PIN结构GaInAsSb红外探测器的PSPICE模型

研究了PIN结构GaInAsSb红外探测器的暗电流特性，建立了器件的PSPICE模型。模拟结果与实际测试结果基本符合。计算结果表明，器件表面和内部的缺陷及表面复合电流对器件的反向特性起主要作用，当反向偏压大于0.35V，缺陷引起的隧穿电流对器件暗电流起主要作用。     

氮化镓肖特基结紫外探测器的异常特性测量

测量了CaN肖特基结紫外探测器在有、无光照下的I-V异常特性。分别用362nm和368nm光束对有源区进行横向扫描,得到了光照不同部位时探测器在无偏压、2V反向偏压下的电流。紫外光照到肖特基结压焊电极附近及透明电极边沿附近区域时,探测器在反向偏压下有较大增益,空间响应均匀性变差,在禁带内有两个增益响应峰波长——364nm和368nm。探测器在810nm光照射下,反向偏压下的光响应增益、持续光电导存在光淬灭现象。探测器紫外光照完后,俘获中心及表面陷阱所俘获的部分电荷在高反向偏置电压下老化可以通过隧穿或发射效应释放出来,经过高反向偏置电压老化完后的探测器在同一低反向偏置电压下暗电流比老化前的要小。测量结果为GaN器件的研制提供了参考数据。     

InAlAs／InGaAs MSM光电探测器

采用ＧＳＭＢＥ方法及典型的器件工艺制成了用ＩｎＡｌＡｓ作为肖特基势垒增强材料的高性能ＩｎＡｌＡｓ／ＩｎＧａＡｓ／ＩｎＰ ＭＳＭ光电探测器。用自制的测试系统对器件的直流和瞬态特性进行了测试，测试结果表明，器件的击穿电压大于３０Ｖ，在１０Ｖ偏压下暗电流小于２０ｎＡ，对应的暗电流密度为３ｐａ／μｍ＾２，优于已有文献的报导。     

肖特基型氮铝镓紫外光电探测器

通过采用插入缓冲层的办法,利用金属有机气相外延(MOCVD)得到高质量的AlGaN薄膜,克服了AlGaN薄膜容易产生裂纹的缺点.在此基础上,我们通过采用传统的紫外光刻和湿法刻蚀的方法,制备得到了金属-半导体-金属(MSM)结构的Al0.25Ga0.75N紫外光电探测器.结果表明,在1 V偏压下,器件的暗电流仅为20 pA,如此低的暗电流主要是由于器件中存在一定量的缺陷而导致电阻过大的原因造成的.器件的最高峰值出现在308 nm,大小为0.07 A/W,器件的上升时间为10 ns,下降时间为190 ns.     

非对称面电极硅基锗金属-半导体-金属光电探测器的设计

针对金属-半导体-金属(MSM)光电探测器暗电流抑制的机理,本文提出了一种具有非对称面电极结构的硅基锗MSM光电探测器的设计方法,利用ATLAS仿真软件分析了电极结构参数对暗电流的影响,并通过实验得出样品器件的暗电流降低至微安量级。实验结果表明,采用非对称面电极结构设计可以有效抑制硅基锗MSM光电探测器的暗电流,提高器件性能。     

纤维状有机光电探测器制备与特性研究

纤维状光电探测器因具有柔性可编织、全角度光探测等特性，有望在可穿戴电子领域取得广泛应用。现已报道的纤维状光电探测器多采用无机光敏材料，器件存在机械柔性受限、制备工艺复杂等问题。本文提出制备纤维状有机光电探测器(FOPD)，采用浸渍提拉法依次在锌丝表面制备电子传输层(ZnO)、有机体异质结光敏层(PBDB-T:ITICTh)和空穴传输层(PEDOT:PSS)等功能层，最后缠绕银丝或碳纳米管纤维(CNT)作为外电极，制备了两种柔性FOPD。结果表明，两种器件在可见光波段均具有优良的响应，整流特性明显，在-0.5 V偏压下比探测率均可达10¹¹Jones (300 nm～760 nm)。其中，CNT外电极与光敏层的界面接触更佳，器件具有更低的暗电流密度(9.5×10^-8A cm^-2，-0.5 V)和更快的响应速度(上升、下降时间：0.88 ms、6.00 ms)。本文的研究有望为柔性纤维器件和可穿戴电子领域的发展提供新思路。     

多量子阱红外探测材料的光致荧光谱

在多量子阱红外探测器外延材料制备中,由于器件响应波长对量子阱的阱宽和垒高变化敏感,因此对外延材料的制备有很高的要求.本文中我们利用光致荧光谱(PL)对GaAs/AIGaAs多量子阱红外探测器材料进行了测量和计算,从而在器件工艺前,快速确定器件的探测波长.以光致荧光光谱对GaAs/AIGaAs多量子阱红外探测器材料进行测试,通过理论计算,得到多量子阱红外探测器探测波长.计算得到的理论响应波长与实际器件的响应波长有良好的一致性,证明用光荧光谱对外延材料进行测量并计算,能够更加有效地开展器件研究工作.同时,我们在低温下测量了外加偏压下器件暗电流情况,以及液氮温度下,500K黑体辐射情况时,信号噪声比达到235.3.     

溶胶-凝胶法制备MgxZn1-xO薄膜及性能研究

采用溶胶-凝胶法在石英玻璃片衬底上制备了Mg2+掺杂的ZnO(MgxZn1-xO)薄膜,研究了Mg2+掺杂对ZnO薄膜结构和紫外透过率的影响;在氧化物薄膜上真空蒸镀了Al叉指电极,制得紫外原型探测器件,测试了I-Ⅴ特性.结果表明,Mg2+掺杂后,MgxZn1-xO薄膜为纤锌矿结构,随着x值增加,晶格常数c逐渐减少,α逐渐增大,Mg2+掺杂抑制了(002)晶面的生长;紫外透过光谱表明,Mg2+掺杂后吸收边发生蓝移,可提高ZnO薄膜的禁带宽度;I-Ⅴ特性曲线表明,正向偏压下探测器的暗电流和光照电流随外加偏压呈线性增长,但光照电流与暗电流的差别较大.     

提高脉冲LD测距系统测距能力的一种方法

从激光测距机的噪声构成分析入手,寻求提高脉冲 LD 测距机测距能力的方法。脉冲 LD测距系统的噪声主要包括热噪声、散粒噪声、背景噪声、暗电流噪声及放大器噪声。在一定的光功率、暗电流情况下,LD 测距的测距能力更容易受背景噪声的影响。研究表明,LD 测距系统中探测器偏压的变化只补偿温度变化,由此提出,在背景光照射较强时让背景噪声参与偏压调整从而抑制背景噪声的方案。实验结果证实,强背景下的信噪比提高 1 倍以上,测距能力提高 1 倍。     

PVD法制备多晶碘化汞膜的光电特性研究

用热壁物理气相沉积法(Hot-Wall PVD)制备出晶体质量较好的多晶HgI2膜,研究了生长参数对沉积膜质量的影响,对多晶HgI2膜用金相显微镜、XRD、红外光谱进行了表征观察及对用多晶HgI2膜制备的探测器采用了暗电流测试;结果表明PVD法制备的多晶HgI2膜纯度高,结构完整性好,均匀性好,并且其相应器件有低的暗电流(电场0.2V/μ m时,为25pA/mm2).     

GaN and AlGaN metal–semiconductor–metal photodetectors

GaN based interdigital metal–semiconductor–metal (MSM) photodetectors have been successfully fabricated. The MSM structures were patterned on highly resistive GaN and the ternary compound, AlGaN. For the highly resistive GaN detector, the lowest dark current is 0.1 nA and the UV responsivity of the device was about 460 A W⁻¹ at a DC bias of 5 V. The AlGaN with 24% Al exhibited larger gains of up to 10⁶ A W⁻¹ at 20 V, but at a very high dark current, 1 mA, and very long detector responses, greater than 60 s. The high gain in this device is not well understood. The preliminary measurements indicate that tunneling occurs at high electric fields since a negative temperature coefficient for the breakdown voltage was observed.     

In0.53Ga0.47As PIN光电探测器的温度特性分析

从理论和实验上分析了双异质结In0.53Ga0.47As PIN光电探测器在不同的反向偏置电压下暗电流在甚宽温度范围内的温度特性。结果表明：在反向偏置低压与高压段,产生一复合电流与隧道电流(缺陷隧道电流与带带间隧道电流)分别占主导地位,并呈现出相应的温度特性。还从理论与实验两方面探讨了噪声对探测器R0A的影响,结果表明：在低温段,产生一复合噪声起主要作用,在高温段,俄歇复合噪声起主要作用。     

High Detectivity Graphene‐Silicon Heterojunction Photodetector

A graphene/n‐type silicon (n‐Si) heterojunction has been demonstrated to exhibit strong rectifying behavior and high photoresponsivity, which can be utilized for the development of high‐performance photodetectors. However, graphene/n‐Si heterojunction photodetectors reported previously suffer from relatively low specific detectivity due to large dark current. Here, by introducing a thin interfacial oxide layer, the dark current of graphene/n‐Si heterojunction has been reduced by two orders of magnitude at zero bias. At room temperature, the graphene/n‐Si photodetector with interfacial oxide exhibits a specific detectivity up to 5.77 × 10¹³ cm Hz^1/2 W^‐1 at the peak wavelength of 890 nm in vacuum, which is highest reported detectivity at room temperature for planar graphene/Si heterojunction photodetectors. In addition, the improved graphene/n‐Si heterojunction photodetectors possess high responsivity of 0.73 A W^?1 and high photo‐to‐dark current ratio of ≈10⁷. The current noise spectral density of the graphene/n‐Si photodetector has been characterized under ambient and vacuum conditions, which shows that the dark current can be further suppressed in vacuum. These results demonstrate that graphene/Si heterojunction with interfacial oxide is promising for the development of high detectivity photodetectors.     

Noise Characteristics of ZnO-Nanowire Photodetectors Prepared on ZnO:Ga/Glass Templates

In this paper, we report the fabrication of vertically well-aligned ZnO nanowire ultraviolet (UV) photodetectors on ZnO:Ga/glass templates. With 1 V applied bias, it was found that dark current density of the device was only 1.37times10^-7 A/cm². It was also found that UV-to-visible rejection ratio of the fabricated photodetector was around 1000 with a maximum quantum efficiency of 12.6%. It was also found that noise equivalent power and normalized detectivity of the ZnO nanowire photodetector were 5.73times10^-11 W and 6.17times10⁹ cmHz^0.5W^-1, respectively.     

Germanium on insulator near-infrared photodetectors fabricated by layer transfer

We report on novel pn Ge photodetectors fabricated on glass. The fabrication consists of wafer bonding and layer splitting, followed by a low-temperature epitaxial growth of Ge. The photodiodes are characterized in terms of dark current and responsivity, and their performance compared with devices realized on either Ge or Si. The minimum current density is 50 μA/cm² at 1 V reverse bias, the responsivity is 0.2 A/W in the photovoltaic mode, with a maximum of 0.28 A/W at 1.55 μm at a reverse voltage of 5 V.     

A High-Performance Solution-Processed Organic Photodetector for Near-Infrared Sensing

Sensitive detection of near-infrared (NIR) light enables many important applications in both research and industry. Current organic photodetectors suffer from low NIR sensitivity typically due to early absorption cutoff, low responsivity, and/or large dark/noise current under bias. Herein, organic photodetectors based on a novel ultranarrow-bandgap nonfullerene acceptor, CO1-4Cl, are presented, showcasing a remarkable responsivity over 0.5 A W⁻¹ in the NIR spectral region (920–960 nm), which is the highest among organic photodiodes. By effectively delaying the onset of the space charge limited current and suppressing the shunt leakage current, the optimized devices show a large specific detectivity around 10¹² Jones for NIR spectral region up to 1010 nm, close to that of a commercial Si photodiode. The presented photodetectors can also be integrated in photoplethysmography for real-time heart-rate monitoring, suggesting its potential for practical applications.     

Influence of two-tier structuring on the performance of black silicon-based MSM photodetectors

Black silicon, fabricated by alkaline anisotropic etching along with metal-assisted etching, consists of regular distributed micro-scale pyramids and irregular distributed nano-scale pores, in which the pore size plays an important role in the performance of the black silicon-based metal–semiconductor–metal photodetectors (BS MSM PDs). It is found that the dark current characteristic of BS MSM PD is different from that of traditional silicon MSM PD, and the former has negative differential resistance in part of its operating range because of the quantum tunneling effect exists in black silicon. Moreover, it is interesting to note that BS MSM PD with longer metal-assisted etching time (larger nanopore size) has higher responsivity at high bias voltage but lower responsivity at low bias voltage.     

CsPbI3 nanorods as the interfacial layer for high-performance,all-solution-processed self-powered photodetectors

Heterojunction is regarded as a crucial step toward realizing high-performance devices,particularly,forming gradient energy band between heterojunctions benefits self-powered photodetectors.There-fore,in this paper,the synthesis of CsPbI3 nanorods(NRs)and its application as the interfacial layer in high-performance,all-solution-processed self-powered photodetectors are presented.For the bilayer photodetector ITO/ZnO(100 nm)/PbS-TBAI(150 nm)/Au,a responsivity of 3.6 A/W with a specific detec-tivity of 9.8×1012 Jones was obtained under 0.1 mW/cm2 white light illumination at zero bias(i.e.in self-powered mode).Meanwhile,the photocurrent was enhanced to an On/Off current ratio of 10s at zero bias with an open circuit voltage of 0.53 V for trilayer photodetector ITO/ZnO(100 nm)/PbS-TBAI(150 nm)/CsPbI3(250 nm)/Au,in which the CsPbI3 NRs layer works as the interfacial layer.As a result,a specific detectivity of 4.5×1013 Jones with a responsivity of 11.12 A/W was obtained under 0.1 mW/cm2 white light illumination,as well as the rising/decaying time of 0.57 s/0.41 s with excellent stability and reproducibility upto four weeks in air.The enhanced-performance is ascribed to the mis-match bandgap between PbS-TBAI/CsPbI3 interface,which can suppress the carrier recombination and provide efficient transport passages for charge carriers.Thus,it provides a feasible and efficient method for high-performance photodetectors.     

Gate‐Controlled Graphene–Silicon Schottky Junction Photodetector

Various photodetectors showing extremely high photoresponsivity have been frequently reported, but many of these photodetectors could not avoid the simultaneous amplification of dark current. A gate‐controlled graphene–silicon Schottky junction photodetector that exhibits a high on/off photoswitching ratio (≈10⁴), a very high photoresponsivity (≈70 A W⁻¹), and a low dark current in the order of µA cm⁻² in a wide wavelength range (395–850 nm) is demonstrated. The photoresponsivity is ≈100 times higher than that of existing commercial photodetectors, and 7000 times higher than that of graphene‐field‐effect transistor‐based photodetectors, while the dark current is similar to or lower than that of commercial photodetectors. This result can be explained by a unique gain mechanism originating from the difference in carrier transport characteristics of silicon and graphene.