| Abstract: | The preparation of photosensitive allyl resins is described. The introduction of cinnamoyl groups into allyl resins is attempted for imparting successfully photosensitive functionality. Thus, the photosensitivity of cinnamoylated poly(allyl benzoate) was first examined in detail as a model photoreaction of cinnamoylated allyl resins. Cinnamoylated poly(diallyl phthalate) was then UV-irradiated to yield crosslinked resin, and its photosensitivity was compared with that of other allyl resins. The highest photosensitivity was observed for cinnamoylated poly(diallyl phthalate), although the mobility of the main polymer chain was considered to be lowest; this may be ascribed to the function of phthaloyl groups as photosensitizers. |
