In_(0.15)Ga_(0.85)As/GaAs和GaAs/Al_(0.3)Ga_(0.7)As量子阱的静压下光致发光的对照研究

在77K,0—60kbar范围内对在同一衬底上生长的In_(0.15)Ga_(0.85)As/GaAs和GaAs/Al_(0.3)Ga_(0.7)As量子阱的静压下的光致发光进行了对照研究。在GaAs/Al_(0.3)Ga_(0.7)As量子阱中同时观察到导带到轻重空穴子带的跃迁。而在In_(0.15)Ga_(0.85)As/GaAs阱中只观察到导带到重空穴子带的跃迁。与GaAs/Al_(0.3)Ga_(0.7)As的情况相反,In_(0.15)Ga_(0.85)As/GaAs 量子阱的光致发光峰的压力系数随阱宽的减小而增加。在压力大于48kbar时观察到多个与间接跃迁有关的发光峰,对此进行了简短的讨论。     

Photoresponse study of normal incidence detection in p-type GaAs/AIGaAs multiple quantum wells

We studied p-type GaAs/AIGaAs multiple quantum well (MQW) materials as a possible alternative to the current n-type GaAs/AIGaAs MQWs for infrared detection. The advantage of p-type MQWs is that absorption of infrared radiation at normal incidence is not selection rule forbidden as it is for the n-type. We have verified that significant photoresponse occurs at normal incidence in p-type MQWs. We studied changes in the photoresponse spectrum as a function of well width and temperature. The MQW heterostructures were designed to use bound to continuum intersubband absorption in the GaAs valence band and to have a peak photoresponse near 8 μm. The photoresponse spectrum was compared to the first theoretical model of the bound to continuum absorption in p-type GaAs/ AlGaAs MQWs. The theoretical absorption curve was found to be in good qualitative agreement with the experimental results.     

GaAs／AlGaAs多量子阱结构的热电子效应

采用低温荧光激发光谱研究了ＧａＡｓ／ＡｌＧａＡｓ多量子阱结构中热电子的驰豫过程，在ＰＬＥ谱中首次观察到ＧａＡｓ／ＡｌＧａＡｓ多量子阱中ＬＯ声子的发射，用四能带Ｋａｎｅ模型计算了由轻、重空穴杂化效应引起的价带结构的畸变及其对声子发射谱的影响，实验和理论计算结果均表明、光激发热电子可以通过发射ＬＯ声子直接弛豫到激子态上，实现热电子的冷却。     

GaAs (110)量子阱的电子自旋弛豫

采用固态源分子束外延的方法在GaAs(110)取向衬底上生长了GaAs/AlGaAs多量子阱结构.对样品进行了低温光致发光谱和时间分辨光致发光谱的测量,结果表明激发功率和激发波长对室温下量子阱内电子的自旋弛豫时间有强烈的影响.对于常见的GaAs(100)量子阱起支配作用的D'yakonov-Perel' (DP)自旋弛豫机制,在GaAs (110)量子阱材料里被充分地抑制了.对于缺失了DP相互作用的GaAs (110)多量子阱,电子-空穴相互作用对自旋弛豫时间随激发功率变化有重要的影响.     

Spectroscopic measurement of mounting-induced strain inoptoelectronic devices

Mounting-induced strain in high-power laser diodes is studied by noninvasive photocurrent (PC) spectroscopy. We demonstrate that the strain can be determined with high accuracy by means of Fourier-transform (FT) photocurrent measurements. The optical transitions within the quantum well (QW) region of identical InAlGaAs/GaAs laser diodes which were mounted with different external strain have shown spectral shifts of up to 10 meV. The accuracy of the energy level shifts obtained by FT PC measurements is of 150 μ eV for the QW-region and 500 μeV for the waveguide region. The measured strain status of the active region is compared with model calculations to quantify the amount of strain which is transferred from the heat sink to the semiconductor device     

In_（0．2）Ga_（0．8）As／GaAs应变多量子阱结构的光调制反射和热调制反射谱的研究

对Ｉｎ（０．２）Ｇａ（０．８）Ａｓ／ＧａＡｓ应变多量子阱在７７Ｋ下的光调制反射谱（ＰＲ）和热调制反射谱（ＴＲ）进行了实验研究．对ＰＲ结果的线形拟合指认了应变多量子阱中子能级的跃迁，并与理论计算结果作了比较．实验对比确认ＰＲ中１１Ｈ、１３Ｈ等跃迁结构为非耦合态、具有电场调制机构的一阶微商性质．而１１Ｌ、３１Ｈ、２２Ｈ等跃迁结构为阶间耦合态，对这些隧穿耦合的低场调制产生三阶微商特性．     

670nm发光二极管材料的MOCVD外延生长

重点介绍了670nm LED材料的结构与制备方法,用MOCVD方法生长了较高压应变的670nm多量子阱。分析比较了670nm量子阱室温光荧光谱线宽度的影响因素,指出室温光荧光主要来源于带-带复合,荧光谱线宽度的减小是应变量子阱轻重空穴能级分离的结果,并不意味着量子阱界面质量的改进。同时介绍了二乙基锌(DEZn)的掺杂技术和掺杂浓度,通过优化掺杂条件和退火条件,p型AlInP材料获得了0.9×1018/cm3的空穴密度。外延材料制作成200μm×200μm尺寸的LED管芯,在20mA工作电流下亮度为22～24mcd。器件结果表明,用5个压应变量子阱的有源区并且采用DEZn掺杂可以制作出高亮度的670nm LED外延材料。     

Charge accumulation effects in InGaAs/GaAs [111]-oriented piezoelectric multiple quantum wells

We show that charge accumulation in piezoelectric [111]-oriented multiple quantum wells (MQWs), with average electric fields opposing the field in the barriers, inhibits the shift of optical transitions by externally applied electric fields. This effect is due to the screening of the average electric field as photogenerated electrons and holes drift towards the opposite edges in the MQW region due to this average field. The resulting dipole flattens the envelope potential and hence precludes the change of energy levels with variations of external voltage. This behavior has been observed in different device configurations employing InGaAs/GaAs MQW embedded in a p-i-n diode by low temperature photoluminescence (PL) and photocapacitance spectroscopies under different bias conditions. In addition to these ‘self-locked’ transitions we also observed other peaks in the PL spectra related to the charge accumulation effect and that are qualitatively explained using Hartree calculations.     

应力层多量子阱InGaAs/GaAs的光电流谱研究(英文)

The band configurations of the undoped strained-layer InxGa1-xAs(8 or 15nm)-GaAs(15nm) MQW with x = 0.1,0.15 and 0.2, respectively, have been investigated by photocurrent spectroscopy at the temperature range of 10- 300K. Both intersubband transitions and transitions between confined level and continuum are observed. The photocurrent peak related to the 2s or other excited states of heavy-hole exciton is also observed and the exci-tonic binding energy thus obtained is about 8meV. The valence band offset △Ev is determined to be 0.38 and 0.40 by means of two different methods. Owing to the strain effect, both electrons and heavy holes are confined in the InGaAs layers while light holes in the GaAs layers.     

100‐period, 1.23‐eV bandgap InGaAs/GaAsP quantum wells for high‐efficiency GaAs solar cells: toward current‐matched Ge‐based tandem cells

Major challenges for InGaAs/GaAsP multiple quantum well (MQW) solar cells include both the difficulty in designing suitable structures and, because of the strain‐balancing requirement, growing high‐quality crystals. The present paper proposes a comprehensive design principle for MQWs that overcomes the trade‐off between light absorption and carrier transport that is based, in particular, on a systematical investigation of GaAsP barrier effects on carrier dynamics that occur for various barrier widths and heights. The fundamental strategies related to structure optimization are as follows: (i) acknowledging that InGaAs wells should be thinner and deeper for a given bandgap to achieve both a higher absorption coefficient for 1e‐1hh transitions and a lower compressive strain accumulation; (ii) understanding that GaAs interlayers with thicknesses of just a few nanometers effectively extend the absorption edge without additional compressive strain and suppress lattice relaxation during growth; and (iii) understanding that GaAsP barriers should be thinner than 3 nm to facilitate tunneling transport and that their phosphorus content should be minimized while avoiding detrimental lattice relaxation. After structural optimization of 1.23‐eV bandgap quantum wells, a cell with 100‐period In_0.30GaAs(3.5 nm)/GaAs(2.7 nm)/GaAsP_0.40(3.0 nm) MQWs exhibited significantly improved performance, showing 16.2% AM 1.5 efficiency without an anti‐reflection coating, and a 70% internal quantum efficiency beyond the GaAs band edge. When compared with the GaAs control cell, the optimized cell showed an absolute enhancement in AM 1.5 efficiency, and 1.22 times higher efficiency with 38% current enhancement with an AM 1.5 cut‐off using a 665‐nm long‐pass filter, thus indicating the strong potential of MQW cells in Ge‐based 3‐J tandem devices. Copyright © 2013 John Wiley & Sons, Ltd.