电感耦合等离子体刻蚀InP端面的掩膜特性研究

深入研究了掩膜制作工艺对电感耦合等离子体刻蚀的InP端面的影响。首先比较了光刻胶、SiO2和Si3N4三种材料的掩膜特性，发现掩膜图形的致密性、侧壁粗糙度和垂直度等对刻蚀效果具有至关重要的影响。然后通过优化SF6等离子体刻蚀Si3N4的条件，得到了边缘平整且侧壁垂直的掩膜图形。利用这一掩膜制作技术，获得了深度达7μm的光滑垂直的InP刻蚀端面，选择比达15：1。     

GaAs材料ICP刻蚀中光刻胶厚度及刻蚀条件对侧壁倾斜度的影响

使用感应耦合等离子体(ICP)刻蚀技术刻蚀GaAs材料,在光刻过程中采用不同厚度的光刻胶,研究在同一刻蚀条件下不同光刻胶厚度对刻蚀图形侧壁倾斜度的影响,并研究了光刻胶厚度对侧壁倾角影响在不同大小图形刻蚀中的尺寸效应,提出了关于刻蚀机理的尺寸增益现象及可能发生的刻蚀离子的散射模型,解释了光刻胶厚度较大时小线宽图形侧壁倾角...     

C_(4)F_(6)/SF_(6)混合气体对硅基材料的ICP刻蚀工艺研究北大核心CSCD

为避免深硅刻蚀工艺所引起的扇贝纹效应,同时减少其工艺气体所带来的温室效应,本文将新一代环保电子刻蚀气C4F6引入硅刻蚀工艺,采用刻蚀与钝化同步进行的伪Bosch工艺刻蚀硅槽孔。研究了ICP功率、RIE功率、腔体压强和C_(4)F_(6)/SF_(6)气体流量比对刻蚀速率、光刻胶/硅刻蚀选择比及刻蚀形貌的影响。结果表明,一定程度增加ICP功率和RIE功率可分别提高等离子体密度和物理轰击刻蚀作用;腔体压强对粒子平均自由径有较大影响;而C4F6流量的增加可加强刻蚀侧壁保护机制。通过综合优化工艺参数,获得了2.8μm/min硅刻蚀速率,3.1的光刻胶/硅刻蚀选择比和侧壁平坦,表面光滑,垂直度高的刻蚀形貌。     

薄膜体声波滤波器AlN压电薄膜的ICP刻蚀研究北大核心CSCD

随着5G通信技术的发展,通信频段不断提高,以氮化铝(AlN)为压电薄膜材料的薄膜体声波滤波器作为目前唯一可集成的射频前段滤波器成为研究热点之一。本文开展AlN材料刻蚀工艺的实验研究,实验中采用光刻胶作为刻蚀掩膜,Cl2/BCl3作为刻蚀工艺气体,通过一系列工艺影响参数调整及相应刻蚀结果分析,获得了ICP源功率、RF偏压功率、腔体压强和BCl3气体流量对AlN材料和光刻胶掩膜刻蚀速率、刻蚀形貌的影响规律。通过综合优化工艺参数,最终得到了侧壁平坦、表面光滑的空气隙型薄膜体声波滤波器三明治结构。     

薄膜体声波滤波器AlN压电薄膜的ICP刻蚀研究

随着5G通信技术的发展,通信频段不断提高,以氮化铝(AlN)为压电薄膜材料的薄膜体声波滤波器作为目前唯一可集成的射频前段滤波器成为研究热点之一。本文开展AlN材料刻蚀工艺的实验研究,实验中采用光刻胶作为刻蚀掩膜,Cl_2/BCl_3作为刻蚀工艺气体,通过一系列工艺影响参数调整及相应刻蚀结果分析,获得了ICP源功率、RF偏压功率、腔体压强和BCl_3气体流量对AlN材料和光刻胶掩膜刻蚀速率、刻蚀形貌的影响规律。通过综合优化工艺参数,最终得到了侧壁平坦、表面光滑的空气隙型薄膜体声波滤波器三明治结构。     

ICP干法刻蚀GaAs背孔工艺研究

采用金属Ni作为掩膜,Cl2/BCl3作为刻蚀气体,利用感应耦合等离子体刻蚀(ICP)技术对Ga As HEMT背孔工艺进行研究。本文详细研究了ICP功率、反应室压强、Cl2/BCl3流量比以及RF功率对刻蚀速率、刻蚀形貌以及"长草"效应的影响。实验结果表明:刻蚀速率随ICP功率、Cl2/BCl3流量、RF功率的增加而增加,但随反应室压强的增加,刻蚀速率先增加后降低;相同RF功率条件下,背孔陡直性受ICP功率、反应室压强以及刻蚀气体流量比的影响十分明显;而RF功率则对背孔"长草"效应有较大影响。通过优化刻蚀条件,在ICP功率为500 W,反应室压强为0.4 Pa,Cl2/BCl3流量为20/5 m L/min,RF功率为120 W的刻蚀条件下,刻蚀背孔陡直性好,侧壁平滑,底部平整,刻蚀速率达到3μm/min。     

Pyrex玻璃金属化凹坑的湿法腐蚀

为在Pyrex玻璃基片上湿法腐蚀出易于金属化(如电镀等)的深凹坑(或凹槽),选用HF:HNO3:H3O为腐蚀液,分别以Cr/Au(30nm/300nm,溅射)加光刻胶(15μm)和Cr/Pt(30nm/300nm,溅射)加光刻胶(15μm)作为掩膜进行腐蚀实验.实验发现在Cr/Pt/光刻胶掩膜下,Pyrex玻璃的腐蚀凹坑横向钻蚀小(钻深比1.34:1),侧壁倾斜光滑,并在凹坑(深约28μm)内成功地电镀了焊盘.该实验结果对要求高深宽比沟槽的微流体器件的制造也有一定参考意义.     

基于柔性掩膜的高可靠性玻璃喷砂微加工工艺

喷砂是一种高效率的表面加工技术,将其应用于微加工领域可以实现对玻璃、硅和陶瓷等脆性材料的选择性刻蚀.本文着重探讨了掩膜性质及刻蚀条件对喷砂微加工刻蚀效率及刻蚀形貌的影响.实验中对柔性聚二甲基硅氧烷(PDMS)掩膜微结构的制备方法进行了改良,即借助精密切削工艺实现PDMS/SU-8微结构边界精确互补成形,制备了可以满足选择性刻蚀要求的掩膜结构.同时改变实验条件,研究了掩膜开口尺寸、压缩空气压强以及砂材粒径对喷砂速率及刻蚀形貌的影响.结果表明:适当增大压缩空气气压有助于待刻蚀材料从塑性到脆性的转变,刻蚀速率有明显提高.而将砂材粒径从30μm减小至20μm,可以改善成形形貌.初步研究结果表明,文中提出的玻璃喷砂微加工方法能够满足深度为500μm的玻璃通孔阵列的刻蚀要求.     

软膜紫外光固化纳米压印中Amonil光刻胶的刻蚀参数优化(英文)

报道了反应离子刻蚀转移图形过程中对Amonil光刻胶的刻蚀参数优化的结果.利用软膜紫外光固化纳米压印技术,首先制备了线宽/间距均为200 nm的纳米光栅结构.然后采用反应离子刻蚀的方法去除残留的Amonil光刻胶.研究了不同的气体组成、射频功率、压强和气体流量对刻蚀形貌、表面粗糙度以及刻蚀速度的影响.在优化的工艺条件下,获得了理想的具有垂直侧壁形貌和较小表面粗糙度的纳米光栅阵列.结果表明,选择优化的刻蚀工艺参数,既能有效地改善图形转移的性能,同时也能提高所制备结构的光学应用特性.     

硅基光子晶体板的光刻和反应离子刻蚀

用光刻和反应离子刻蚀的方法对硅材料光子晶体板的制作进行了研究。实验发现,与激光 直写曝光相比,光刻曝光更有利于胶上图形的陡直度。扫描电子显微镜测试表明,反应离子刻蚀后得到深3.3μm,晶格周期10.95μm,占空比50%的孔状光子晶体板结构,孔的陡直度保持较好,基本满足设计要求。     

Self-assembling of submicrometer three-dimensional photonic crystals in concave microzones etched on silicon substrates

By vertical sedimentation and oblique titration, silica microspheres were grown in different shapes of concave microzones that were etched on a (100) p-silicon substrate. Through scanning electron microscope observation and optical reflective spectra measurement, sedimentation of microspheres in those microzones was compared. An index was introduced to judge the efficiency of sedimentation. The comparison demonstrates that regular hexagons and triangles facilitate the growth of photonic crystals the most.     

基于金属有机框架的光子晶体制备与应用研究进展

近年来,基于光子晶体优异的光学性能和金属有机框架(MOFs)特殊的多孔结构,使基于MOFs的光子晶体研究备受研究者们的关注。本文综述了近年来MOFs材料及其在光子晶体中的应用研究进展。首先简单介绍了MOFs和光子晶体的基本概况及MOFs与光子晶体相结合的优势,然后阐述了基于MOFs的光子晶体的制备方法,进一步概括了其应用现状,并总结了当前基于MOFs的光子晶体研究所存在的困境,最后展望了其未来的发展方向。这些工作为MOFs材料在光子晶体中的实际应用提供了策略支撑。      

Tunable photonic nanojet achieved using a core–shell microcylinder with nematic liquid crystal

A tunable photonic nanojet achieved using a core–shell microcylinder with nematic liquid crystal is reported. The core–shell microcylinder can be obtained by the infiltration of liquid crystal into the air core of a microcylinder. The refractive indices of the liquid crystals can be changed by rotating the directors of the liquid crystals. Therefore, we were able to control the flow direction of the photonic nanojet in two-dimensional core–shell microcylinder structures. Using high resolution finite-difference time-domain simulation, we demonstrate that the photonic nanojet can be continuously tuned in the core–shell microcylinder. The horizontal and vertical shifts of photonic nanojet depend strongly on the director of the liquid crystals. Such a mechanism of nanojet adjustment should open up a new application for using visible light to detect nanoparticles, optical gratings, and single molecules with subwavelength spatial resolution.     

Instantaneous,Simple, and Reversible Revealing of Invisible Patterns Encrypted in Robust Hollow Sphere Colloidal Photonic Crystals

The colors of photonic crystals are based on their periodic crystalline structure. They show clear advantages over conventional chromophores for many applications, mainly due to their anti‐photobleaching and responsiveness to stimuli. More specifically, combining colloidal photonic crystals and invisible patterns is important in steganography and watermarking for anticounterfeiting applications. Here a convenient way to imprint robust invisible patterns in colloidal crystals of hollow silica spheres is presented. While these patterns remain invisible under static environmental humidity, even up to near 100% relative humidity, they are unveiled immediately (≈100 ms) and fully reversibly by dynamic humid flow, e.g., human breath. They reveal themselves due to the extreme wettability of the patterned (etched) regions, as confirmed by contact angle measurements. The liquid surface tension threshold to induce wetting (revealing the imprinted invisible images) is evaluated by thermodynamic predictions and subsequently verified by exposure to various vapors with different surface tension. The color of the patterned regions is furthermore independently tuned by vapors with different refractive indices. Such a system can play a key role in applications such as anticounterfeiting, identification, and vapor sensing.     

基于胶体微球自组装光子晶体的结构生色

综述了近年来基于胶体微球自组装光子晶体结构生色的研究进展。先简要介绍了光子晶体和结构生色理论,然后阐述了以胶体微球为基本结构基元构筑光子晶体的自组装方法,探讨了光子晶体的结构色效果的表征方式和稳固性增强方法,最后总结了用胶体微球自组装法制备光子晶体的困难并展望了发展方向。     

Raspberry-like and other hexagonal close-packed morphologies of P(St-MMA-AA) particles obtained from different emulsifiers for photonic applications.

A facile one-pot synthesis of Poly(Styrene-methyl-methacrylate-acrylic acid) P(St-MMA-AA) terpolymers by soap seeded emulsion polymerization was examined. Raspberry-like and hexagonal close-packed morphologies were conveniently obtained using Cetyltrimethylammonium bromide (CTAB), Sodium dodecyl sulphate (SDS) and Gum arabic (GA) emulsifiers. The resultant colloidal latex samples were used to fabricate coloured tunable photonic crystals via vertical deposition process. The results showed that the emulsifiers used effectively reduced the polydispersity index (PDI) and zeta potential of the terpolymer samples (Ter-PSDS, Ter-PGA and Ter-PCTAB 0.021, 0.097 and 0.076; –36.20, –35.60 and –32.80, respectively). Thus, the interfacial tension between particles that promote the formation of the stable nanosized photonic crystals is also reduced. The low PDI values are clear indication of monodispersity of the terpolymer samples. Varying the choice of emulsifiers also resulted in changes in the particles sizes as well as the resultant morphologies. The particles diameters of 117.15, 209.20 and 315.00 nm were obtained for Ter-PSDS, Ter-PGA and Ter-PCTAB, respectively. The results showed that Ter-PSDS was the most stable of all terpolymers examined. The fabricated photonic crystals were observed to reflect different wavelengths (Iridescent colours) as the observation angles changed. This could be due to the bandgap resulting from the different morphologies associated with the different emulsifiers. The variation in the colour reflectance with change in the observation angle confirms the photonic potential of the synthesized P(St-MMA-AA) crystals.     

ZnS包覆 SiO2核壳和空腔结构纳米球制备研究

ZnS包覆SiO2三维核壳结构或空腔结构纳米球可用于光子晶体的组装.本实验采用层层自组装法,利用二氧化硅模板表面的静电作用吸附纳米晶粒子,生成纳米晶包覆层,制备核壳结构的SiO2@ZnS和SiO2@ZnS：Mn^2＋纳米球.控制氢氟酸对二氧化硅的蚀刻程度,制备了空腔型硫化锌纳米球.采用XRD、UV、PL、TEM、SEM、AFM等测试手段对核壳结构和空腔型硫化锌纳米球进行了表征.结果表明ZnS纳米晶包覆SiO2后,在其表面形成了包裹紧密、形貌规整、粒径均一的ZnS壳层;经5%氢氟酸蚀刻得到的空腔纳米球结构完好、厚度均匀.     

机械力致变色光子晶体材料研究进展

目的 总结光子晶体材料在机械力致变色方面的研究现状,基于机械力致变色光子晶体的特点进行展望,为进一步研究和应用提供参考.方法 基于机械力的施加方式,从拉伸变色和压缩变色两个方面系统介绍了机械力致变色光子晶体的制备方法、光学性能以及机械性能,并分析比较了这两种光子晶体材料的应用现状和前景.结论 机械力致变色光子晶体在结构上有多种形式,包括嵌入胶体阵列的弹性体光子晶体、胶体交联光子晶体、层状光子晶体、链状光子晶体等,近些年这些光子晶体已经可以达到明亮的结构色和应变能力.机械力致变色光子晶体因其形式的多样性和良好的光学、机械性能,使其在应力检测、人体运动状态监测、防伪、显示等方面得以应用,具有很大的实际应用潜力.     

新型光学/声学带隙材料研究进展

光子晶体/声子晶体研究是材料、物理、光学、化学等学科的一个全新领域和研究热点.概述了光子晶体/声子晶体的特性及应用,比较、综述了光子晶体/声子晶体的研究进展及面临的主要问题,评述和展望了光子晶体/声子晶体的发展趋势和应用前景.     

硅槽内自组装二氧化硅光子晶体

采用溶剂蒸发法在硅片上微槽内对不同粒径的SiO2微球进行组装,尝试利用刻有微槽的硅片与平坦衬底间形成的毛细管池限制胶体晶体的生长厚度,获得了具有显著光子带隙特征的光子晶体线形阵列,并在此基础上比较了不同实验条件如微球直径、毛细管池物理限制作用等对微球排列方式及规整度的影响.