韦春贝,欧文敏,侯惠君,林松盛,代明江,石倩.磁控溅射MoS2-Ni复合膜的结构与性能研究[J].表面技术,2017,46(10):135-142. WEI Chun-bei,OU Wen-min,HOU Hui-jun,LIN Song-sheng,DAI Ming-jiang,SHI Qin.Structure and Properties of MoS2-Ni Composite Films Fabricated by Magnetron Sputtering Method[J].Surface Technology,2017,46(10):135-142 |
磁控溅射MoS2-Ni复合膜的结构与性能研究 |
Structure and Properties of MoS2-Ni Composite Films Fabricated by Magnetron Sputtering Method |
投稿时间:2017-03-30 修订日期:2017-10-20 |
DOI:10.16490/j.cnki.issn.1001-3660.2017.10.019 |
中文关键词: 离子源复合磁控溅射 Ni 掺杂 复合膜 硬度 结合力 摩擦磨损 |
英文关键词:magnetron sputtering method combined with ion source Ni doping composite films hardness adhesion frictional wear |
基金项目:广州市科技计划项目(201510010016);广东省科技项目(2014B070706026);广东省省院平台建设项目(2016GDASPT-0206,2016GDASPT-0317) |
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Author | Institution |
WEI Chun-bei | National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
OU Wen-min | National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
HOU Hui-jun | National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
LIN Song-sheng | National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
DAI Ming-jiang | National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
SHI Qin | National Engineering Laboratory for Modern Materials Surface Engineering Technology, the Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
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中文摘要: |
目的 提高MoS2薄膜在大气环境下的摩擦学性能。方法 采用离子源复合磁控溅射技术制备了MoS2-Ni复合膜,通过改变Ni靶功率获得不同Ni掺杂量的复合膜,研究不同Ni掺杂量对复合膜结构及摩擦学性能的影响。采用扫描电镜(SEM)、X射线衍射仪(XRD)、显微硬度计、洛氏硬度计、球-盘式摩擦磨损试验机以及3D轮廓仪,对复合膜显微结构和性能进行研究。结果 复合膜以柱状晶结构生长,增加Ni含量可以细化晶粒,使复合膜的结构更加致密。复合膜硬度在250~446HV之间,且随Ni含量的增加,复合膜的硬度提高。复合膜具有良好的膜/基结合力,结合力达到HF1级。MoS2-Ni复合膜的摩擦系数在0.10~0.23之间,随Ni含量的增加,虽然复合膜的摩擦系数增加,但由于磨损过程形成稳定的转移膜粘着在对磨球表面,因而使得磨损率降低,耐磨寿命提高。结论 Ni掺杂可以提高复合膜的致密度、硬度以及结合力,增强复合膜的耐磨性能。 |
英文摘要: |
The work aims to improve tribological properties of MoS2 film in atmosphere. MoS2-Ni composite films were fabricated in magnetron sputtering method combined with ion source. Composite films with different Ni doping contents were obtained by changing Ni target power. The effects of Ni doping content on structure and tribological properties of the composite films were studied. Microstructure and properties of the composite films were studied by using scanning electron microscope (SEM), X-ray diffractometer (XRD), microhardness tester, Rockwell hardness tester, ball-on-disc wear tester and 3D profiler. The composite films exhibited columnar crystal structure. Grains were refined and the structure was compacted as the Ni content increased. Hardness of the composite films ranged between 250~446HV and it increased as the Ni content increased. The composite films exhibited good film/substrate binding force, which might reach grade HF1. Friction coefficient of the MoS2-Ni composite films ranged between 0.10~0.23. As the Ni content increased, the wear rate reduced and friction durability increased as stable transfer film formed and stuck to the grinding ball though the friction coefficient increased. Ni doping can improve density of composite films, thus enhancing hardness, adhesion and wear resistance of the composite films. |
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