| 化学机械抛光设备与市场 |
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| 引用本文： | 本刊编辑部. 化学机械抛光设备与市场[J]. 电子工业专用设备, 2004, 33(6): 10-12,25 |
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| 作者姓名： | 本刊编辑部 |
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| 摘 要： | 介绍了目前国外对应于90～65nmCMP设备开发现状及各公司的设备特点,给出了各公司代表性产品的技术性能和全球CMP设备市场概况。
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| 关 键 词： | CMP设备 技术性能 设备市场 |
CMP Equipment and Market |
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| EPE Editorial Office. CMP Equipment and Market[J]. Equipment for Electronic Products Marufacturing, 2004, 33(6): 10-12,25 |
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| Authors: | EPE Editorial Office |
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| Affiliation: | EPE Editorial Office |
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| Abstract: | This paper introduced the situation of CMP equipment and their characterization used for 90～65nm node. The advanced CMP equipment technological specificity and the worldwide market of CMP equipment was also recommended. |
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| Keywords: | CMP Equipment Technological Specificity Equipment Market |
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