机械手可视化设计与仿真

针对如何运用可视化与仿真技术完成对机械手设计展开研究和讨论。本文以Solid Works软件为三维可视化设计平台,完成了对浇注机械手可视化设计的三维实体建模、装配体的静态干涉检查及关键零部件的有限元分析。     

三维虚拟仿真技术应用于高职教学的研究

本文阐述了三维虚拟仿真技术在各行业的应用情况,分析了三维虚拟仿真技术在高职教学中的迫切需要及应用前景,就目前三维虚拟仿真技术在高职教学中的应用存在的问题,提出了解决建议。     

虚拟仿真技术在中医院校人体解剖学实验教学中的应用

虚拟仿真是一种交互式的三维动态视景和实体行为的仿真系统。为了探讨虚拟仿真技术在中医院校人体解剖学实验教学中的应用,本文以河南中医药大学2022级中西医临床医学专业本科生为观察对象,将虚拟仿真技术与人体解剖学体循环静脉实验相结合,并通过章节测试和调查问卷进行评价。结果显示,虚拟仿真实验可以有效激发学生主动学习的兴趣,提高体循环静脉章节成绩以及学生对课程的评价。     

三维仿真技术在眼视光检影验光中的应用

检影验光是一种重要的眼视验光法，因其检验操作简单、检验结果客观、准确，较其他检验方法更加实用，因此得到广泛应用。然而传统的眼视光检影验光教学模式主要是教师在光学镜下通过肉眼直视观察，并将观察结果口述教导学生，由于该项教学课程内容比较抽象，导致学生学习兴趣不佳、难以理解，因此目前我国学生的眼视光检影验光学习水平普遍较差。近年来随着我国计算机技术的不断创新与发展，以计算机技术为核心的三维仿真技术的发展与应用为医学眼视光检影验光教学创造了新的发展平台，有效提高了学生的学习兴趣以及教学效率与质量。本文主要结合三维仿真技术的作用谈谈其对于眼视光教学改革的重要性及必要性，分析三维仿真技术在眼视光检影验光教学中的应用，主要从三维仿真模型、虚拟现实技术以及三维动画技术等三个方面进行具体探讨。     

基于层次操作的三维实体变形技术

研究了三维几何实体变形技术,通过对几何实体进行层次划分、变形操作来实现三维实体局部缩放、扭转和弯曲．基于层次操作的三维实体变形技术可精确控制实体的变形量,并可对几何实体实施组合变形操作,实现复杂的三维变形效果．     

计算机技术在自动化系统中的应用

阐述计算机技术在自动化控制系统中的应用，包括三维建模技术、计算机辅助技术、计算机可视化技术、计算机仿真技术、计算机编程技术、改进控制系统的可操作性、智能制造的实现。     

深亚微米集成电路制造工艺设计与仿真系统TSUPREM发展与现状

结合集成电路制造工艺仿真系统TSUPREM的发展历史，回顾了集成电路工艺仿真技术的发展，并着重介绍了Avanti公司的深亚微米工艺仿真系统TSUPREM-4 1999.4。     

三维实体造型交运算算法研究

实体间的交、并、差布尔运算是三维实体造型系统中的一种重要造型方法,利用它能够生成复杂的实体。交运算是实体布尔运算的核心,本文重点研究了三维实体交运算的算法。     

面向Micro-IMU的MEMS三维可折叠系统的设计与研制

提出了一种面向微惯性测量单元(Micro-IMU)应用的微电子机械系统(MEMS)三维可折叠结构,其主要组成部分包括绝缘层上硅(SOI)基底、聚酰亚胺柔性链、金属线以及MEMS多环陀螺仪。文章基于有限元仿真技术,分析了可折叠结构及器件的可行性。基于SOI一体化MEMS技术,将核心传感器的制作工艺与折叠结构工艺相结合,在结构中搭载单轴圆盘多环谐振微陀螺,利用柔性铰链实现结构的三维折叠以及各个传感器之间的电互连,实现单轴惯性传感器的集成,制备出体积为1cm3、质量为250mg的搭载多环谐振微陀螺的三维可折叠系统。     

雷达产品关键件制造工艺仿真分析综述

工艺设计质量对保证雷达产品优良的结构和电讯性能起着重要作用。为解决传统工艺设计费用高、效率低的问题,业界在雷达产品关键件工艺研发中引入了数值仿真技术。文中在分析雷达产品关键件结构、材料及工艺特点的基础上,首先介绍制造工艺仿真分析的技术基础,然后综述了数字化仿真技术在雷达关键件数控加工、焊接和热处理、精密成形、复合材料分析以及装联装配等工艺设计过程中的应用,最后对该领域中一些新兴前沿仿真技术的引进应用进行了展望。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.