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1.
Computer Dynamics宣布推出一种TFTLCD平面显示器,用于代替平面阴极射线显示器(CRT),型号为VAMP-SmartSize,包括从6.4至14.5英寸的各种尺寸的产品以及15英寸的产品,它的视角为-70°至+70°,对比度为300∶1,能够在在日光下显示。这种显示器技术解决了两个问题:在高分辨率的屏幕上显示分辨率较低的图像,在平面显示器上显示隔  相似文献   

2.
《电子元器件应用》2006,8(3):118-118
Opto技术公司日前推出一种彩色有机发光二极管(O L E D)O F G P020384160F,该显示器件能丰富手提设备的显示。它的对角线长度为2.9英,分辨率为160×160,能工作高达10000小时。该显示器能提供多达262000个色彩,支持视频格式,帧速率高达120fps。这种小分子OLED屏的有用面积52.790×52.774mm,屏的尺寸为本70×70×1.4mm,象素大小为0.06×0.28mm,象素间隔为0.11×0.33mm,总的象素为160×3×160。它具有64级灰度,显示器工作电压2 ̄10V,逻辑电平从3.3 ̄5V,工作温度从-20°到70℃。该OLED显示器的视角度为160度,有清晰和与众不同的图像,即…  相似文献   

3.
Hosidon电子学公司于88年12月将开始大量生产三种白色底色的超扭曲向列型液晶显示器。根据该公司报导,这些显示器的对比度比现在市售的静态扭曲向列型液晶显示器要好三倍左右,视角至少是60°。响应时间在25°时为180ms,可提供负和正的显示。工作温度范围在0°~50℃;用冷阴极荧光管(cold CRT)背面照明。这些显示器有:640×400点(占空比1/200);640×200点(1/100);640×200点(1/200)。其点尺寸、对比度因  相似文献   

4.
介绍了南京电子器件研究所、华中理工大学和电子部47所三单位联合研制的7.6cm240(H)×220(V)单元a-SiTFT-LCD,简要论述了TFT矩阵板、行列驱动电路、彩色滤色器、液晶盒、离密度柔性引线带、控制引线电路等一系列关键技术。显示器的有效显示面积60mm×45mm,亮度≥50cd/m^2,时比度(最大值)约30:1,视角范围(对比度5:1):水平方向〉±40°,垂直方向〉±30°,灰度  相似文献   

5.
夏普公司于四月底将向市场投放一种高分辨率、320×256点的薄膜场致发光(EL)显示器,其显示尺寸对应于5英寸CRT显示。由于应用该公司的电路排布技术和多路驱动系统,因此薄膜EL显示器具有低功耗(5W)和高分辨率。其特点视角为150°。  相似文献   

6.
美能达推出一种眼镜式显示器。影像显示在镜片稍前的位置 ,可以透过影像看见对面及周围的情况。用来显示影像的液晶面板设计在眼镜式显示器的上部 ,通过起导光板作用的镜头将面板显示出来的影像反射到全息镜片上。全息镜片反射的映像在眼球内成像后 ,人就可以看到影像。同时 ,由于外界光也能够透过全息镜头进入眼中 ,因此就能够透过图像看到外界的情况。外界光的透过率可在 85 %以上。该产品重2 7g ,厚 3.5mm。视角为 1 4°× 1 0°(对角 1 6°) ,与2 .5m处的 2 9in显示器尺寸相同 ,分辨率为QV GA( 32 0× 2 4 0 ) ,亮度为 2 0 0cd/m2 。…  相似文献   

7.
日本松下电器产业公司开发出一种高速液晶显示技术,该技术显示动画不失真,视场较宽,可再现清晰图像.该公司既采用适应高速响应的光学自补偿双折射方式(OCB方式),同时又采用光学模拟方式,研制出了光学补偿薄膜,进而实现了高速响应和宽视场显示.另外,根据液晶动作模拟开发了易排列、且温度范围宽的液晶材料.该技术的特点如下:(1)具有16ms以下的高响应速度为使动画图像不失真,响应时间的上升和下降之和必须在1帧(16.6ms)以内.该液晶显示器的响应特性是,白黑2值间为7ms,中间调为16ms以下,适合于动画图像显示.(2)具有上下120°,左右140°的宽视场该液晶显示具有上下120°,左右140°(对比率10:1以上)的视场范围.没有灰度反弹问题,视场色度变化约为过去扭曲向列(TV)液晶的1/3,实现了多色再现.(3)可用制造TN液晶的工艺制作可用制造TN液晶的相同工艺制作高速响应液晶显示器,且加工工艺不需大的变动.主要性能指标:显示屏的对角尺寸:18cm像元数:462×240亮度:350cd/m~2对比率:200:1以上机场范围:上下120°,左右140°(对比率10:1以上不反弹)响应时间:7ms(室温下)(No.40)  相似文献   

8.
林志贤  郭太良   《电子器件》2006,29(3):817-820,824
论述低逸出功可印刷型场致发射显示系统的工作原理,介绍了数字视频图像的转换和处理、视频数据的传输、列灰度驱动集成HV632PG和行集成驱动器STV7697芯片的接口电路以及FPGA控制技术等.研制出了彩色FED显示器样机,首次用于大屏幕低逸出功型印刷式场致发射显示器,能显示彩色视频图像.样机亮度已达200 cd/m2、对比度达6001,显示分辨率为480×240,电路灰度等级达256级,有效显示对角线尺寸为25 in.  相似文献   

9.
侯红玲  吕瑞虎  郝海凌  吴浪 《激光与红外》2021,51(12):1563-1569
为研究激光扫描角度对碳纤维复合材料的热影响作用和扫描角度对激光能量在材料内部传递过程的影响,以常用的纤维铺设角度即0°、45°和90°作为激光扫描角度,进行了有限元模拟和试验验证。结果表明,随扫描角度的增大,激光对材料的热影响范围逐渐增大;当扫描角度为45°时,切缝两侧纤维碳化较为严重。通过激光切割试验验证,发现模拟与试验存在误差为746,模拟与试验所呈现出扫描角度对材料的热影响趋势,以及扫描角度对纤维造成碳化的结果特征具有一致性。为降低激光切割对材料的热影响,减小材料的碳化区域,改善材料的激光切割质量,除选用合适的激光参量外,应尽可能的使激光扫描角度与纤维轴向一致。  相似文献   

10.
Plasmaco公司最近研制出大屏幕交流等离子体显示器,该显示器制造采用了最新的彩色等离子体技术工艺。显示器可显示具有1670万种色彩、高对比度图像,视场角为160°,在所有平板显示技术中是最宽的。107cm和127cm样机将在SID’99展出。交流等离子体显示器@文青  相似文献   

11.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

12.
IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…  相似文献   

13.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

14.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

15.
A doping system consisting of NPB and PVK is employed as a composite hole transporting layer (CHTL). By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK : NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK : NPB at 1:3.  相似文献   

16.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

17.
Due to variable symbol length of digital pulse interval modulation(DPIM), it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation(FDPIM) method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.  相似文献   

18.
It is a key problem to accurately calculate beam spots' center of measuring the warp by using a collimated laser. A new method, named double geometrical center method (DGCM), is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device (CCD) is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What's more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.  相似文献   

19.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

20.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

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