热敷法制备丝状阴极及其在场发射中的应用

采用热敷法将碳纳米管(CNT)浆料直接热敷在Ni丝上制备成丝状阴极,并在圆柱形灯管中采用二极结构测试其场发射性能.扫描电镜(SEM)测试表明,丝状阴极的表面有一层均匀的CNT材料;场发射结果表明,CNT-Ni丝状阴极与传统的场发射阴极相比具有更优良的场发射性能,开启电场为0.15 V/μm,当电压为2280V时发射电流达到4 mA.在腔体中测试其发光亮度,最高值达到了14000 cd/m2.     

大屏幕低逸出功印刷型VGA级FED显示系统的研制

采用独有的低成本大面积低逸出功FED阴极材料及其阴极浆料研制出大面积印刷式FED,具有自主知识产权,在国内外属首创.论述印刷型场致发射显示器驱动系统的工作原理,介绍了采用DVI、VGA视频接口技术、专用集成图像灰度调制和集成扫描电路接口技术以及FPGA控制等技术.VGA分辨率的印刷型FED视频显示系统能显示各种彩色视频图像,图像亮度已达410 cd/m2、对比度达1010:1,电路灰度等级达256级,有效显示对角线尺寸为63.5 cm(25 in).     

大面积碳纳米管冷阴极的制备与研究

针对碳纳米管(CNT)阴极场发射均匀性这一关关键难题，根据CNT场发射理论制备了一种新型碳纳米管阴极印刷浆料，实验表明：质量分数约为20％的纯化CNT与4．2％的导电氧化物粘接材料混合形成的印刷浆料，其阴极具有较佳的发射均匀特性，用丝网印刷技术制作成的大面积(对角线长度大于12．5cm)阴极，再经过快速烧结技术及两步后处理工艺，既能除掉粘接材料又能使CNT很好地与衬底固定，并使碳纳米管部分直立和充分暴露，进一步改善了发射均匀性，该均匀发射的阴极开启场为2．0V／μm在电场强度阴极可望应用于场致发射显示器，液晶显示的背光源、电光源等器件。     

碳纳米管场发射阴极的厚膜工艺研究

研究了制备碳纳米管(CNT)场发射阴极的厚膜工艺,通过浆料配方和烧结工艺等方面的探索,在Si基底上制作了均匀、平整、场发射特性良好的CNT厚膜。CNT厚膜工艺研究表明,CNT浆料中银浆的最佳比例约为4.2％,最佳烧结温度为480℃(空气中),才能保证厚膜有较强的附着力,CNT又不至于全部氧化。银浆比例过大,则使高电压时场发射电流明显下降,通过对CNT厚膜的场发射特性测量得知,其开启电压为2．4V／μm,在5V／μm的电场下,场发射电流密度为27．8μA／cm^2,但发光显示情况不佳,通过使用含有机粘结剂的浆料,使显示发光情况得到了很大改善。     

用于场发射显示的大面积碳纳米纤维阴极

目前我们已经开发了用于场发射显示的碳纳米管发射体制作工艺。该工艺有希望被用于在玻璃衬底上制作大面积碳纳米管阴极,而且还可以在低于玻璃熔化点的条件下定位生长碳纳米管。在一个8×8 cm2的试验件上,展示了全部象素的特性。测试表明,在电场强度为1.79V/μm的条件下,可提供0.9mA/cm2的电流密度;在4.25V/μm的情况下可高达2.7 mA/cm2的电流密度。进而成功地同比放大制成16in阴极。我们期望所制成的大面积碳纳米管阴极,能用于32in、60in或更大面积的场发射显示器。     

基于半导体工艺制备碳纳米管阴极图形阵列

提出一种成本低、简单易行的碳纳米管图形阵列制备技术。首先在硅基底上采用热解工艺生长碳纳米管(CNT)阴极,再用光刻腐蚀法制备阴极图形阵列。研究了掩模精度及腐蚀液的浓度对图形阵列的影响,对所得到的图形样品进行XPS分析表明,图形腐蚀彻底、图形边沿轮廓清晰;以二极管结构FED测试场发射性能知:该阴极开启场1.5V/μm;在电场强度为2.0V/μm下,电流密度为58mA/mm2,发光亮度高达450cd/m2。     

基于CNT-Ni丝状阴极的场发射荧光灯

采用电泳法在金属镍(Ni)丝表面沉积碳纳米管(CNT)材料,制备成CNT-Ni丝状阴极,并在圆柱形玻璃灯管中对其进行二极结构的场发射性能测试。结果表明,CNT材料呈网状结构均匀平铺于Ni丝表面,CNT-Ni丝状阴极具有良好的场发射性能,开启场强为0.82V/μm;当阳压为3400V时,电流为2.3mA,发光亮度达到7500cd/m2;阳压为4000V时,丝状阴极场发射电流连续测试10h变化不大。     

电镀镍及阴极腐蚀法提高CNTs阴极场发射性能

通过电镀镍及阴极腐蚀相结合的方法,对电泳沉积所制备的CNT薄膜进行处理。采用扫描电子显微镜对样品的表面形貌进行表征,并对样品的场发射性能进行测试。结果表明,处理后CNT阴极的场发射性能得到提高,如开启场强、阈值电场、发光均匀性和稳定性。当电流密度为1 mA/cm2时,开启场强由0.95 V/?m降低为0.45 V/?m;当电流密度为3 mA/cm2时,阈值电场由0.99 V/?m降低为0.46 V/?m。并且,电流密度在电场为0.48 V/?m时高达7 mA/cm2。在电流密度为0.75 mA/cm2时进行20h的场发射稳定性测试,结果表明,处理后CNT阴极的电流密度在0.70 mA/cm2左右波动。该场发射性能的提高归因于三个方面：（a）更多CNT尖端直立于表面（b）CNT之间的间隙变宽（c）镍颗粒渗入降低CNT与基底的势垒。     

超微OLED的制备及其光电特性的研究

为了实现高亮度有机电致发光器件(OLED)及其尺寸的微型化,采用接触式光刻技术,通过真空热蒸镀制备了具有不同掩膜版结构的OLED。器件的结构为玻璃衬底/ITO/LiF/空穴传输层(HTL,NPD)/发光层(EML,0.5-0.6vol%Rubrene:Alq3)/电子传输层(ETL,Alq3)/阴极,其中LiF作为绝缘层。分别制得发光面积为45μm×2mm的微细器件和直径为44μm的微小器件。实验研究了其光电特性,结果表明,4.5μm×2.0mm微细器件的最大电流密度为7A/cm2,为44μm微小器件的最大电流密度为40A/cm2。     

薄膜型平栅极FED背光源的制备及性能研究

利用磁控溅射和光刻技术在玻璃基底上制备薄膜型平栅极场发射阴极阵列,采用电泳工艺将碳纳米管(CNTs)发射材料转移到薄膜型平栅结构的阴极电极表面,借助光学显微镜和扫描电镜观测薄膜型平栅极场发射阴极阵列。利用Ansys软件模拟阴栅间距对阴极表面电场分布的影响,优化其结构参数,对其场发射特性进行了讨论。实验结果表明,CNTs能均匀地分散在平栅型结构的阴极表面,当电场强度为2.4 V/μm时,器件发射电流密度达到1.8 mA/cm2,亮度达3 000cd/m2,均匀性为90%,能稳定发射28 h,且具有较好的栅控作用。该薄膜型平栅极背光源技术简单、成本低,为将来制备新一代大面积场发射背光源提供了可行性方案。     

Improvement of the field emission properties of carbon nanotubes by CNT/Fe_3O_4 composite electrophoretic deposition

A simple CNT/Fe_3O_4 composite electrophoretic deposition method to improve the field emission cathode properties of carbon nanotubes(CNTs) is proposed.It is found that CNT/Fe_3O_4 composite electrophoretic deposition leads to better field emission performance than that of single CNT electrophoretic deposition.The result is investigated using SEM,J-E and FE.After the process,the turn-on electric field decreases from 0.882 to 0.500 V/μm at an emission current density of 0.1 mA/cm~2,and the latter increase...     

分段圆型碳纳米管阴极结构的三极FED制作

利用钠钙平板玻璃形成阴极板;结合丝网印刷技术在阴极板上制作了分段圆型碳纳米管阴极结构。烧结固化的银浆层用于分别构成矩形底电极和圆型底电极,其良好的导电性能确保阴极电势能够被顺利传导给碳纳米管。对矩形底电极采取了分段条形电极形式,多个分段条形电极整体排列在阴极板表面,形成分段条形电极矩阵,改进的矩形底电极能够有效降低整体显示器的无效电压降;而制作的圆型碳纳米管层和圆型底电极用于提高碳纳米管的场发射性能。结合分段圆型碳纳米管阴极,研制了三极结构的场致发射显示器。该显示器具有良好的场致发射特性和高的图像发光亮度,能够正确显示简单的字符图像,其开启场强为2.16 V/μm。     

Gated carbon nanotube emitter with low driving voltage

By approaching the counter electrode to the carbon nanotubes (CNT) emitter, remarkable reduction of the cathode operating voltage has been accomplished in the under-gate CNT cathode structure. The peak emission current density of 2.5 mA/cm/sup 2/, which is sufficient for high brightness CNT field emission display, was obtained at the cathode-to-gate voltage of 57 V when the CNT-to-counter electrode gap was 2.2 /spl mu/m. The gate current was less than 10% of the anode current. The CNT cathode with low driving voltage can help the cost-effective field emission display implemented.     

Stable field emission from planar-gate electron source with MWNTs by electrophoretic deposition

A planar-gate electron source with multi-wall carbon nanotubes (MWNTs) has been successfully fabricated by conventional magnetron sputtering, lithography and electrophoretic deposition (EPD). The optical microscopy showed that he MWNTs purified in H₂SO₄/HNO₃ solution were selectively deposited on cathode. High resolution transmission electron microscopy (HRTEM) images and Raman spectra demonstrated that some MWNTs was destroyed and generated some defect. Field emission results indicated that the emission current of this triode structure is completely controlled by gate voltage. The turn-on voltage of electrophoretic deposited MWNTs cathode at current density of 1 μA/cm² was lower than that of screen printed MWNTs cathode besides better emission uniformity. In addition, the emission current fluctuation was less than 3% for 400 min. All the results indicate that the fabricated electron emission source has a good field emission performance and long lifetime.     

A novel structure of silicon field emission cathode with sputteredTiW for gate electrode and TEOS oxide for gate dielectric

A novel silicon field emission cathode structure with a narrow spacing between tip and gate electrode is proposed, based on the filling characteristics of the sputtered Ti_0.1W_0.9 beneath the disc-shaped tip-mask oxide. Without advanced lithography technologies, the hole diameter of the gate is reduced to a sub-half-micrometer of ~0.4 μm from an initial tip-mask size of ~1.2 μm, and the gate electrode easily approaches the cathode, leading to a low-voltage operation. A uniform and stable field emission cathode is obtained using well-established VLSI process technologies. The current-voltage (I-V) characteristics of the cathodes show low turn-on voltages of ~30 V     

Field-emission lighting tube with CNT film cathode

A novel cylinder-shaped structure field emission lighting tube (FELT) was fabricated. As an emission cathode the carbon nanotubes (CNTs) film were grown directly on the tungsten wire by pyrolysis of iron FePc, and were mounted by using elastic assembling technology. The model of electric field of this FELT was established. The electrons emitting characteristics of electronic field was measured. FELT can reach a static brightness of ∼1.6×10³ cd/m² and can be operated at 180 V. The turn-on field is 0.9 V/μm. When electronic field E=2.0 V/μm, the current density J=320 A/m².     

类石墨薄膜的场致电子发射研究

利用脉冲激光烧蚀技术在硅衬底上制备了类石墨薄膜，以该薄膜为阴极进行了场致电子发射实验。当在阴阳极之间加电场后，两极之间出现了放电现象。放电之后．类石墨薄膜的阈值电场大大降低了．当电场为20V／μm时．该薄膜的发射点密度可以达到10^6/cm^2。利用Raman光谱、扫描电镜和X射线光电子谱对薄膜的表面形貌和微结构进行了测试．薄膜中的类石墨微结构对该薄膜的场致电子发射特性起了促进作用．场致电子发射实验显示类石墨薄膜作为冷阴极电子材料具有潜在的应用价值。     

Improved field emission characteristic of carbon nanotubes by an Ag micro-particle intermediation layer

An efficient way to improve field emission characteristic of carbon nanotubes (CNTs) through an Ag micro-particle intermediation layer is presented. In this way, the intermediation layer is deposited on an indium tin oxide glass substrate by electrochemical method and then the CNTs are covered onto surface of the intermediation layer by electrophoretic method as CNT field emitters. The field emission characteristic of the CNT field emitters with the intermediation layer is significantly improved compared to the one without the intermediation layer, including decreased turn-on electric field from 4.2 to 3.1 V/μm and increased emission current density from 0.224 to 0.912 mA/cm² at an applied electric field of 6 V/μm. The improved field emission characteristic may be attributed to gibbous surface of the CNT field emitters. This efficient way is much simple, low cost, and suitable for production of large scale CNTs–based field emission cold cathode.     

碳纳米管冷阴极Pierce电子枪

为发展场致发射冷阴极毫米波电真空辐射源器件, 对利用大面积碳纳米管冷阴极产生大电流、高电流密度电子注的电子光学系统进行了研究.通过在Pierce电子枪阴极表面引入栅网结构, 解决了碳纳米管冷阴极场致发射所需的强电场和电子聚束问题.在碳纳米管冷阴极实验测试数据的基础上, 采用粒子模拟软件对上述电子光学系统进行了仿真.研究了栅网对注电流、注腰半径和电子注散射的影响, 分析了阳极电压和外加轴向磁场对电子注的聚束作用.优化后的仿真结果表明在阴极发射面为3.03 cm2时, 该电子光学系统能够产生210 mA、60 kV, 电流密度为6.7 A/cm2, 最大注半径为1mm的电子注.     

Fabrication of field emission display prototype utilizing printed carbon nanotubes/nanofibers emitters

Carbon nanotubes/nanofibers (CNTs) used as emitters, diode-type field emission display (FED) prototypes of dot matrix and character images were fabricated by low-cost techniques and equipments, respectively. The technical development in the design and fabrication of the cathode, the anode, and the panel, is described. CNTs were produced by a simple, low-cost and easily-controllable thermal chemical vapor deposition. The cathode was prepared by the screen-printing method. The field emission characteristics were enhanced by a heat post-treatment in H₂ gas atmosphere. The panel structure was packaged by a vacuum fluorescent display-like process and vacuum-sealed through an exhaust glass tube. The fully-sealed CNTs FED (c-FED) showed good emission properties. The brightness of 600 cd/m² was achieved from the yellow phosphor at a relatively low applied electric field. The developed technology has a potential practical application in c-FED.