首页 | 本学科首页   官方微博 | 高级检索  
     

立式高真空MOCVD装置CaN外延生长与器件制备
引用本文:朱丽萍,叶志镇,赵炳辉,王贤锋,赵浙. 立式高真空MOCVD装置CaN外延生长与器件制备[J]. 真空科学与技术学报, 2004, 24(6): 448-450
作者姓名:朱丽萍  叶志镇  赵炳辉  王贤锋  赵浙
作者单位:浙江大学硅材料国家重点实验室,杭州,310027
基金项目:国家重点基础研究发展计划(973计划),教育部留学回国人员科研启动基金,国家自然科学基金
摘    要:自行设计了一套具有创新性的研究型立式高真空MOCVD装置,能够较好的调节反应气体的流动状态,从而在衬底上生长大面积均匀的外延层.利用该装置在蓝宝石和硅单晶衬底上成功地生长出高质量的GaN晶体薄膜.在蓝宝石衬底上生长出n、p型GaN以及多量子阱多层结构材料,并成功制备了GaN基多层量子阱结构的蓝光发光二极管,性能良好,具有实用价值.

关 键 词:MOCVD GaN 外延生长 多量子阱 发光二极管
文章编号:1672-7126(2004)06-0448-03
修稿时间:2004-02-16

Development of Vertical High-Vacuum MOCVD and Its Applications in GaN Epitaxial Growth and GaN-Based Device Fabrication
Zhu Liping,Ye Zhizhen,Zhao Binghui,Ni Xianfeng and Zhao Zhe. Development of Vertical High-Vacuum MOCVD and Its Applications in GaN Epitaxial Growth and GaN-Based Device Fabrication[J]. JOurnal of Vacuum Science and Technology, 2004, 24(6): 448-450
Authors:Zhu Liping  Ye Zhizhen  Zhao Binghui  Ni Xianfeng  Zhao Zhe
Affiliation:Zhu Liping*,Ye Zhizhen,Zhao Binghui,Ni Xianfeng and Zhao Zhe
Abstract:A novel type of vertical high-vacuum MOCVD system has been developed to grow hig hly uniform epitaxial films of fairly large area by precisely controlling the re active gases flow,on sapphire and silicon substrates,respectively.High quality,p -type and n-type GaN crystalling films as well as multi-layered material for qua ntum-well fabrication have been successfully grown on sapphire substrate.Moreove r,blue light emission diodes of GaN multi-layer,grown with the system,were also fabricated with satisfactory performance.
Keywords:MOCVD  GaN  Epitaxial growth  Multi quantum well  Light emitting diode
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号