共查询到18条相似文献,搜索用时 93 毫秒
1.
采用聚乙烯醇(PVA,Mw=80000g/mol)和五水合四氯化锡(SnCl4.5H2O)作为静电纺丝前驱液,着重研究了纺丝电压、前驱液中PVA浓度及煅烧温度等因素对纺丝过程及纤维特性的影响,并用扫描电镜(SEM)和X射线衍射(XRD)等分析手段对纤维的微观结构、表面形貌和结晶状态进行了表征。结果表明,当纺丝电压为4kV、纺丝液中PVA质量分数为7%、退火温度为700℃时,可以得到平均直径为300nm的连续SnO2纳米纤维。该纤维对乙醇的响应恢复时间小于15s,检测极限低于10×10-9。 相似文献
2.
3.
4.
衬底温度对NiO:Cu/ZnO异质pn结的光电性能影响 总被引:1,自引:1,他引:0
利用磁控溅射方法改变衬底温度,制备了一系列Ni O:Cu/ZnO异质pn结。实验结果表明,当衬底温 度从室温升高到300℃时,NiO:Cu/ZnO异质pn结的整流特性明显得到 改善;与此同时,NiO:Cu/ZnO异质 pn结的光学透过率也从40%增大到80%。这可能是由于NiO:Cu薄膜结晶质量改善,薄膜内 缺陷减少所致。 继续增加衬底温度至400℃,异质结的整流特性有所削弱,这可能是 由于生长在异质结下层 的NiO:Cu薄膜影响了其上ZnO薄膜的生长,进而影响到异质结的整流特性。这一结论,得到 X射线衍射(XRD)、原子力显微镜(AFM)和紫外(UV)谱测试结果的支持。 相似文献
5.
采用聚乙烯醇(PVA,Mw=80000g/mol)和五水合四氯化锡(SnCl4.5H2O)作为静电纺丝前驱液,着重研究了纺丝电压、前驱液中PVA浓度及煅烧温度等因素对纺丝过程及纤维特性的影响,并用扫描电镜(SEM)和X射线衍射(XRD)等分析手段对纤维的微观结构、表面形貌和结晶状态进行了表征。结果表明,当纺丝电压为4kV、纺丝液中PVA质量分数为7%、退火温度为700℃时,可以得到平均直径为300nm的连续SnO2纳米纤维。该纤维对乙醇的响应恢复时间小于15s,检测极限低于10×10^-9。 相似文献
6.
利用静电纺丝技术制备SnO2∶聚乙烯吡咯烷酮(PVP)复合纳米线(NW)和纳米带(NB),然后将其应用到钙钛矿太阳能电池(PSC)来提高器件性能。首先利用静电纺丝和高温氧化制备出表面光滑、分布均匀、覆盖率可控的SnO2∶PVP NW,随后通过溶剂处理展宽得到SnO2∶PVP NB。分别将其作为电子传输层应用于钙钛矿太阳能电池,器件结构为氧化铟锡(ITO)/SnO2/SnO2∶PVP NW (NB)/FAx MA1-x PbI yC l3-y/Spiro-OMe TAD/Ag。研究发现,在纺丝接收时间70 s内,覆盖率随接收时间线性增加。与参考器件相比,覆盖率31%的SnO2∶PVP NW加入钙钛矿太阳能电池的光电转换效率(PCE)基本没有变化。将溶剂处理后得到的SnO2∶PVP NB加入钙钛矿太阳能电池,其器件的PCE从18.52%提高到20.96%。同时,由于PVP对钙钛矿具有良好的钝化作用,器件的稳定性也得到较大的改善,12天后归... 相似文献
7.
纳米硅二极管的独特性能 总被引:4,自引:0,他引:4
摘要:使用PECVD薄膜淀积技术制成的纳米硅薄膜(nc-Si∶H)具有优异的性能。把纳米硅薄膜淀积在异型的单晶硅衬底上,制成了nc-Si/c-Si异质结二极管。研制成的纳米硅二极管具有许多优于传统硅二极管的独特性能。 相似文献
8.
9.
介绍了静电纺丝制备纳米纤维的基本原理、装置及运用静电纺丝技术制备的实芯、空芯、多孔和带状等几种不同结构的纳米纤维,阐述了近年来同内外研究者通过静电纺丝技术制备出的发光纳米纤维以及光学偏振纳米纤维的相关成果及研究进展,并讨论了这类光学功能纳米纤维潜在的应用. 相似文献
10.
研究了采用垂直堆垛方式构筑的MoS2/C60范德华异质结的特性。利用直流磁控溅射法制备Mo薄膜,对Mo薄膜进行硫化退火处理得到MoS2薄膜,采用真空蒸镀法在MoS2薄膜上沉积C60进而形成MoS2/C60范德华异质结,并制备了Au/MoS2/C60/Al结构的器件。对MoS2薄膜的晶体结构进行了分析,对MoS2,C60及MoS2/C60薄膜的喇曼光谱及光吸收特性进行了测试和表征。结果表明:经过750℃退火后的MoS2晶型为2H型;由于在MoS2和C60薄膜之间范德华力的存在,相对于生长在Si/SiO2衬底上,沉积在MoS2上的C60薄膜喇曼特征峰发生红移;MoS2/C60薄膜在可见光范围内具有明显的光吸收特性;异质结表现出良好的整流特性,通过电子导电模型分析得出电子的传输机制包含热电子发射,空间电荷限制电流传导(SCLC)和隧穿现象。 相似文献
11.
12.
13.
采用后硒化Cu-Zn-Sn-S电沉积预制层的方法制备了铜锌锡硫硒薄膜,其中Cu-Zn-Sn-S预制层是通过含有不同浓度的硫代硫酸钠电解液电沉积而成的.实验发现,硒化前后薄膜的性质与硫代硫酸钠浓度密切相关.SEM,EDS,XRD,Raman和透射光谱分析表明,当硫代硫酸钠的浓度为5 mM时,沉积的薄膜形貌平整,晶粒明显,组分贫锌,具有单一的铜锌锡硫硒结构,且其带隙为1.11 eV; 在浓度高于5 mM下沉积的薄膜形貌粗糙并产生杂相硒化锡; 在浓度低于5 mM下沉积的薄膜组分严重贫锌并生成大量的Cu2SnSe3. 相似文献
14.
15.
SrBi_4Ti_4O_(15)陶瓷的制备及其电学行为 总被引:3,自引:1,他引:2
采用高强度机械混合的特殊液相沉淀法,以Sr(NO3)3、(C4H9O)4Ti和Bi(NO3)3·5H2O、为原料,制备了SrBi4Ti4O15纳米粉体。研究了前驱体的煅烧温度,粉体结构、粒度,陶瓷的烧结温度及其电性能。结果表明:制得的纳米级SrBi4Ti4O15粉体分散性好、粒径分布范围窄,显著降低了其烧结温度,较之普通固相法至少降低100℃,且粉体烧结活性较高,瓷体致密化温度在970~1000℃,成瓷效果良好。在100Hz以下,εr和tanδ随频率增加显著变小。 相似文献
16.
A. Ennaoui M. Br J. Klaer T. Kropp R. Sez‐Araoz M. Ch. Lux‐Steiner 《Progress in Photovoltaics: Research and Applications》2006,14(6):499-511
Recent progress in fabricating Cd‐ and Se‐free wide‐gap chalcopyrite thin‐film solar devices with Zn(S,O) buffer layers prepared by an alternative chemical bath process (CBD) using thiourea as complexing agent is discussed. Zn(S,O) has a larger band gap (Eg = 3·6–3·8 eV) than the conventional buffer material CdS (Eg = 2·4 eV) currently used in chalcopyrite‐based thin films solar cells. Thus, Zn(S,O) is a potential alternative buffer material, which already results in Cd‐free solar cell devices with increased spectral response in the blue wavelength region if low‐gap chalcopyrites are used. Suitable conditions for reproducible deposition of good‐quality Zn(S,O) thin films on wide‐gap CuInS2 (‘CIS’) absorbers have been identified for an alternative, low‐temperature chemical route. The thickness of the different Zn(S,O) buffers and the coverage of the CIS absorber by those layers as well as their surface composition were controlled by scanning electron microscopy, X‐ray photoelectron spectroscopy, and X‐ray excited Auger electron spectroscopy. The minimum thickness required for a complete coverage of the rough CIS absorber by a Zn(S,O) layer deposited by this CBD process was estimated to ∼15 nm. The high transparency of this Zn(S,O) buffer layer in the short‐wavelength region leads to an increase of ∼1 mA/cm2 in the short‐circuit current density of corresponding CIS‐based solar cells. Active area efficiencies exceeding 11·0% (total area: 10·4%) have been achieved for the first time, with an open circuit voltage of 700·4 mV, a fill factor of 65·8% and a short‐circuit current density of 24·5 mA/cm2 (total area: 22·5 mA/cm2). These results are comparable to the performance of CdS buffered reference cells. First integrated series interconnected mini‐modules on 5 × 5 cm2 substrates have been prepared and already reach an efficiency (active area: 17·2 cm2) of above 8%. Copyright © 2006 John Wiley & Sons, Ltd. 相似文献
17.
18.
Jun Xiang Xing Huang Gengqi Lin Jiang Tang Chen Ju Xiangshui Miao 《Journal of Electronic Materials》2014,43(7):2658-2666
Cu(In1?x Ga x )Se2 (CIGS) thin films were deposited by a one-step radio frequency (RF) magnetron sputtering process using a quaternary CIGS target. The influence of substrate temperature on the composition, structure, and optical properties of the CIGS films was investigated. All the CIGS films exhibited the chalcopyrite structure with a preferential orientation along the (112) direction. The CIGS film deposited at 623 K showed significant improvement in film crystallinity and surface morphology compared to films deposited at 523 and 573 K. To simplify the manufacturing procedure of solar cells and avoid the use of the toxic element Cd, the properties of ZnS films prepared by RF sputtering were also investigated. The results revealed that the sputtered ZnS film exhibits good lattice matching with the sputtered CIGS film with significantly lower optical absorption loss. Finally, all-sputtered Cd-free CIGS-based heterojunction solar cells with the structure SLG/Mo/CIGS/ZnS/AZO/Al grids were fabricated without post-selenization. Furthermore, the results demonstrated the feasibility of using a full sputtering process for the fabrication of Cd-free CIGS-based solar cell. 相似文献