| IC可制造性设计基础与统计最优化方法 |
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| 引用本文： | 郝跃.IC可制造性设计基础与统计最优化方法[J].西安电子科技大学学报,1993,20(1):25-31. |
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| 作者姓名： | 郝跃 |
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| 作者单位： | 西安电子科技大学微电子研究所 |
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| 摘 要： | 根据集成电路(IC)可制造性设计的概念,综合考虑电路制造的参数成品率极大,最优容差设计,调整设计和制造费用极小化问题,提出了建立在不可微规划框架上的统计最优化方法统一模型。该模型可包含目前确定性统计最优化的基本类型,为统计最优化的进一步发展开辟了新径。
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| 关 键 词： | 集成电路 优化设计 制造 设计 |
IC manufacturability design foundation and statistical optimization method |
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| Hao Yue.IC manufacturability design foundation and statistical optimization method[J].Journal of Xidian University,1993,20(1):25-31. |
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| Authors: | Hao Yue |
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| Abstract: | Based on the basic conception of IC manufacturability design, maximum parameter yield, optimal design tolerancing and tuning, as well as minimum manufacture cost are con- sidered during the IC manufacture and process. A unified DCTT model is proposed which is based on the frame of non-differentiable programming. The model can include the avail- able basic models of detcrministic statistical optimization, and open a new path for the fur- ther development of the statistical optimization method. |
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| Keywords: | IC optimal design manufacturability design statistical optimization |
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