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1.
Organic electroluminescent thin film using TPD as an emitting layer with structure of Glass/ITO/TPD/Al is fabricated. Its V-I curve, V-B curve and electroluminescent spectra are measured and analysed.The blue emission with luminance of 0.74 cd/m 2 and luminous efficiency of 1.35×10 -3 lm/W is achieved at DC voltage of 24 V.  相似文献   

2.
A novel approach of two-step laser crystallization for the growth of poly-Si thin film on glass substrate is investigated. Using this approach, we fabricated poly-Si thin film transistors with electron mobility of 103 cm2/V·s and on/off current ratio of 1×10~7.They are better than those of the poly-Si TFTs fabricated by conventional single-step excimer laser crystallization. We also analyzed the structure of the laser crystallized poly-Si thin film by spectroscopic ellipsometry, and proposed the models to simulate the poly-Si thin film and calculated the ellipsometric spectra. The calculated results are in good agreement with the measured results.  相似文献   

3.
The a -Si:H film with different thickness smaller than 1μm were deposited by plasma enhanced chemical vapor deposition (PECVD) under the optimum deposition contitions.The effect of diferent thickness on film properties is analyzed.The results show that,with the increase of the film thickness,the dark conductivity ,photoconductivity and threshold voltage increase,the optical gap and peak ratio of TA to TO in the Raman spectra decrease, the refractive index keeps almost constant, and the optical absorption coefficient and current ration of on/off state first maximize and then reduce.  相似文献   

4.
From the analysis of infrared(IR)transmission spectrum,it was showed that the SiOx,films were produced when polymethyl phenethyl silane(PMPES)was treated with O2-plasma,where the x ranged from 1.5 to 2.This film has a positive flat band voltage on the curve of high requency C-V chart,its value is dependent on the condition of O2-plasma treatment and the thickness of PMPES film.  相似文献   

5.
The a-Si∶H films with different thickness smaller than 1 μm were deposited by plasma enhanced chemical vapor deposition (PECVD) under the optimum deposition conditions. The effect of different thickness on film properties is analyzed.The results show that,with the increase of the film thickness,the dark conductivity, photoconductivity and threshold voltage increase, the optical gap and peak ratio of TA to TO in the Raman spectra decrease, the refractive index keeps almost constant, and the optical absorption coefficient and current ratio of on/off state first maximize and then reduce.  相似文献   

6.
Composites consisting of hydrogenated amorphous silicon (a-Si: H, inorganic) and zinc phthalocyanine (ZnPc, organic) were prepared by vacuum evaporation of ZnPc and sequential deposition amorphous silicon via plasma enhanced chemical vapor deposition (PECVD). The optical and electrical properties of the composite film have been investigated. The results demonstrate that ZnPc can endure the temperature and bombardment of the PECVD plasma and photoconductivity of the composite film was improved by 89.9% compared to pure a-Si: H film. Electron mobility-lifetime products/lr of the composite film were increased by nearly one order of magnitude from 6.96 × 10^-7 to 5.08 × 10^-6 cm2/V. Combined with photoconductivity spectra of the composites and pure a-Si: H, we tentatively elucidate the improvement in photoconductivity of the composite film.  相似文献   

7.
The surface conductivity of poly [2-methoxy-5-(3 '-methyl)butoxy]-p-phenylene vinylene (PMOMBOPV) films doped with FeCl3 and H2 SO4 by chemical method and implanted by N ions was studied and the comparison of environmental stability of conductive behavior was also investigated. The energy and dose of N ions were in the rang 15~35 kev and 3. 8× 1015 ~9. 6× 1016 ions/cm2, respectively. The conductivity of PMOMBOPV film was enhanced remarkably with the increases of the energy and dose of N ions. For example, the conductivity of PMOMBOPV film was 3.2 × 10-2 S/cm when ion implantation was performed with an energy of 35 kev at a dose of 9. 6 × 1016 ions/cm2 , which was almost seven orders of magnitude higher than that of film unimplanted. The environmental stability of conductive behavior for ionimplanted film was much better than that of chemical doped films. Moreover, the conductive activation energy of ion-implanted films was measured to be about 0.17 eV.  相似文献   

8.
The formaldehyde(HCHO) detecting at room temperature is of great significance.Different ratios of P3HT/ZnO composite films(3:1,1:1,and 1:3) were deposited on the organic thin film transistor(OTFT) by spray-deposition technology,and the electrical properties and HCHO-sensing properties of all the prepared OTFT devices were measured by Keithley 4200-SCS source measurement unit.The results show that the OTFT sensor based on the P3HT/ZnO films with the ratio of 1:1 exhibited the best output and transfer curves.Different changing tendency were observed with the increase of ZnO proportion when exposed to HCHO at room temperature,and the device with the ratio of 1:1 behaved a good response and recovery characteristics.  相似文献   

9.
《半导体光子学与技术》2010,(4):146-149,166
In this paper, the reflective spectra of a refraction index sensor were analyzed based on fiber grating F-P cavity. The sensor was constituted by two identical fiber gratings. Compared with the refraction index sensor using one fiber grating, the fiber grating F-P cavity sensor has narrower resonant peak and it can be used for more accurate measurement. The resonant peaks in the reflective spectra of the sensor are changed with small changes of the refraction index of the measured chemical liquids or cell samples. So it has potential applications in biology and chemistry.  相似文献   

10.
The carrier recombination was one of the factors limiting the further improvement of the Cu2ZnSnS4 (CZTS) thin film solar cells. In this paper, a proper bandgap structure was designed to solve this problem. The effects of the different bandgap structure on the CZTS thin film solar cells were studied by the solar cell performance simulation software wxAMPS. A graded bandgap structure was designed and optimized. The bandgap with a front bandgap gradient and a flat bandgap gradient had a favorable effect on the CZTS thin film solar cells. Finally, the fill factor (FF) and conversion efficiency (η) of the CZTS thin film solar cell were increased from 36.41% to 42.73% and from 6.85% to 10.03%, respectively. In addition, the effect of donor and acceptor defect densities in CZTS absorber layer near the CdS/CZTS interface on the device performance was studied, η of the CZTS thin film solar cell was increased from 5.99% to 7.55% when the acceptor defect concentration was 1012—1013 cm-3. Moreover, the thicknesses of the CZTS absorber layer were optimized. The FF and η of the CZTS thin film solar cell were increased to 63.41% and 15.04%, respectively.  相似文献   

11.
首次报道了采用8-羟基喹啉镓螯合物作为发光层制备有机薄膜电致发光器件,器件的结构为:ITO导电玻璃/TPD/Gaq3/Al。研究了Gaq3薄膜的光致发光和器件的电致发光机理,同时测量和研究了器件的电流密度--电压(J-V)特性和发光亮度-电压(B-V)特性。结果表明器件的电致发光峰值波长为540nm,在20V直流电压驱动下的最大发光亮度约2500cd/m^2明显高于上同结构和工艺参数制备的Alq3  相似文献   

12.
低电阻率介质层制备低压驱动薄膜电致发光器件的研究   总被引:2,自引:0,他引:2  
采用Ta2O5/SiO2,5a2O5/Al2O3复合介质制备出2低压驱动ZnS:Mn薄膜电致发光器件,它的阈值电压在40V以下。当驱动电压国60频率为50Hz时,发光亮度在300cd/m^2以上,发光层中平均电场强度为10^5V/cm数量级。这种器件具有其独特的亮主压特性、频率特性和电荷存储量-电压特性。  相似文献   

13.
以8-羟基喹啉(q)和1,3-二苯基-1,3-丙二酮定向合成了有机小分子配合物Znq(DBM),将其作为发光层制备了单色有机电致发光器件(OLED)。在结构为ITO/m-MTDATA(5nm)/NPB(40nm)/Znq(DBM)(60nm)/LiF(0.5nm)/Al(100nm)的器件中,启亮电压为5V,最大亮度达到4 575cd/m2。同时又在器件中引入间隔层BCP,研究其不同厚度对OLED性能的影响。在结构为ITO/m-MTDATA(5nm)/NPB(40nm)/BCP(x nm)/Znq(DBM)(60nm)/LiF(0.5nm)/Al(100nm)的器件中,当BCP层厚为0nm时,发光颜色为黄绿色;当BCP层厚为1nm时,发光颜色为白色,色坐标为(0.29,0.33),最大亮度为2 231cd/m2;当BCP层厚为5nm时,发光颜色为蓝色。根据器件结构和性能,讨论了其内部机理。  相似文献   

14.
合成了八羟基喹啉铝和八羟基喹啉锌.测量了粉末和薄膜的荧光光谱.并分析了从粉末到薄膜发射峰红移的原因。制备了单层和双层的器件,从载流子注入平衡的角度分析了器件的救率变化的原因。  相似文献   

15.
聚对苯撑苯并双(口恶)唑发光及其器件制备   总被引:2,自引:0,他引:2  
采用光谱技术,研究了聚对苯撑苯并双(口恶)唑(PBO)溶液的光敏发光特性,并用相对法估算出溶液发光效率在50%范围.结合光谱技术、半导体电学和电化学等研究手段,具体研究了以PBO为发光层的单层电致发光器件,研究结果显示,电致发光与薄膜的光致发光有具有相同的发光中心,峰值位于510 nm左右.同时发现,由于存制备过程中不同处理条件使得不同厚度薄膜残留的掺杂物质浓度不同,从而引起薄膜的导电性的不同.使得器件的阈值场强随PBO厚度的减小而逐渐增加.  相似文献   

16.
Thin film direct-current electroluminescent devices with ZnS:Mn as the active light-emitting layer have been fabricated on Si wafers. The devices incorporate a high-efficiency electron injector layer capable of passing high current densities (>10-2A cm-2dc) through the active layer. A useful luminance of 78 fL has been achieved at 48V, significantly lower voltage than for conventional ac thin film or dc powder electroluminescent devices. The structure also includes a potential energy step at the interface between SiO2and ZnS due to the difference in electron affinities which offers the possibility of hot electron injection into the active layer. The unique combination of efficient cathode emission and hot injection possible in these devices suggests that a solid state analogue of the cathode ray tube may be realizable.  相似文献   

17.
High performance organic light-emitting devices (OLEDs) have been investigated by using fluorescent bis (2-methyl-8-quinolinolato)(para-phenylphenolato)aluminum(BAlq) as an emissive layer on the performance of multicolor devices consisting of N, N'-bis-(1-naphthyl)-N,N'diphenyl- 1,1'-biphenyl-4,4'- diamine (NPB) as hole transport layer. The results show that the performance of heterostructure blue light-emitting device composed of 8-hydroxyquinoline aluminum (Alq3) as an electron transport layer has been dramatically enhanced. In the case of high performance heterostructure devices, the electroluminescent spectra has been perceived to vary strongly with the thickness of the organic layers due to the different recombination region, which indicates that various color devices composed of identical components could be implemented by changing the film thickness of different functional layers.  相似文献   

18.
有机电致发光显示板   总被引:3,自引:1,他引:2  
本文介绍高性能多层有机电致发光显示器件。该器件可分为三类。多层器件的发光亮度超过100cd/m’,驱动电压低于20V。文章也介绍了高亮度器件的发光机理和器件的稳定性。  相似文献   

19.
MIM薄膜二极管Ta_2O_5绝缘膜的AFM分析及其I-V特性研究   总被引:3,自引:1,他引:2  
制备了一种用于有源矩阵液晶显示的Ta-Ta2O5-Ta 结构MIM 薄膜二极管。其中,作为介质层的Ta2O5 膜由不同成膜技术得到。采用原子力显微镜(AFM)对Ta2O5 膜进行了表面形貌分析,并对其MIM 二极管的伏安特性进行了测试与比较。结果表明,用溅射/阳极氧化二步法制备的Ta2O5 膜作绝缘层的MIM 二极管,其I-V特性的非线性系数β= 25,远高于阳极氧化法及溅射法所得Ta2O5 膜的MIM 二极管的非线性系数(β= 9和5),电流通断比(105)分别较阳极氧化法及溅射法工艺制备的MIM-TFD高1和3 个数量级,且其伏安特性的对称性也较好  相似文献   

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