氧化锌薄膜的阴极电沉积法制备及性能

以硝酸锌溶液为沉积液,采用阴极电沉积技术在ITO导电玻璃基片上制备ZnO薄膜．分析了Zn（NO3）2体系ZnO的电化学沉积机理及反应过程,考察了沉积电位和Zn（NO3）2浓度对沉积过程、薄膜结构及其性能的影响结果表明：沉积电位和Zn（NO3）2浓度对薄膜形貌都有着显著的影响,沉积速率随沉积电位和Zn（NO3）2浓度的增加而增大;当沉积电位和Zn（NO3）2浓度较小时,薄膜粒径小,透光性相对较高．     

ECR-PECVD制备纳米硅颗粒薄膜

为消除紫外线对硅基薄膜太阳能电池的热损害,并进一步提高电池转换效率,提出在硅基薄膜太阳能电池顶部低温下制备一薄层纳米硅薄膜.在P型(100)硅片上采用电子回旋共振微波等离子体增强化学气相沉积(ECR-PECVD)技术交替沉积SiO2/Si/SiO2层,改变衬底温度和H2流量沉积纳米硅薄膜,探讨低温下直接制备纳米硅薄膜的...     

CdS/Cu2O太阳能电池的制备及膜厚对光电性能的影响

采用水浴法和电沉积法制备CdS/Cu2O复合膜,组装成异质结薄膜太阳能电池。通过改变薄膜的厚度,测试了不同厚度的窗口层和吸收层对太阳能电池性能的影响。实验表明,在400 nm厚的CdS薄膜上沉积30次Cu2O薄膜,所获得的复合膜具有最大的填充因子FF(为0.42)和光电转换效率η(0.05%)。并通过实验发现,适当减少CdS窗口层的厚度,可以提高光的透射率,产生更多的光生载流子,提高了光电转换效率。适当增加Cu2O吸收层的厚度,可以提高光的吸收率,产生更多的光生载流子,提高了光电转换效率。     

太阳电池中CdTe多晶薄膜沉积制备及其性能

在氩氧混合气氛下近空间升华技术(CSS)制备CdTe多晶薄膜中，薄膜的结构、性质决定于整个沉积过程深入研究沉积过程中的热交换、物质输运，有助于制备薄而致密的具有进行良好光电性质CdTe薄膜．通过分析近空间沉积的物理机制，测量近空间沉积装置内温度分布，对升温过程、气压与薄膜初期成核的关系进行讨论。研究结果表明，不同气压下制备的样品，均有立方相CdTe，此外，还有CdS和SnO2：F衍射峰，CdTe晶粒随气压增加有减小趋势；随气压的增加．透过率呈下降趋势，相应的CdTe吸收边向短波方向移动。在此基础上制备出转换效率优良的结构为SnO2：F／CdS／CdTe／Au的串联集成电池。     

金属有机沉积法制备SrTiO3薄膜

采用金属有机沉积（MOD）法制备了SrTiO3（STO）外延薄膜作为YBa2Cu3O7-δ涂层导体的缓冲层.以乙酸锶、钛酸丁酯为前驱物配制了Sr离子浓度为0.125 mol.L-1的SrTiO3前驱溶液.研究了950℃下不同烧结时间（90、120、150 min）对在双轴织构的Ni-W（200）金属基带上沉积STO外延薄膜晶体取向和微观形貌的影响.结果表明,在950℃氩氢混合气氛（Ar-4%H2）下适宜于STO薄膜外延生长的最佳烧结时间为120 min;STO缓冲层薄膜表面平整致密,无裂纹和孔洞,具有良好取向,可作为YBa2Cu3O7-δ涂层导体的缓冲层.     

恒电位法制备不同织构氧化亚铜薄膜工艺的研究

本文采用恒电位法探索了CuSO4和乳酸溶液在摩尔比为1：3的条件下络合,以三电极体系在导电玻璃上沉积C u2 O薄膜的最佳工艺条件。通过分析C u2＋与络合剂乳酸在不同的溶液温度,沉积电位、以及溶液pH的条件下络合,来确定其对Cu2 O薄膜的影响。采用X －射线衍射分析和扫描电子显微镜对薄膜样品结构和形貌进行表征。结果表明,在Cu2＋与乳酸的摩尔比为1：3,溶液温度为65℃～75℃,沉积电位为－1．2V～－2．8V ,溶液的 pH＝10～12的条件下,得到（111）择优取向生长的 Cu2 O 薄膜,呈砖红色,致密均匀。C u2 O膜（200）择优取向生长的参数范围是：溶液温度65℃,沉积电位－1．2 V ,p H＝7～9。     

双溶液法制备钙钛矿薄膜及其太阳能电池性能

在高湿度空气环境中,通过不同质量浓度的碘甲胺溶液与PbI_2薄膜反应制备钙钛矿薄膜与电池器件,研究碘甲胺质量浓度对薄膜形貌和太阳能电池性能的影响机理,发现高浓度碘甲胺溶液有利于纳米晶粒的致密薄膜生成,而低浓度碘甲胺溶液则形成带孔的微米晶粒薄膜,均不利于制备高性能钙钛矿电池.为克服单一溶液反应存在的问题,在改进的双溶液旋涂法中,利用8 mg/m L低浓度的碘甲胺溶液与PbI_2薄膜反应10 s,再分别用15和30 mg/m L碘甲胺溶液对薄膜后处理,获得了晶粒粒径大,且致密的钙钛矿薄膜,碘化铅残留很少.相应的,在空气中制备的钙钛矿太阳能电池展示了更好的光电转化性能.     

聚苯胺电致变色薄膜的制备及性能

以苯胺单体为原料,采用电化学沉积法在玻璃衬底FTO导电薄膜上合成聚苯胺电致变色薄膜．采用恒电流法,研究苯胺单体浓度、酸的种类、电沉积时间、电流密度等对薄膜制备及电致变色性能的影响,确定合成聚苯胺薄膜的最佳条件．结果表明,聚苯胺电致变化薄膜的最佳制备条件是0．15mol／L苯胺单体的1mol／L硫酸溶液,以10．A／cm^2的电流密度电沉积40min．该条件下制备的薄膜的着色效率较无机电致变色薄膜高,但仅能循环105次．     

pH值和热处理对氧化亚铜薄膜结构和光学性能的影响

在三电极电化学池中,以ITO透明导电玻璃作为工作电极,在硫酸铜-乳酸钠体系中采用恒电位电化学沉积法制备Cu2O薄膜,并讨论pH值和热处理对Cu2O薄膜结构和光学性能的影响。利用X射线衍射仪（XRD）,场发射扫描电镜（FESEM）和紫外-可见光光谱仪（UV-vis）表征Cu2O薄膜物相结构、表面形貌以及光学性能。结果表明：沉积溶液的pH值和热处理均可提高Cu2O薄膜结晶性能,随着pH值的增加Cu2O薄膜的禁带宽度降低,热处理对Cu2O薄膜的禁带宽度影响不大。     

pH值和热处理对氧化亚铜薄膜结构和光学性能的影响

在三电极电化学池中,以ITO透明导电玻璃作为工作电极,在硫酸铜-乳酸钠体系中采用恒电位电化学沉积法制备Cu2O薄膜,并讨论pH值和热处理对Cu2O薄膜结构和光学性能的影响。利用X射线衍射仪(XRD),场发射扫描电镜(FESEM)和紫外-可见光光谱仪(UV-vis)表征Cu2O薄膜物相结构、表面形貌以及光学性能。结果表明:沉积溶液的pH值和热处理均可提高Cu2O薄膜结晶性能,随着pH值的增加Cu2O薄膜的禁带宽度降低,热处理对Cu2O薄膜的禁带宽度影响不大。     

Deposition methods and properties of polycrystalline CdS thin films

CdS thin film was used as a suitable window layer for CdS/CdTe solar cell, and the properties of CdS thin films deposited by pulsed laser deposition (PLD), chemical bath deposition (CBD) and magnetron sputtering (MS) were reported. The experimental results show that the transmittances of PLD-CdS thin films are about 85% and the band gaps are about 2.38–2.42eV. SEM results show that the surface of PLD-CdS thin film is much more compact and uniform. PLD is more suitable to prepare the CdS thin films than CBD and MS. Based on the thorough study, by using totally PLD technique, the FTO/PLD-CdS(150 nm)/CSS-CdTe solar cell (0.0707 cm²) can be prepared with an efficiency of 10.475%.     

Studies of key technologies for CdTe solar modules

In this paper, CdS thin films, which act as the window layer and n-type partner to the p-type CdTe layer, were prepared by chemical bath deposition (CBD). CdTe thin films were deposited by the close-spaced sublimation (CSS) method. To obtain high-quality back contacts, a Te-rich layer was created with chemical etching and back contact materials were applied after CdTe annealing. The results indicate that the ZnTe/ZnTe:Cu complex layers show superior performance over other back contacts. Finally, by using laser scribing and mechanical scribing, the CdTe mini-modules were fabricated, in which a glass/SnO₂:F/CdS/CdTe/ZnTe/ZnTe:Cu/Ni solar module with a PWQC-confirmed total-area efficiency of 7.03% (54 cm²) was achieved. Supported by the Hi-Tech Research and Development Program of China (Grant No. 2003AA513010), and the Science and Technology Program of Sichuan Province, China (Grant No. 05GG021-003-3)     

Effects of different CdCl<Subscript>2</Subscript> annealing methods on the performance of CdS/CdTe polycrystalline thin film solar cells

In this paper, the effects of different CdCl₂ annealing methods, including vapor annealing and dip-coating annealing, on the performance of CdS/CdTe polycrystalline thin-film solar cells are studied. After annealing, the samples are lightly etched with 1% bromine in methanol to remove surface oxides. Both annealing methods give CdTe polycrystalline thin films with good crystallinity and complete structure. For solar cells containing the annealed CdTe films, cell efficiency first increases and then decreases as the concentration of CdCl₂ solution used for dip-coating annealing increases, and the optimized CdCl₂ concentration is 12%. The uniformity of the performance of all cells is analyzed by calculating the relative standard deviation for each parameter. The uniformity of cell performance can be improved dramatically by dip-coating annealing instead of vapor annealing. Most notably, an appropriate concentration of CdCl₂ (12%) acts as a protective layer that is conducive to realizing uniform high-performance CdS/CdTe solar cells. According to the location of depletion regions, the CdTe films treated by dip-coating annealing show a relatively low doping concentration, except for the sample treated with a CdCl₂ concentration of 6%, which is consistent with the changes of short-circuit current density of the cells. It is believed that these results can be applied to the large-scale production of CdTe polycrystalline thin-film solar cells.     

Influence of bath composition on the electrodeposition of cobalt-molybdenum amorphous alloy thin films

Cobalt-molybdenum (Co-Mo) amorphous alloy thin films were deposited on copper substrates by the electrochemical method at pH 4.0. Among the experimental electrodeposition parameters, only the concentration ratio of molybdate to cobalt ions ([ MoO2-4 ]/[CO2 ]) was varied to analyze its influence on the mechanism of induced cobalt-molybdenum codeposition. Voltammetry was one of the main techniques, which was used to examine the voltammetric response, revealing that cobalt-molybdenum codeposi-tion depended on the nature of the species in solution. To correlate the type of the film to the electrochemical response, various co-bait-molybdenum alloy thin films obtained from different [ MoO2-4]/[Co2 ] solutions were tested. Crack-free homogeneous films could be easily obtained from the low molybdate concentrations ([ MoO2-4]/[Co2 ]≈0.05) applying low deposition potentials.Moreover, the content of molybdenum up to 30wt% could be obtained from high molybdate concentration; in this case, the films showed cracks. The formation of these cracked films could be predicted from the observed distortions in the curves of electric cur-rent-time (j-t) deposition transients. The films with amorphous stmeture were obtained. The hysteresis loops suggested that the easily film were obtained when the deposition potential was -1025 mV, and [ MoO2-4]/[Co2 ] was 0.05 in solution, which exhibited a nicer soft-magnetic response.     

n-i-p型非晶硅太阳电池中p/ITO界面特性研究

采用射频等离子体增强化学气相沉积(RF-PECVD)技术,制备n-i-p型非晶硅(a-Si)太阳电池,采用反应热蒸发法制备ITO薄膜作为太阳电池的前电极。通过改变B2H6的掺杂浓度获得了不同晶化率的p层,详细研究了p层性能对p/ITO界面特性以及电池性能的影响。结果表明,在合适晶化率的p层上沉积ITO薄膜有利于优化p/ITO界面的接触特性,将其应用于n-i-p型a-Si太阳电池,能够显著改善电池的开路电压(Voc)和填充因子(FF),最终,在不锈钢(SS)衬底上获得了转换效率为6.57%的单结a-Si太阳电池。     

Enhanced photocatalytic degradation of methyl orange by CdS quantum dots sensitized platelike WO_3 photoelectrodes

CdS quantum dots sensitized platelike WO_3 photoelectrodes were successfully synthesized by a facile hydrothermal method and a modified chemical bath deposition(CBD) technique.To further improve the stability of the photoelectrodes in alkaline environment,the platelike WO_3 films were treated with TiCl_4 to form a nano-TiO_2 buffer layer on the WO_3 plate surface before loading CdSQDs.The resulting electrodes were characterized by using XRD,SEM,HR-TEM and UV-vis spectrum.The photocatalytic activity of the resulting electrodes was investigated by degradation of methyl orange(MO) in aqueous solution.The photoelectrochemical(PEC) property of the resulting electrodes was also characterized by the linear sweep voltammetry.The results of both the degradation of MO and photocurrent tests indicated that the as-prepared CdSQDs sensitized WO_3 platelike photoelectrodes exhibit a significant improvement in photocatalytic degradation and PEC activity under visible light irradiation,compared with unsupported CdSQDs electrodes.Significantly,coating the WO_3 plates with nano-TiO_2 obviously facilitate the charge separation and retards the charge-pair recombination,and results in a highest activity for QDsCdS/TiO_2/WO_3 photoelectrodes.     

Mg质量分数及缓冲层对ZnMgO∶Ga薄膜性能的影响

为了解决氧化锌在柔性电子器件应用方面的问题,利用脉冲激光沉积法(PLD)在聚对苯二甲酸乙二醇酯（PET）柔性衬底上室温下制备镓掺杂氧化锌（ZnO∶Ga）和镓掺杂Zn1-xMgxO (Zn1-xMgxO∶Ga)透明导电薄膜,采用X射线衍射仪（XRD）,扫描电镜,霍尔效应测试仪,紫外-可见光分光光度计对结构和性能进行表征,探讨靶材中镁质量分数对薄膜结构及光电性能的影响,并采用预沉积ZnO无机缓冲层法来改善薄膜样品的性能.研究结果表明,在柔性衬底上通过优化生长参数制备出性能良好的ZnO基透明导电薄膜,通过缓冲层的预沉积可以明显改善薄膜的结构和电学性能,薄膜电阻率最低可至8.27×10^-4 Ω·cm,在可见光区平均透射率超过70%.