双掺杂稀土锰氧化物La2/3(Ca1/3Sr2/3)1/3MnO3薄膜的输运特性

采用射频磁控溅射法制备了Ca、Sr双掺杂La2/3(Ca1/3Sr2/3)1/3MnO3(LCSMO)薄膜。电阻率-温度特性表明,薄膜在387K时发生铁磁金属相-顺磁非导体相相变。同时测试了薄膜在180,230和280K温度下的伏安特性．表明所制备的薄膜具有自阻效应,并分析了产生该现象的原因。     

(La,Pr)2/3Sr1/3MnO3薄膜激光诱导电阻效应

研究了钙钛矿锰氧化物La2/3Sr1/3MnO3和Pr2/3Sr1/3MnO3单晶薄膜的激光诱导电阻变化特性.低温铁磁金属相,激光诱导使薄膜的电阻增大,而在顺磁绝缘相则电阻减小,同时薄膜的绝缘体-金属相变(IMT)转变温度Tp向低温方向移动.对于Pr2/3Sr1/3MnO3薄膜,当激光功率为22mW时,光致电阻相对变化的最大值约为9.6%.光诱导效应致使薄膜的电阻发生变化,并使其IMT的转变温度点向低温方向移动,主要是由于光子能激发eg向下电子的跃迁,改变体系自旋极化方向.     

Pr2/3Sr1/3MnO3薄膜外场诱导自旋输运特性

采用脉冲激光沉积法制备了稀土掺杂钙钛矿锰氧化物Pr2/3Sr1/3MnO3(PSMO)外延薄膜,研究了薄膜在磁场、激光和电流作用下的自旋输运特性.在低温铁磁金属相,激光作用使薄膜的电阻增大,而磁场和电流则诱导电阻减小;在高温顺磁绝缘态,外场诱导均使电阻减小.在铁磁金属相,外场诱导输运特性的变化可归结于外场对体系电子自旋系统的影响:磁场和电流加强材料中eg电子和t2g局域电子间的自旋平行,增强了双交换作用;激光作用可产生光致退磁效应,减弱双交换作用.在顺磁绝缘态,场致电阻降低源于外场致使小极化子的退局域化效应.     

新型溶胶-凝胶工艺制备La0.5Ca0.5MnO3薄膜及性能分析

鉴于以醇盐为原料溶胶-凝胶制备La0.5Ca0.5MnO3薄膜工艺中存在诸多苛刻因素,本文以无机盐为原料采用溶胶-凝胶工艺在SiO2/Si(100)衬底上制备了La0.5Ca0.5MnO3薄膜.并用XRD、SEM和TEM等分析手段对薄膜进行了表征,通过不同磁场下电阻-温度(R-T)曲线,研究了样品的磁电阻(CMR)效应...     

La2/3Sr1/3MnO3薄膜的输运及激光反射率特性

用磁控溅射方法制备了钙钛矿锰氧化合物La2/3Sr1/3MnO3(LSMO)单晶外延薄膜,该薄膜发生顺磁绝缘-铁磁金属相变的转变温度Tc≈330K.在室温(T=293K),偏置电流对LSMO薄膜输运性质的影响表明,随着电流的增大,材料的晶格畸变加强,电阻值增大,同时薄膜的激光反射率减小.用固体光学理论对其进行定性解释.     

纳米多晶La0. 7Sr0.3MnO3磁性相变临界行为研究

用溶胶一凝胶方法制备了纳米多晶La0.7Sr0.3MnO3样品.测量了不同温度下烧结的样品的零场冷却交流磁化率与温度和直流磁场的依赖关系.通过对铁磁-顺磁转变点附近临界峰的分析,得到973K烧结的多晶样品居里温度为312.1K±0.2K,临界指数为:δ=3.040,γ=1.007,β=0.493;1173K烧结的多晶样品居里温度为331.7K±0.1K,临界指数分别为:δ=2.950,γ=0.993,β=0.508.两组数据均与平均场理论预言结果一致,表明纳米多晶La0.7Sr0.3MnO3样品在磁性相变点附近存在长程相互作用.     

Co0.525Fe0.475MnP化合物的室温磁热效应和磁电阻效应

采用多步骤固态烧结方法合成了具有单一Co₂P相的Co_0.525Fe_0.475MnP化合物,其反铁磁有序温度在室温附近。在升温过程中,这种化合物经历两个连续的磁转变：在285 K发生反铁磁到铁磁的一级相变,在375 K发生由铁磁到顺磁的二级相变。在0~5 T的外磁场中,两个相变点温度对应的最大磁熵变分别为1.1 J/(kg·K)(303 K)和-2.0 J/(kg·K)(383 K)。外磁场为零时,随着温度的降低电阻率曲线在铁磁到反铁磁转变温度附近出现极小值,是铁磁有序与反铁磁有序的竞争所致。在35 K再次出现的电阻率极小值,可归因于由Fe替代Co引起的自旋无序所导致的金属-绝缘体转变。在5 T磁场中磁电阻率的最大值对应温度为200 K时的-2.5%,在反铁磁温度以上磁电阻率迅速减小。这表明,这种化合物的磁电阻效应源于外磁场对反铁磁有序的影响。     

用内耗技术研究La0.7Pb0.3MnO3巨磁电阻材料

用低频扭摆法在多功能内耗仪上测量了巨磁电阻材料La0.7Pb0.3MnO3(LPMO)的温度内耗谱和弹性模量。结果表明，内耗峰位与测量频率无关，并且峰高与频率成反比，弹性模量在对应的内耗峰处有明显的转折，内耗峰表现为相变峰的特征，结合电阻和磁化率的测试，解释了内耗和电阻-温度曲线的双峰现象，高温内耗峰和高温电阻峰与居里温度有很好的对应，来源于顺磁半导体向铁磁金属的转变，低温内耗峰和磁化率的单调下降来源于铁磁相分离过程。而较大的低温电阻峰部分来源于相分离过程。     

La0.7Ca0.3MnO3多晶样品中的相分离研究

采用固相反应法制备了La0.7Ca0.3MnO3多晶样品并借助X射线衍射,零场下的电阻测量以及电子顺磁共振技术对样品的结构、电子输运和磁性质进行了研究.实验结果表明,在居里温度TC附近,电子顺磁共振(ESR)谱线出现异常,谱线表现出明显的不对称,共振场随着温度的降低向低温方向移动.我们发现在居里温度TC以下用两个洛仑兹峰对ESR谱线可以进行较好的拟合,从而有力地证明了在相转变温度TC附近存在铁磁与顺磁相的共存.     

(La0.6Dy0.1)Sr0.3MnO3的磁热效应研究

对庞磁电阻材料(La0.6Dy0．1)Sr0.3MnO3的磁热效应进行了研究．通过不同温度下的等温磁化(M-H)曲线的测量和计算，发现伴随铁磁-顺磁(PM—FM)相变出现大的磁热效应，额外的磁性交换作用将导致额外的磁熵变化．结果表明，(La0.6Dy0．1)Sr0.3MnO3可以作为室温下使用的磁制冷工质候选材料．     

Temperature dependence of resistance and thermopower of thin indium tin oxide films

We have measured the resistance and thermopower of a series of RF sputtered and annealed indium tin oxide (ITO) thin films from 300 K down to liquid-helium temperatures. Thermal annealing was performed to modulate the levels of disorder (i.e., resistivity) of the samples. The measured resistances are well described by the Bloch-Grüneisen law between 150 and 300 K, suggesting that our thin films are metallic. At lower temperatures, a resistance rise with decreasing temperature was observed, which can be quantitatively ascribed to the two-dimensional electron-electron interaction and weak-localization effects. The thermopowers in all samples are negative and reveal fairly linear temperature dependence over the whole measurement temperature range, strongly indicating free-electron like conduction characteristics in ITO thin films. As a result, the carrier concentration in each film can be reliably determined. This work demonstrates that ITO films as thin as 15 nm thick can already possess high metallic conductivity.     

水基金属有机物分解法制备Ba0.5Sr0.5TiO3薄膜的研究

制备了水基Ｂａ＾２＋、Ｓｒ＾２＋、Ｔｉ＾４＋三元有机物溶液。根据红外光 谱测定及对比实验分析了溶液配制过程中化学反应机理。采用金属有机物分解法（ＭＯＤ）制备Ｂａ０．５Ｓｒ０．５ＴｉＯ３（ＢＳＴ）薄膜。通过ＸＲＤ、ＳＥ趱 阻抗分析仪等分析测试手段,薄膜的相结构、微观形态及电性能。结果表明,所制备ＢＳＴ薄 数矿晶相结构,结晶完整晶粒小（１０－５０ｎｍ）,显微结构均匀致密,并具有良好的电性能（电容密度为     

Dielectric permittivity and conductivity spectra of La0.5Ca0.5MnO3 thin films presenting electric field induced metal-insulator transition

Electric behavior of polycrystalline La_0.5Ca_0.5MnO₃ thin films, pulsed laser deposited on a (100) silicon substrate, is reported and discussed. An electrically induced metal-insulating transition around 150 K is found, which is voltage and thickness dependent. At low temperatures, the film conductivity is non-Ohmic and moderate electric fields lead to resistivity switching towards metaestable low-resistive states. Impedance spectroscopy measurements were also performed in order to determine the film dielectric permittivity and conductivity and to estimate the characteristic metal-semiconductor interface parameters. The obtained results show that the fraction of ferromagnetic metallic regions does not change when a voltage is applied, and that the mechanism responsible for the low temperature metal insulator transition and the conduction behavior is the appearance of connective paths due to the enhanced mobility of carriers activated by the electric field.     

Measurement of the surface resistance of a metallic thin film at awavelength of 10.6 μm

A quasi-optical method for measuring the surface resistance of a metallic thin film is described. This resistance is derived from measurements of the forward tilt of a surface wave which propagates on the thin metallic film. In order to verify the results, ellipsometry is used. The measurements were made at a wavelength of 10.6 μm at ambient temperature. The surface resistance of an Au film was measured to be 16 times higher than the classical surface resistance     

Electrical and crystallographic properties of nanocrystalline CdSe<Subscript>0.5</Subscript>S<Subscript>0.5</Subscript> composite thin films deposited by dip method

A dip method is employed for the deposition of CdSe_0.5S_0.5 composite thin film at room temperature. Cadmium sulphate, thiourea and sodium selenosulphate were used as the basic source material. Solid solution with cubic phase was observed from X-ray diffraction studies. The specific conductivity of the film was found to be in order of 10⁻⁷ (Ωcm)⁻¹. The temperature dependence of an electrical conductivity, thermoelectrical power, carrier density and carrier mobility for CdSe_0.5S_0.5 thin films have been examined. The low temperature conductivity is governed by a variable range of conduction while grain boundary limited conduction mechanism is predominant at higher temperature.     

Effect of Na/K excess on the electrical properties of Na0.5Bi0.5TiO3-K0.5Bi0.5TiO3 thin films prepared by sol-gel processing

(Na_0.85K_0.15)_0.5Bi_0.5TiO₃ (NKBT) thin films derived from different amounts of Na/K excess content were fabricated via an aqueous sol-gel method on a Pt(111)/Ti/SiO₂/Si substrate, and the effect of Na/K excess content on the microstructure and electrical properties of the NKBT thin films was investigated. A second phase appears when Na/K excess content is below 20 mol%. Appropriated Na/K excess can enhance the polarization and dielectric properties due to compensation of Na/K loss that occurred during heat treatment. The 20 mol% excess derived NKBT thin film exhibits the best ferroelectric and dielectric properties with a remnant polarization (Pr) of 13.6 μC/cm², and a coercive field (Ec) of 104.8 KV/cm, together with a dielectric constant of 406 and a dissipation factor of 0.064. Similar to the dielectric response change with Na/K excess content, the decreasing concentration of charged defects is the main reason resulting in the increase of the piezoelectric property. The film with a 20 mol% excess content exhibited an effective d₃₃^? of about 56 pm/V. Also, the NKBT with a 20 mol% excess content exhibits the lowest current density of 5.6 × 10^− 5 A/cm² at 10 V.     

Impedance spectroscopy and relaxation phenomena of (Na,K) excess Na0.5K0.5NbO3 thin films grown by chemical solution deposition

Na_0.5K_0.5NbO₃ (NKN) and 10 mol% (Na,K) excess Na_0.5K_0.5NbO₃ (NKN10) thin films on Pt/Ti/SiO₂/Si substrate were prepared by chemical solution deposition. Crystallization of NKN10 thin films was confirmed by X-ray diffraction. The (Na,K) excess Na_0.5K_0.5NbO₃ thin film shows a ferroelectric P-E hysteresis loop. Dielectric properties and impedance spectroscopy of thin films were investigated in the frequency range from 0.1 Hz to 100 kHz and the temperature range of 25 ~ 500 °C. By analyzing the complex impedance relaxation with Cole-Cole plots, we found impedance relaxations for the thin film. The contribution of electrical conduction is discussed in relation to grain, grain boundary, and interface effects.     

The properties of Ba0.5Sr0.5TiO3 thin film prepared by RF magnetron sputtering from powder target

The Ba_0.5Sr_0.5TiO₃ (BST) thin film with the thickness of 400 nm deposited from powder target is prepared by the radio-frequency magnetron sputtering technique. The deposition rate of BST film is estimated to be 45 nm/min, which is very fast for ferroelectric materials. The dielectric properties of the as-prepared BST thin film are demonstrated. High dielectric tunability up to 42.7% and low dielectric loss small to 0.01 are achieved at a low applied voltage of 5 V. The results demonstrate that the RF magnetron sputtering from powder target is a versatile, novel technique for the deposition of high-quality ferroelectric thin films.     

(Pb_(0.5)Sr_(0.5))TiO_3薄膜的表面化学态研究

用溶胶-凝胶法制备(Pb_(0.5)Sr_(0.5))TiO_3(简称PST)前驱体溶液,以三水醋酸铅、醋酸锶、钛酸丁酯为原料,乙二醇甲醚、去离子水、乙酰丙酮做溶剂,通过旋涂工艺在Pt/Ti/SiO_2/Si(100)基片上沉积PST薄膜.薄膜经320～380℃热分解,再经650℃退火30min,得到晶化好的薄膜样品,X射线衍射结果表明PST薄膜为钙钛矿立方相结构,其晶格常数为a=0.3919nm.用原子力显微镜观测其表面形貌,薄膜平均晶粒尺寸为300nm.用XPS测量了650℃退火PST薄膜样品的表面化学态,结果表明表面富铅,接近表面区域的原子比率Pb∶Sr∶Ti∶O是0.52∶0.50∶1.0∶3.02,接近(Pb_(0.5)Sr_(0.5))TiO_3的理想配比.