Deposition of ZnS thin films by photochemical deposition technique |
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Affiliation: | 1. Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan;2. DENSO CORP. Research Laboratories, Komenoki, Nissin, Aichi 470-0111, Japan |
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Abstract: | ZnS thin films have been deposited on a glass substrate by photochemical deposition (PCD) technique from an aqueous solution. The effect of pH and stirring speed of the solution on deposition has been studied. The optical transmission spectra of the solutions have been recorded before and after deposition and also for the deposited film. The as-deposited and annealed films were characterized by X-ray diffraction (XRD) and it is observed that the crystallinity of the deposited films is improved by annealing at various temperature from 100 to 500 °C. The surface coverage of the film has been studied using optical microscope. |
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