 |
| 修稿时间： | 2000-01-03 |
Fabrication of 30.4 nm Wavelength Reflection Mirror with Si/C Multi-layers |
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| Liu Yinan,Ma Yueying,Pei Shu,Ni Qiliang,Hu Weibing,Cao JianlinThe State Key Laboratory of Applied Optics,Changchun Institute of Optics and Fine Mechanics,Chinese Academy of Science,Changchun. Fabrication of 30.4 nm Wavelength Reflection Mirror with Si/C Multi-layers[J]. JOurnal of Vacuum Science and Technology, 2000, 20(6): 423-424 |
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| Authors: | Liu Yinan Ma Yueying Pei Shu Ni Qiliang Hu Weibing Cao JianlinThe State Key Laboratory of Applied Optics Changchun Institute of Optics Fine Mechanics Chinese Academy of Science Changchun |
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| Affiliation: | Liu Yinan,Ma Yueying,Pei Shu,Ni Qiliang,Hu Weibing,Cao JianlinThe State Key Laboratory of Applied Optics,Changchun Institute of Optics and Fine Mechanics,Chinese Academy of Science,Changchun,130022 |
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| Abstract: | A new type of Si/C multi layer has been successfully developed with ion beam sputtering technique to fabricate reflection mirror for normal incident X ray at the wavelength of 30.4 nm.The measured reflectance is 0.14 with the second order peak at 15.0 nm effectively suppressed. |
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| Keywords: | Soft X ray multi layer Ion beam sputtering Second order peak |
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