电源类型对短电弧-电化学复合加工放电凹坑影响研究

放电凹坑大小影响着加工表面形貌的一致性,放电凹坑的凸起高度及凹坑表面的重铸层对加工表面质量有重要影响。文章基于短电弧-电化学复合加工方法,在直流与脉冲两种常用电源类型下对钛合金TC4进行单次放电实验,分析两种电源类型下的短电弧-电化学复合加工单次放电凹坑尺寸及影响规律;结合单次放电凹坑实验所采集到的波形与电弧放电过程仿真模型对电弧放电过程的等离子体放电通道变化进行研究。研究结果发现,直流与脉冲放电凹坑的尺寸与影响规律差异与电弧的断弧方式有关,不同的断弧方式对等离子体放电通道产生影响,直流电弧倾向于通过流体介质运动和极间距离改变进行断弧,而脉冲电弧通过脉冲后沿电压变化和极间距离改变进行熄弧。这两种断弧方式不仅影响了凹坑的尺寸形貌,也影响了断弧后的电化学腐蚀效果。     

导电性工程陶瓷材料的放电加工研究

通过专用脉冲电源脉冲放电能量的控制,进行了导电性工程陶瓷材料的电火花放电加工试验研究,提供了一种稳定加工导电笥工程陶材料且能控制加工质量的电火花放电加工方法。     

基于模糊控制的微细电火花加工脉冲电源研究

设计了一套微细电火花加工脉冲电源,该电源采用有效放电火花数检测方法对放电状态进行统计,并利用模糊控制算法对脉冲宽度和脉冲间隔进行调整以改善加工性能。试验结果表明,该脉冲电源在保证加工稳定性的基础上,能够有效地提高加工精度及加工效率。     

电火花微细孔加工电极损耗实验研究

用实验的方法研究电火花微细加工中放电能量在极间的分配和对电极损耗的影响，并研究式具电极材料和工件材料对电极损耗的影响，实验表明，从减小电极损耗，增加有用功率出发，电火花微细加工应使用微能窄脉冲电源。     

磁控溅射中频电源仿真研究

磁控溅射中频电源及其辉光放电负载是一个典型的强非线性时变系统，对该系统建模并求其解析解是相当困难的。使用Simulink对磁控溅射中频电源建模，对电源工作时各种工况下输出电流波形进行了研究，研究表明，这种仿真方法对电源系统设计有效，可以推广应用。     

超声频间隙脉冲放电加工研究──Ⅰ基本原理分析

超声频间隙脉冲放电加工研究Ⅰ基本原理分析贾志新（哈尔滨工业大学）张建华，艾兴（山东工业大学）【编者按】作者提出了超声频间隙脉冲放电加工新技术，并对该技术进行了理论分析和加工实验。本刊将从本期起分四次刊出超声频间隙脉冲放电加工的基本原理、工作液选择、理...     

基于C8051单片机的电火花线切割自适应电源研究

对电火花线切割脉冲电源的原理进行了探讨与分析,介绍了一种基于C8051单片机的新型电火花线切割自适应电源的设计方法.对放电状态进行在线检测,该系统能够通过对放电脉冲的自适应调整,使极间放电状态总是处于理想状态,能够较好地适应加工条件的剧烈变化,大大提高了线切割加工过程的稳定性和加工品质.     

EDM技术的过去和现状

电火花加工是利用浸在工作液中的两极间脉冲放电时产生的电蚀作用蚀除导电材料的特种加工方法,又称放电加工或电蚀加工,英文简称EDM。一、电火花加工的发展回顾及基本工艺1943年,苏联学者拉扎连科夫妇研究发明电火花加工,之后随着脉冲电源和控制系统的改进,而迅速发展起来。最初使用的脉冲电源是简单的电阻-电容回路。50年代初,改进为电阻-电感-电容等回路。同时,还采用脉冲发电机之类的所谓长脉冲电源,使蚀除效率提高,工具电极相对损耗降低。随后又出现了大功率电子管、闸流管等高频脉冲电源,使在同样表面粗糙度条件下的生产率得以提高。…     

瞬短脉冲辉光放电飞行时间质谱仪

本文介绍了本实验室研制的瞬短脉冲辉光放电飞行时间质谱仪。其中，辉光放电离子源具有离子产额高、工作稳定可靠等特点，可用于对金属（合金）样品的直接分析。该仪器为国内首台自制的常压（低真空）等离子体飞行时间质谱仪，亦为国际上首台瞬短脉冲辉光放电质谱仪，为研究瞬短脉冲辉光放电及其应用这一新兴领域打下了基础，仪器的分辨本领优于５００。     

超声频间隙脉冲放电加工研究

作者提出了超声频间隙脉冲放电加工新技术，并对该技术进行了理论分析和加工实验。本刊将从本期起分四次刊出超声频间隙脉冲放电加工的基本原理、工作液选择、理论分析和实验研究。     

A modular bipolar power supply for high-power ion-plasma installations

The circuitry solutions, design, and main parameters of a modular pulse bipolar power-supply unit for high-power ion-plasma facilities are described. The modular principle of designing power supplies provided their application in various processes. The results of tests of the developed device as the power supply of a magnetron sputtering system with a power of 60 kW and a high-voltage power supply of the substrate bias voltage with a power of up to 40 kW are presented. The efficiency of applying bipolar pulses for preventing arcing at the magnetron cathode is experimentally demonstrated.     

A synchronized emissive probe for time-resolved plasma potential measurements of pulsed discharges

A pulsed emissive probe technique is presented for measuring the plasma potential of pulsed plasma discharges. The technique provides time-resolved data and features minimal disturbance of the plasma achieved by alternating probe heating with the generation of plasma. Time resolution of about 20 ns is demonstrated for high power impulse magnetron sputtering (HIPIMS) plasma of niobium in argon. Spatial resolution of about 1 mm is achieved by using a miniature tungsten filament mounted on a precision translational stage. Repeated measurements for the same discharge conditions show that the standard deviation of the measurements is about 1-2 V, corresponding to 4%-8% of the maximum plasma potential relative to ground. The principle is demonstrated for measurements at a distance of 30 mm from the target, for different radial positions, at an argon pressure of 0.3 Pa, a cathode voltage of -420 V, and a discharge current of about 60 A in the steady-state phase of the HIPIMS pulse.     

Decrease in the ignition pressure of anomalous glow discharge in a magnetron with an ion-beam-irradiated cathode

The influence of an ion beam injected along the axis of the anode electrode of a planar magnetron on the initiation of an anomalous low-pressure glow discharge in a magnetron has been considered. The characteristics of the discharge ignition at pressures <8 × 10^?2 Pa and the properties of a planar magnetron with an ion-beam-irradiated cathode are determined. It is established that the discharge ignition voltage decreases with an increase in the ion energy and exhibits a threshold behavior as a function of the ion-beam current. It is shown that there is a prospect for extending the functional capabilities of planar magnetrons through matching of the modes of sputtering of the magnetron anode and cathode by an ion beam and plasma ions of an anomalous glow discharge, respectively.     

基于DSP的直流磁控溅射电源设计

该文通过研究磁控靶工作时的负载特性,设计了以全桥逆变开关电源技术为基础的高效、大功率磁控溅射电源。利用Matlab搭建的模型对电路的参数、输出波形进行了仿真,在仿真的基础上完成了主回路、控制电路硬件及软件程序的设计及样机测试,并在JTP-1400型磁控溅射镀膜机上进行了实验。实验结果证实该电源具有恒流控制效果好,电流截止负反馈反应迅速,工作稳定等优点。     

磁控溅射技术进展及应用(上)

近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。随着对具有各种新型功能的薄膜需求的增加,相应的磁控溅射技术也获得进一步的发展。本文将介绍磁控溅射技术的发展,以及闭合磁场非平衡溅射、高速率溅射及自溅射、中频及脉冲溅射等各种新技术及特点,阐述磁控溅射技术在电子、光学、表面功能薄膜、薄膜发光材料等许多方面的应用。     

A power supply for magnetron sputtering systems

A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy delivered to the arc discharge at about 110 mJ in the DC mode and 9 mJ in the pulse mode, respectively. The possibilities of optimizing coatings by selecting working parameters of the power supply were demonstrated by the example of thin-film coatings of two types (Ag and Ga-doped ZnO thin films).     

磁控溅射技术进展及应用(下)

近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。随着对具有各种新型功能的薄膜需求的增加,相应的磁控溅射技术也获得进一步的发展。本文将介绍磁控溅射技术的发展,以及闭合磁场非平衡溅射、高速率溅射及自溅射、中频及脉冲溅射等各种新技术及特点,阐述磁控溅射技术在电子、光学、表面功能薄膜、薄膜发光材料等许多方面的应用。     

Low Friction CrNMPP/TiNDCMS Multilayer Coatings

Transition metal nitrides like CrN and TiN are widely used in automotive applications due to their high hardness and wear resistance. Recently, we showed that a multilayer architecture of CrN and TiN, deposited using the hybrid—high power impulse magnetron sputtering (HIPIMS) and direct current magnetron sputtering (DCMS)—HIPIMS/DCMS deposition technique, results in coatings which indicate not only increased mechanical and tribological properties but also friction coefficients in the range of diamond-like-carbon coatings when tested at RT and ambient air conditions. The modulated pulsed power (MPP) deposition technique was used to replace the HIPIMS powered cathode within this study to allow for a higher deposition rate, which is based on the complex MPP pulse configuration. Our results on MPP/DCMS deposited CrN/TiN multilayer coatings indicate excellent mechanical and tribological properties, comparable to those obtained for HIPIMS/DCMS. Hardness values are around 25 GPa with wear rates in the range of 2 × 10⁻¹⁶ Nm/m³ and a coefficient of friction around 0.05 when preparing a superlattice structure. The low friction values can directly be correlated to the relative humidity in the ambient air during dry sliding testing. A minimum relative humidity of 13% is necessary to guarantee such low friction values, as confirmed by repeated tests, which are even obtained after vacuum annealing to 700 °C. Our results demonstrate that the co-sputtering of high metal ion sputtering techniques and conventional DC sputtering opens a new field of applications for CrN/TiN coatings as high wear resistance and low friction coatings.     

Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge

A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma is described. The metal plasma is clean and does not suffer from contamination from macroparticles, and the process can be readily scaled up for industrial production. The hardware, working principle, and operation modes are described. A matching circuit is developed to modulate the high-voltage and HPPMS pulses to enable operation under different modes such as simultaneous implantation and deposition, pure implantation, and selective implantation. To demonstrate the efficacy of the system and technique, CrN films with a smooth and dense surface without macroparticles were produced. An excellent adhesion with a critical load of 59.9 N is achieved for the pure implantation mode.