气囊抛光技术及其研究现状

气囊抛光能够获得稳定的材料去除特性和高质量的抛光表面。回顾了气囊抛光的工作原理、特点和发展现状,对气囊抛光的关键技术进行了比较分析,包括抛光工具,进动抛光,脉动抛光,磁流体抛光,驻留时间,边缘控制和过程控制,抛光轨迹规划,磨粒场及气囊抛光应用等。研究结果表明,气囊抛光是一种值得关注的自由曲面高效精密抛光方法。     

应用于模具自由曲面的新型气囊抛光技术

为提高模具自由曲面抛光的效率和品质,提出一种基于柔性抛光理念的新型气囊抛光技术。建立相应的机器人抛光系统,研究旋转型膨胀气囊抛光工具及抛光过程中各因素对抛光表面粗糙度的影响。对气囊抛光工具的位置和姿态控制问题以及抛光工具,以一定下陷深度和倾斜角度与被抛工件接触时的接触区域的相关特性进行分析。在机器人抛光系统上进行抛光正交试验和试验数据分析,获取表面粗糙度的不同影响因数的最优参数组合,试验中被抛光曲面平均表面粗糙度达到了0.007 μm。研究结果表明,气囊抛光技术可实现抛光工具与被抛光工件的大面积柔性接触,通过气囊内部气压的调节和机器人抛光系统对抛光工具的运动轨迹和姿态的精确控制,可有效地提升自由曲面抛光的品质和效率。     

抛光垫在蓝宝石衬底化学机械抛光中的应用研究

在分析化学机械抛光中常用抛光垫的材质、性能、表面结构基础上,研究了抛光垫对蓝宝石衬底抛光质量的影响规律:材质硬的抛光垫可提高衬底的平面度;材质软的抛光垫可改善衬底的表面粗糙度;表面开槽的抛光垫可提高抛光效率;表面粗糙的抛光垫可提高抛光效率;对抛光垫进行适当的修整可使抛光垫表面粗糙;用聚氨酯类抛光垫能够使得蓝宝石衬底的抛光面小于0.3nm的表面粗糙度.     

熔融沉积成形件的表面雾化抛光实验研究

针对熔融沉积成形(Fused deposition modeling,FDM)最常用的成形材料聚乳酸(Polylactic acid,PLA),选用氯仿溶液进行表面雾化抛光,以提高FDM成形件的表面质量。研究抛光温度、抛光时间和抛光液浓度对FDM成形件表面抛光效果的影响。实验结果表明抛光表面的粗糙度随着抛光温度升高和抛光时间增加而减小,但当抛光温度和抛光时间达到一定程度后,抛光表面粗糙度并没有明显的减小。随着抛光液浓度的增大,抛光表面的粗糙度减小。采用抛光温度为60℃、抛光时间为7 min和抛光液浓度为100%时的抛光效果较好,抛光后成形件的表面粗糙度大幅减小,表面形貌得到显著改善,且对成形件的尺寸和质量影响很小。     

超声抛光的理论模型和试验分析

以P20工具钢作为被抛光工件,研究超声抛光过程中,工件微表面发生的变形情况.为探究超声抛光中表面粗糙度降低的机理,推导并建立了超声抛光的理论模型,依据该模型,讨论了抛光速度的影响因素,发现任何抛光条件下存在对应抛光极限,并引用了试验进行验证.该研究可以为超声抛光的进一步研究提供理论依据,也可为新型抛光设备的设计提供理论参考.     

不锈钢保温杯自动化机械抛光技术的研究

抛光工艺是不锈钢保温杯加工过程中很重要的一个环节,目前主要采用人工抛光模式.通过对人工抛光过程的研究,设计制作了能模拟人工抛光过程的不锈钢保温杯自动抛光试验机,并推导了抛光过程中的控制力矩与不锈钢保温杯外廓曲线、横向进给速度的关系表达式.采用正交试验设计方法设计了抛光实验方案.实验显示,在合适的抛光工艺参数下,不锈钢保温杯自动抛光试验机能自动完成抛光过程且获得的抛光质量良好.不锈钢保温杯自动抛光试验机能够满足设计要求,这为下一步开发出不锈钢保温杯全自动抛光设备奠定了基础.     

时变去除函数在气压砂轮抛光中的应用研究

针对气压砂轮抛光中通过驻留时间控制材料去除量需在模具表面多去除一层材料及抛光效率低等问题,提出了一种基于时变去除函数的抛光材料去除量控制方法。该方法以抛光工具所能达到的最大进给速度在模具表面进行抛光加工,无需多去除材料,通过实时改变抛光工具的去除能力以适应面形误差的变化,极大地缩短了抛光时间;开展了抛光材料去除过程研究,建立了气压砂轮抛光工具进给速度与面形数据和抛光去除函数之间的关系,提出了抛光过程时间的计算方法;针对时变去除能力超出抛光工具最大去除能力的问题,提出了在气压砂轮抛光中对需去除的材料进行分层抛光的思想。最后,通过抛光过程时间对材料去除量控制的两种方法进行了对比分析。研究结果表明,在气压砂轮抛光中采用时变去除函数来控制材料去除量能极大地提高抛光效率。     

电化学超声波复合拋光

电化学抛光和超声波抛光是两种重要的抛光技术,但两者的复合抛光尚属罕见。我们经过试验,认为电化学超声波复合抛光是很有发展前途的。一、电化学超声波复合抛光试验为检验电化学超声波复合抛光是否优于单一的抛光方法,我们做了对比试验。即在相同的条件下观察了电化学抛光、超声波抛光及二者复合抛光的     

磁性复合流体抛光过程中水分对抛光性能的影响

磁性复合流体(Magnetic Compound Fluid,MCF)具有优异的抛光性能,然而MCF抛光液中的水分在抛光过程中流失,抛光性能随之降低,这将增加抛光成本并严重影响MCF抛光的工程应用。针对磁性复合流体抛光液在抛光过程中水分流失的问题,探究了抛光过程中MCF水分含量对MCF形貌特征、抛光区域温度、正压力与抛光质量的关系,构建MCF中水分对抛光质量的影响机理。首先,分析了抛光过程中不同水分占比抛光液对抛光性能的影响规律,采用工业相机观察MCF抛光液抛光前后的形貌特征。然后,通过总结抛光过程温升-磁流体状态-抛光作用力-抛光质量的内在联系,构建不同水分含量MCF的抛光机理。最后,通过向MCF抛光液中定量补充水分,有效地缓解了MCF抛光液抛光效果降低的问题。实验结果表明：(1)当MCF抛光液水分占比为45%时初始抛光效果较好,抛光10 min内工件的表面粗糙度由0.410μm下降到0.007μm;而使用已持续抛光50 min的MCF加工10 min后工件的表面粗糙度由0.576μm下降到0.173μm。MCF随着抛光时间的增加MCF抛光性能大幅下降;(2)随着抛光液中含水量的降低...     

用于模具自由曲面的新型气囊抛光中磨粒场的分析

为提高模具自由曲面抛光的效率和品质,提出一种基于柔性抛光理念的新型气囊抛光技术。研究了气囊抛光接触区内磨粒的运动轨迹、压力分布和抛光力的分布情况,建立了气囊抛光接触区内磨粒的运动模型、压力模型,揭示了气囊抛光接触区内磨粒直径对抛光力和被加工工件内部剪切应力的影响规律,研究了抛光过程中工件内部的剪切应力分布,明确了材料疲劳去除机理。为气囊抛光的应用奠定了理论基础。     

蓝宝石抛光技术的研究进展

本文介绍目前蓝宝石晶体主要的抛光方法，包括机械抛光、化学抛光、化学机械抛光、激光抛光等，并对它们的工作原理、特点作了分析和总结，特别对最近出现的一种新的抛光技术——激光抛光技术作了详细的介绍。     

化学机械抛光垫沟槽形状的研究及展望

在化学机械抛光过程中,沟槽形状是抛光垫性能的重要影响因素之一,它会直接影响抛光效果。本文介绍了化学机械抛光垫上沟槽的基本形状及其对抛光效果的影响,以及不同复合形状的抛光垫沟槽及其对抛光效果的影响,并就研究中现存的主要问题提出展望。     

化学机械抛光中抛光垫材料的研究与展望

在化学机械抛光中,抛光垫的材料是重要影响因素之一,它直接影响着抛光效果。本文介绍了化学机械抛光垫的基本材料、材料特性及其对抛光效果的影响,目前化学机械抛光加工中所采用的抛光垫材料及主要用途,对各种抛光垫材料在抛光过程中存在问题进行了分析,同时展望了抛光垫材料的发展趋势。     

蓝宝石基片的超光滑表面抛光技术

文中介绍了蓝宝石基片的主要抛光方法,包括浮法抛光、机械化学抛光、化学机械抛光和水合抛光等,对它们的工作原理、特点作了分析和总结。     

CVD金刚石膜抛光技术

综述了国内外ＣＶＤ 金刚石膜抛光技术的最新进展,介绍了不同抛光方法的加工机理以及工艺性能和特点。     

Prediction of the surface roughness and material removal rate in chemical mechanical polishing of single-crystal SiC via a back-propagation neural network

Chemical mechanical polishing (CMP) is a common method for realising the global planarisation and polishing of single-crystal SiC and other semiconductor substrates. The strong oxidant hydroxyl radicals (·OH) generated by the Fenton reaction can effectively oxidise and corrode the SiC substrate, and are thus used to improve the material removal rate (MRR) and surface roughness (Ra) after polishing of SiC during CMP. Therefore, it is necessary to study the material removal mechanism in detail. Based on the modified Preston equation, the effects of the CMP process parameters on the MRR and Ra after polishing of SiC and their relationship were studied, and a prediction model of the CMP process parameters, MRR, and Ra after polishing was also established based on a back-propagation neural network. The MRR initially increased and then decreased, and the Ra after polishing initially decreased and then increased, with increasing FeSO₄ concentration, H₂O₂ concentration, and pH value. The MRR continuously increased with increasing abrasive particle size, abrasive concentration, polishing pressure, and polishing speed. However, the Ra continuously decreased with increasing abrasive particle size and abrasive concentration, increased with increasing polishing pressure, and initially decreased and then increased with increasing polishing speed. The established prediction model could accurately predict the relationship between the process parameters, MRR and Ra after polishing in CMP (relative prediction error of less than 10%), which could provide a theoretical basis for CMP of SiC.     

Evolution of road-surface skid-resistance and texture due to polishing

In this paper, works are conducted to have a better understanding of the evolution of the road-surface texture due to traffic polishing. Examples are shown for two aggregates having respectively low and high - polishing-resistances. Surface profiles measured at different polishing stages are analyzed. Roughness parameters characterizing asperity height and sharpness are calculated and their evolution is compared with the friction evolution.     

磨料水射流抛光技术的研究现状

磨料水射流抛光是新出现的一种精密加工技术。本文综述了国内外学者对磨料水射流抛光技术的研究情况,介绍了磨料水射流抛光机理和各工艺参数对抛光效果的影响,指出了目前磨料水射流抛光加工中存在的问题。     

An improved polishing method by force controlling and its application in aspheric surfaces ballonet polishing

Ballonet polishing tools, soft gasbags filled with compressed gas, are taking priority over other tools in curved surfaces polishing for their adaptability to change their shape to fit the machined surfaces. However, the real contact stress would be changed by the tensile stress of the bag’s material with the change of the workpiece’s shape even if the internal pressure of the gasbag is kept at a constant value. This paper studies how the tensile stress influences the contact conditions and the contact stress, and it advances an improved ballonet polishing method by contact force controlling. As a typical application, geometry arithmetic and parameter optimization are studied on the process of aspheric surfaces polishing. Theory study and real experiments show that, it is a better way by controlling the contact force rather than by controlling the internal pressure of the ballonet.     

NC polishing of aspheric surfaces under control of constant pressure using a magnetorheological torque servo

In this paper, a method of maintaining a constant polishing pressure is proposed for a NC polishing system by controlling the polishing force during the polishing process. First, the NC polishing system is developed to resolve the force–position coupling problem encountered in common polishing processes. It mainly consists of a force control subsystem based on a magnetorheological torque servo to provide a controllable torque to polishing tool to generate the polishing force and a position control subsystem based on a general CNC lathe to control the position of the polishing tool. Second, a constant polishing pressure model is established by controlling the polishing force according to the variation of the curvature of the aspheric surfaces, and the polishing parameters for model are planned. Then, the control model of the polishing system is proposed, and a PID controller is designed for torque tracking with the actual torque feedback from a torque sensor. Finally, polishing experiments are conducted with constant force and constant pressure, respectively. Experimental results show that the surface roughness is greatly improved, the aspheric surfaces can be polished more uniformly with constant pressure than with constant force, and the PID controller can meet the requirements for the polishing force control.