Temperature dependence of hydrogenated amorphous silicon thin-film transistors |
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Authors: | Bor -Yir Chen Wei -Hsiung Wu Jiann -Ruey Chen Chum -Sam Hong |
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Affiliation: | (1) Department of Materials Science and Engineering, National Tsing Hua University, 30043 Hsinchu, Taiwan;(2) Materials Research Laboratories, Industrial Technology Research Institute, 31015 Hsinchu, Taiwan |
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Abstract: | The temperature dependence characteristics of hydrogenated amorphous silicon thin-film transistors were investigated. The results indicate that as the temperature was increased, the threshold voltage and the field-effect mobility were first increased, and then decreased, which may be controlled by different mechanisms at low and high temperatures. In addition, if the temperature was higher than 420 K, the Fermi level was promoted to the degenerate-like states, the current channel always existed due to the temperature effect, and the threshold voltage became negative. |
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