共查询到17条相似文献,搜索用时 234 毫秒
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基于JEDEC颁布的结到壳热阻瞬态热测试界面法,对测试GaN HEMT器件热特性的电学法进行了研究.通过合理的测试电路设计,有效解决了GaN HEMT器件电学法测试中的栅极保护问题和自激问题,实现了GaN HEMT器件的界面热阻测量.根据测得的热阻-热容结构函数曲线可知,GaN HEMT器件结到壳热阻主要由金锡焊接工艺和管壳热特性决定.结合结构函数分析,对金锡焊接部分热阻和管壳热阻进行排序可剔除有工艺缺陷的器件.与红外热成像法的结温测试结果进行对比分析,证实了电学法测试结果的准确性. 相似文献
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基于结构函数理论,运用改进电学测试法,对同一器件管壳与基板间的不同界面进行研究,发现其积分结构函数曲线发生了分离;通过该分离点确定器件稳态结壳热阻值,获得了器件内部各结构层的热阻分布.比较测试结果与理论值,两者基本一致.该测试方法简单、方便,比传统热阻测试法准确且重复性好.对比了采用不同封装工艺的器件的微分结构函数,观察发现,其峰值位置发生了偏移;进一步的超声波扫描证实了偏移的原因是存在焊料层空洞,提出了相应的改善措施.研究表明,利用结构函数理论分析功率VDMOS器件热特性是一种准确而可靠的方法. 相似文献
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热阻是衡量功率MOSFET器件散热能力的重要参数,对其准确测试与分析具有重要意义。基于结构函数理论,同一功率MOSFET器件在不同条件下进行两次实验,通过积分结构函数分离点来确定器件热阻。该方法简单准确,可重复性好,实验测试结果为0.5 K/W,与有限元(FE)建模获得的0.44 K/W符合较好。对比两不同批次器件的微分结构函数,其中一种器件微分结构函数发生0.2 K/W偏移,超声波扫描(SAM)发现该器件焊料层存有空洞,该方法可用来判断器件内部工艺的好坏。 相似文献
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大功率GaN HEMT器件在工作时较高的热流密度引发器件高温,而高温会显著影响器件性能及可靠性。从不同器件结构设计出发,结合器件热量传递理论,建立了器件热阻模型;采用高速红外热像仪试验分析了器件结构对GaN HEMT器件稳态热特性的影响,定量给出了不同总栅宽、不同单指栅宽、不同栅间距在不同功率密度下的稳态温升。相关结果可用于研发阶段器件结温的快速评估。 相似文献
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大功率LED的热阻测量与结构分析 总被引:4,自引:1,他引:3
热阻的精确测量与器件结构分析是设计具有优良散热性能的大功率LED的前提。本文研究了大功率LED的光功率、环境温度和工作电流对热阻的影响规律,论述了积分式结构函数和微分式结构函数的推导过程及其主要性质,提出了大功率LED热阻的精确测量方法,并利用结构函数分析及辨识大功率LED器件的内部结构、尺寸、材料、制造缺陷和装配质量。 相似文献
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基于CREE公司生产的十条栅指AlGaN/GaN HEMT器件,利用热传导方程,研究了AlGaN/GaN HEMT器件热阻随热源尺寸的变化规律及影响机理,建立了GaN HEMT器件的热传播模型并通过红外测温法结合Sentaurus TCAD模拟仿真的方法验证了模型的准确性.研究发现:热阻随热源尺寸的减小以近似指数的规律增加,随栅宽的减小以反比的规律增加.另外,在芯片尺寸、散热条件、功率密度等条件不变的情况下,栅长从1μm减小到0.05μm时,热阻大约增加80%.对该变化规律从两个方面进行了解释:一方面,热源面积越小,微观尺寸上的散热面积越小,热阻越大;另外,热源尺寸的减小会引起热源处热容的减小,产生的热量是一定的,热阻与温升成正比,因此对应的热阻增加. 相似文献
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Marcin Janicki Jedrzej Banaszczyk Gilbert De Mey Marek Kaminski Andrzej Napieralski 《Microelectronics Journal》2009,40(7):1135-1140
This paper presents dynamic thermal analyses of a power integrated circuit with a cooling assembly. The investigations are based on the examination of the cumulative and differential structure functions obtained from the circuit cooling curves recorded during transient circuit temperature measurements. The experiments carried out and the comprehensive study of the computed structure functions rendered possible determination of the interface contact resistance and the heat transfer coefficient values necessary for numerical thermal simulations illustrating the influence of these thermal model parameters on circuit temperature. 相似文献
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Thermal resistance calculation of AlGaN-GaN devices 总被引:2,自引:0,他引:2
We present an original accurate closed-form expression for the thermal resistance of a multifinger AlGaN-GaN high electron-mobility transistor (HEMT) device on a variety of host substrates including SiC, Si, and sapphire, as well as the case of a single-crystal GaN wafer. The model takes into account the thickness of GaN and host substrate layers, the gate pitch, length, width, and thermal conductivity of GaN, and host substrate. The model's validity is verified by comparing it with experimental observations. In addition, the model compares favorably with the results of numerical simulations for many different devices; very close (1%-2%) agreement is observed. Having an analytical expression for the channel temperature is of great importance for designers of power devices and monolithic microwave integrated circuits. In addition, it facilitates a number of investigations that are not practical or possible using time-consuming numerical simulations. The closed-form expression facilitates the concurrent optimization of electrical and thermal properties using standard computer-aided design tools. 相似文献
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M. Kocan G.A. Umana-Membreno M.R. Kilburn I.R. Fletcher F. Recht L. McCarthy U.K. Mishra B.D. Nener G. Parish 《Journal of Electronic Materials》2008,37(5):554-557
This paper reports results of scanning ion probe studies of silicon implantation profiles in source and drain regions of AlGaN/GaN
high-electron-mobility transistor (HEMT) heterostructures. It is shown that both the undoped channel length and the transition
region between implanted and non- implanted regions become wider with increasing depth in the structure. These results may
explain the previously reported existence of resistance associated with the transition region between implanted and non-implanted
semiconductor regions in AlGaN/GaN HEMT heterostructures with non-alloyed Si-implanted source and drain ohmic contact regions. 相似文献
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The authors observed that a trace of water vapour can have a significant degradation effect on Ohmic contact formation for AlGaN/GaN high electron mobility transistors (HEMTs). The degradation effect due to a trace of water vapour is less serious for n-GaN. This is a more serious problem for AlGaN/GaN HEMT than AlGaAs/GaAs HEMT or InP based HEMT because of the higher temperature needed for Ohmic contact annealing when AlGaN or GaN are involved. Using cooling water with a temperature slightly higher than the ambient temperature during rapid thermal annealing (RTA) appears to be the best approach. 相似文献