硫化锌／多孔硅复合体系光致发光特性的研究

为了研究硫化锌／多孔硅复合体系的光致发光特性,通过电化学阳极氧化法制备了多孔硅样品,然后用脉冲激光沉积的方法在其上沉积硫化锌薄膜,测量了硫化锌／多孔硅复合体系的光致发光谱,并对其进行了详细的理论分析和实验验证。结果表明,在不同的激发波长(340nm,360nm,390nm)下,硫化锌／多孔硅复合体系的光致发光谱不同,硫化锌和多孔硅发光的相对(蓝／红)积分强度比值也不同;硫化锌薄膜的生长温度不同(100℃,250℃,350℃)时,硫化锌／多孔硅复合体系的发光不同,随着生长温度的升高,复合体系的发光谱中,硫化锌的发光增强而多孔硅的发光减弱;衬底多孔硅的制备电流密度不同(3mA／cm²,9mA／cm²,11mA／cm²)时,硫化锌／多孔硅复合体系的发光也有着不同的特点。在适当的多孔硅制备电流密度条件下,把硫化锌的发光与多孔硅的发光叠加,得到了可见光区较宽的光致发光谱带(450nm～700nm),呈现较强的白光发射,这一结果为白光二极管的实现开辟了一条新的捷径。     

金属／多孔硅／硅结构发光器件输运特性的研究

基于Vlkulov等人对金属/多孔硅/硅结构输运特性的研究,分析了载流子在金属/多孔硅/硅结构中的输运过程,研究了各层中电场强度以及电压的分布,讨论了镜像势在正反向偏压下对金属/多孔硅/硅结构I-V特性的影响.结果表明:金属/多孔硅/硅结构中电流主要受表面态电荷和界面层影响,改变多孔硅层厚度将导致各层中电压的重新分布,不管是正向偏压还是反向偏压,电流随厚度的增加而减小;镜像势在正向偏压时对电流的影响可以忽略,但随反向偏压增大镜像势对电流的影响越来越大.     

掺Er硅的发光机理的探讨及其应用前景的展望

本文探讨了硅掺入稀土元素Ｅｒ后能发出波长为１５４０ｎｍ的光的机理，对影响其发光特性的温度猝灭现象作了初步分析，最后指出了将其实用化还必须解决的一些问题。     

Au/(Si/SiO2)/p-Si薄膜中电流及电致发光机制的分析

用射频磁控溅射法制备了具有Au／（Si／SiO2）／pSi结构的样品，利用I-V特性曲线和电致发光（EL）谱对载流子的输运及复合发光过程进行了研究，用位形坐标理论模型分析的结果表明，在SiO2薄膜中存在2个由于缺陷而形成的发光中心，Au膜中的电子和p型Si中的空穴在较高的电场下以Fowler-Nordheim（F-N）隧穿方式进入SiO2薄膜，并通过其中的缺陷中心复合而发光。     

金属/多孔硅结构的光伏吸收模型研究

９０年代,发现一定成份和结构的多孔硅可以在可见光区发光,该项工作在国际上产生很大影响．为解释其发光机制,先后提出量子限制模型、发光中心模型、硅氧稀发光、Ｓｉ－Ｈ健或多硅烷发光、氢化非晶硅发光和表面态模型．近两年来,又发现金属／多孔硅（Ｍ／Ｐ）结构有较好的光伏吸收特性,我们的工作是研究其光伏吸收机理,提出相应的Ｍ／ＰＳＣｈｏｔｔｋｙ结中原子团演新模型,较好地解释了其实验结果．实验结果给出,Ｓｃｈｏｔｔｋｙ结采用Ａｎ膜与多孔硅结构的光伏吸收峰在６５０ｕｒｎ波长处,而采用ＡＩ膜与多孔硅结构的光伏吸收峰…     

多孔硅与有机发光材料复合的光电特性

用旋涂法实现了多孔硅(PS)与有机发光材料聚乙烯咔唑(PVK)和八羟基喹啉(Alq3)的复合，研究了PS／(PVK，Alq3)复合体系的光学性能和电学性能。PL谱的测试发现，PS／PVK复合体系的PL同时具有PS和PVK的峰；在485nm的位置出现了1个新峰，讨论了这个峰的来源。研究了n型单晶Si制备的PS与PVK复合(n-PS／p-PVK)和P型单晶Si制备的Alq3复合(p-PS／n-Alq3)后的}y特性。测试表明，这两个复合体系的I-V曲线都显示了良好的整流特性。结果表明，PS／(PVK，Alq3)复合体系适合用来制备PS基的发光二极管。最后借助无机半导体的能带理论对此进行了分析。     

掺铒富硅氧化硅薄膜的光致发光

本文研究了富硅氧化硅薄膜掺入铒的发光特性．富硅氧化硅薄膜（氧含量为６０％）采用ＰＥＣＶＤ方法生长,室温下离子注入铒,经过８００℃,５ｍｉｎ的退火,在１０～３００Ｋ温度下得到较强的波长１．５４μｍ光致发光．发光强度随温度升高而下降,其温度猝灭激活能为１４．３ｍｅＶ．发光谱表明富硅氧化硅中Ｅｒ－Ｏ发光中心仍具有Ｔｄ对称性．     

共轭聚合物PFTQ/多孔硅复合膜的光致发光研究

为了实现硅基光电子集成,在多孔硅衬底上制备有机发光器件是一种很有优势的方法.采用匀胶机涂布法在多孔硅中嵌入了新型共轭有机聚合物聚(9,9-二辛基)-2,7-芴-co-N-(4-(2-苯基喹喔啉)苯)-4,4'-二苯胺(PFTQ),对比研究了多孔硅,PFTQ/多孔硅,PFTQ/硅以及PFTQ在甲苯溶液中的光致发光特性.实验结果表明:PFTQ/多孔硅复合膜光致发光强度是PFTQ/硅的2倍,而且相比在甲苯溶液中的PFTQ和PFTQ/硅,发光峰值有所红移,分析认为这是由于共轭聚合物在固态时有效共轭程度增加所致,并且与多孔硅中的激发载流子转移到聚合物分子上形成复合发光有关.     

M／PS／Si／M结构的电致发光

用阳极氧化工艺制作了多孔硅膜，采用第二次阳极氧化的方法看到了多孔硅的电致发光现象，并制作了一个Ｍ／ＰＳ／Ｓｉ／Ｍ类肖特基结构的发光二极管，观察到其电致发光，但其电致发光效率与强度很低，寿命很短，提出了研制实用化的多孔硅电致发光器件的努力方向。     

聚合物发光器件中输运特性的模拟分析

对聚合物发光二极管I-V特性的测量发现,被测器件内存在着类似于某些无机器件中的负阻现象和"迟滞回线”状场致漂移的伏安特性.模拟分析表明,一种反向势垒的存在及其击穿,应是引起负阻现象的原因.缺陷态的存在及其电荷填充的变化,是导致I-V特性曲线随偏压扫描方向变化的主要原因.而低场下的接触性能决定着发光二级管载流子的输运性质:若为非欧姆接触,则I-V曲线可用F-N隧穿模型来描述;若为欧姆接触,则应用陷阱电荷限制电流(TCL)模型来描述.     

退火温度对ZnS/PS薄膜的晶体结构和光电性质的影响

用脉冲激光沉积法(PLD)在多孔硅(PS)衬底上生长ZnS薄膜,分别在300℃、400℃和500℃下真空退火。用X射线衍射(XRD)和扫描电子显微镜(SEM)研究了退火对ZnS薄膜的晶体结构和表面形貌的影响,并测量了ZnS/PS复合体系的光致发光(PL)谱和异质结的I-V特性曲线。研究表明,ZnS薄膜仅在28.5°附近存在着(111)方向的高度取向生长,由此判断薄膜是单晶立方结构的-βZnS。随着退火温度的升高,-βZnS的(111)衍射峰强度逐渐增大,且ZnS薄膜表面变得更加均匀致密,说明高温退火可以有效地促进晶粒的结合并改善结晶质量。ZnS/PS复合体系的PL谱中,随着退火温度升高,ZnS薄膜的自激活发光强度增大,而PS的发光强度减小,说明退火处理更有利于ZnS薄膜的发光。根据三基色叠加的原理,ZnS的蓝、绿光与PS的红光相叠加,ZnS/PS体系可以发射出较强的白光。但过高的退火温度会影响整个ZnS/PS体系的白光发射。ZnS/PS异质结的I-V特性曲线呈现出整流特性,且随着退火温度的升高其正向电流增加。     

制备及钝化条件对多孔硅发光性能的影响

研究了氧化电流密度对多孔硅（PS）PL谱的影响。结果表明，随着氧化电流密度增大，PS的微晶Si平均尺寸减小，且尺寸的微晶Si数量也减少，说明制备条件对钝化PS的发光有影响；PS经适当的高温氧化处理后，其PL谱会发生明显变化；选用含有胺基的正丁胺，采用射频辉光放电法对PS进行钝化处理，在一定程度上提高了PS的发射强度伴随发光峰值的较大蓝移；其钝化PS的荧光谱随钝化温度和钝化时间变化，说明钝化条件对钝化PS的发光有直接影响。由此，可以通过调节制备和钝化条件来获得最大的发光效率和所需要的发光颜色。     

Fundamental Tradeoff between Emission Intensity and Efficiency in Light‐Emitting Electrochemical Cells

The characteristic doping process in polymer light‐emitting electrochemical cells (LECs) causes a tradeoff between luminescence intensity and efficiency. Experiments and numerical modeling on thin film polymer LECs show that, on the one hand, carrier injection and transport benefit from electrochemical doping, leading to increased electron‐hole recombination. On the other hand, the radiative recombination efficiency is reduced by exciton quenching by polarons involved in the doping. Consequently, the quasi‐steady‐state luminescent efficiency decreases with increasing ion concentration. The transient of the luminescent efficiency shows a characteristic roll‐off while the current continuously increases, attributed to ongoing electrochemical doping and the associated exciton quenching. Both effects can be modeled by exciton polaron‐quenching via diffusion‐assisted Förster resonance energy transfer. These results indicate that the tradeoff between efficiency and intensity is fundamental, suggesting that the application realm of future LECs should be sought in high‐brightness, low‐production cost devices, rather than in high‐efficiency devices.     

量子点电致发光器件发光层能级变化与驱动电压的关系研究

以量子点电致发光器件(QLED)中能级分布和载流子浓度的关系为理论基础,研究了QLED发光层能级变化与驱动电压的关系,建立了数学模型.以CdSe/ZnS核壳结构量子点为发光层,计算了器件正常发光时的阈值电压,分析了电流密度与量子点中电子准费米能级与空穴准费米能级之差的关系.结果表明,当驱动电压大于9.8V时,CdSe/ZnS中电子的准费米能级与空穴的准费米能级之差大于1.03 eV,量子点电致发光器件正常发光;理论模型证实由于电子在发光层与电子传输层界面的大量积聚,导致淬灭发生,降低发光效率.     

ZnO/PS异质结的光学和电学性质

用脉冲激光沉积的方法在多孔硅(PS)衬底上沉积ZnO薄膜,在室温下测量了ZnO/PS异质结的结构及光学和电学性质.X射线衍射仪和扫描电子显微镜测量表明,制备的ZnO薄膜具有一定的c轴取向,但薄膜存在较多缺陷.光致发光谱显示,PS的发光与ZnO的发光相叠加,呈现白光发射.对异质结I-V特性曲线的测量表明,异质结呈现出与普通二极管不同的整流特性,其反向电流不饱和,据此提出了能带模型.     

应变Si/SiGe沟道功率UMOSFET的模拟分析

提出一种应变Si/SiGe UMOSFET结构,并与Si-UMOSFET器件的电流-电压特性进行比较;对SiGe区域在UMOSFET器件中的不同厚度值进行静态电学仿真。应变Si/SiGe异质结能够有效地提高沟道区载流子的迁移率,增大IDS,降低Vth及器件的Ron;且应变异质结与载流子有效传输沟道距离的大小,对器件的Vth、Isat、V(BR)DSS及电流-电压特性都有较大的影响。因此在满足击穿电压要求的基础上,应变Si/SiGe沟道异质结的UMOSFET相对Si-UMOSFET在I-V特性和Ron方面有较大的改进。     

Numerical Analysis on Current Transport Characteristics in Single Layer Organic Electroluminescent Devices

A new model to describe I-V characteristics of organic light-emitting devices (OLEDs) is developed based on experimental results. The dependence of I-V characteristics on energy barrier, trap density and carrier mobility is analyzed. The result shows that this model combines the Fowler-Nordheim tunnel theory and the trap charge limited current theory with exponential trap distribution (TCL), and it describes the current transport characteristics of OLEDs more comprehensively. The I-V characteristics follow Fowler-Nordheim theory when the energy barrier is high, the trap density is small and the carrier mobility is large.In other cases they follow the TCL theory.     

A new I-V model for stress-induced leakage current includinginelastic tunneling

A new I-V model to quantitatively represent stress-induced leakage current (SILC) is presented and compared with the experimental I-V characteristics. The trap-assisted tunneling model is modified so as to include the energy relaxation of tunneling electrons, which has been experimentally verified by applying the carrier separation technique to MOSFETs with the SILC component. The energy relaxation is treated in the new model as the change in the energy level of traps before and after the capture of electrons during two-step tunneling. It is demonstrated that this model successfully represents the experimental I-V characteristics of the SILC component and, particularly, the low apparent barrier height in the Fowler-Nordheim (FN) plot of the SILC component. The calculated low barrier height is attributed to the dominance of direct tunneling mechanism on both tunneling into traps and out of traps. The impact of the energy relaxation during tunneling, used in the present model, on the I-V characteristics is discussed in terms of the trap distribution inside the gate oxide, compared with conventional elastic tunneling model     

YAG:Ce,Yb近红外下转换荧光粉中的离子簇集

通过457 nm和915 nm连续激光器对固相反应法和溶胶-凝胶法制备的YAG:Ce,Yb荧光粉中的Yb3+近红外发光和可见上转换发光能量转移机制进行了研究。两种激发下,溶胶-凝胶法样品的近红外发光猝灭浓度均在5%左右,发光强度变化曲线趋势相近;固相反应法产物,915 nm直接激发猝灭浓度为5%左右,457 nm间接激发猝灭浓度为10%左右,说明固相反应法掺杂离子分布更不均匀。样品中存在来自Yb3+到杂质离子间能量传递和Yb3+-Yb3+离子对的两种上转换发光;固相反应法产物Yb3+-Yb3+离子对协同发光强于溶胶-凝胶法产物,说明Yb3+离子簇集现象较为明显,可能降低此类材料的实际近红外转换效率。     

Exciton‐Adjustable Interlayers for High Efficiency,Low Efficiency Roll‐Off,and Lifetime Improved Warm White Organic Light‐Emitting Diodes (WOLEDs) Based on a Delayed Fluorescence Assistant Host

Recently, a new route to achieve 100% internal quantum efficiency white organic light‐emitting diodes (WOLEDs) is proposed by utilizing noble‐metal‐free thermally activated delayed fluorescence (TADF) emitters due to the radiative contributions of triplet excitons by effective reverse intersystem crossing. However, a systematic understanding of their reliability and internal degradation mechanisms is still deficient. Here, it demonstrates high performance and operational stable purely organic fluorescent WOLEDs consisting of a TADF assistant host via a strategic exciton management by multi‐interlayers. By introducing such interlayers, carrier recombination zone could be controlled to suppress the generally unavoidable quenching of long‐range triplet excitons, successfully achieving remarkable external quantum efficiency of 15.1%, maximum power efficiency of 48.9 lm W⁻¹, and extended LT50 lifetime (time to 50% of initial luminance of 1000 cd m⁻²) exceeding 2000 h. To this knowledge, this is the first pioneering work for realizing high efficiency, low efficiency roll‐off, and operational stable WOLEDs based on a TADF assistant host. The current findings also indicate that broadening the carrier recombination region in both interlayers and yellow emitting layer as well as restraining exciplex quenching at carrier blocking interface make significant roles on reduced efficiency roll‐off and enhanced operational lifetime.