长波红外光学系统混合被动无热化设计

结合光学被动无热化和机械被动无热化各自优势,提出一种低成本、高质量混合被动无热化方法。针对焦距75 mm,F/1的无热化镜头研制要求,分别利用光学被动无热化和混合被动无热化设计实现。对比发现,相较于传统的机械被动式无热化,混合无热化可减小补偿结构的体积和复杂性,从而有助于系统的小型化、轻量化;相较于光学被动无热化,在保证成像质量相当的情况下,可减小系统的体积和加工难度。从而证实,利用混合被动无热化技术可实现低成本、高质量的长波无热化镜头设计。     

红外成像光学系统无热化设计

红外成像光学系统受温度变化的影响非常明显,所以必须进行无热化设计.分析了温度变化对红外成像光学系统的影响,根据无热化设计技术设计一个能满足-40℃～80℃宽温度范围的红外成像系统.通过比较机械补偿法和光学补偿法两种无热化补偿技术,可以看出光学补偿法具有明显的优点.     

被动消热差的大口径离轴光学系统

为了提高大口径离轴反射式光学系统的环境适应性,设计了被动消热差的大口径离轴光学系统。首先通过技术比较,确定了机械被动式的补偿路线。随后通过光学和机械材料的选取、光机结构的优化和补偿结构的计算,利用简单机械结构实现了系统的无热化。最后对系统的设计结果进行了仿真,分析了系统在-40 ℃、20 ℃和+55 ℃的光学传递函数。分析结果表明,利用该方法实现的大口径离轴光学系统完全满足温度补偿的要求,同时具有体积小、重量轻、易于实现且补偿精度高等优点。     

基于硫系玻璃的折衍混合光学无热化镜头设计

针对非制冷红外镜头高分辨率、批量化和低成本的需求,通过硫系玻璃和锗单晶的材料搭配,利用折衍混合的设计方法,设计一款仅包含三片,可用于枪瞄、车载夜视和安防监控等领域的光学被动补偿无热化镜头。在理论推导的基础上,进行了相应的工程化设计,提出了满足精密模压生产工艺的光学设计方案。实验验证表明,该镜头在-40~55 ℃范围内成像清晰,满足指标要求。在实际工程应用中,具有生产成本低、成像性能好等特点。     

二次成像光学被动无热化设计

介绍光学被动无热化设计的原理,对二次成像系统进行热离焦分析,提出一种使物镜组和中继镜组无热化,从而实现二次成像系统无热化设计的方法。研究由三种材料4片透镜构成的镜组无热化的图解法并给出详细设计步骤。采用Ge、ZnS和CdTe三种常用的红外材料,设计一个长波二次成像光学系统。设计结果表明该系统在-60～70℃的温度范围内,具有良好的消热差、消色差性能。     

大相对孔径变焦红外光学系统无热化设计

随环境温度变化红外镜头会产生热离焦现象,一般定焦红外光学系统可通过多种红外材料组合或引入衍射面来实现光学被动式无热化设计,而变焦红外光学系统大多是通过移动透镜组来实现机械主动式无热化设计。文中根据光学变焦原理和光学被动式无热化原理,提出一种变焦光学被动式无热化设计方法,并采用该方法设计了一种大相对孔径双视场无热化长波红外光学系统。该系统焦距为25/50 mm（变倍比为2:1）,工作波段为8~12 μm,F数为0.9,可匹配640×512,像元为17 μm×17 μm的非制冷红外焦平面阵列探测器。光学设计中采用3种红外光学材料（硫系玻璃HWS6、硒化锌和锗）组合,并引入3个偶次非球面,实现变焦无热化设计。设计结果表明:该系统在宽温度范围内具有良好的成像效果和温度自适应性,在空间频率30 lp/mm处,-50℃~80℃温度范围内各视场MTF均大于0.3。该红外光学系统结构简单、工艺良好,在红外车载领域有着广泛应用前景。     

大相对孔径大面阵长波红外光学无热化镜头的设计

随着红外探测器技术不断发展和进步,长波红外成像向大相对孔径和大面阵发展。本文设计了一款用于1024×768@12 μm大面阵,F/#＝0.8的大相对孔径长波红外镜头。基于不同红外材料的温度特性以及光学被动消热差理论,此镜头采用3种红外材料组合设计和四面非球面矫正像差设计,满足了各视场的点列图及MTF曲线在－40℃~60℃温度范围内变化不大的无热化要求。该镜头具有光通量高、结构紧凑、工艺性较佳等优点。可用于车载辅助驾驶仪、机载吊舱等领域的态势感知。     

红外二次成像无热化光学系统设计与实测

阐述了二次成像红外光学系统相比于一次成像红外光学系统而言,对温度变化更加敏感的特点及其影响,讨论了基于光学被动式无热化原理的二次成像红外光学系统的设计方法。不仅给出了设计的一个红外制冷型二次成像光学系统的实例,还对该无热化镜头进行了实际加热对比成像试验,并给出了成像测试结果。设计结果表明:该系统在-40℃～+80℃的温度范围内,像质接近衍射限,最佳像面变化量在一倍焦深范围之内,焦距变化率低,实现了光学被动式无热化。实际测试结果显示,所设计的二次成像无热化光学系统,具有良好的无热化能力,高温环境下无需调焦依然清晰成像。     

一种红外镜头的被动式无热补偿设计

探讨了温度变化导致光学系统像面离焦的原理,介绍了目前国内外典型的消热方法,分析了光学系统被动式无热补偿的优势,推导了实现热补偿需要满足的无热化方程组.提出一种光学和机械相结合的无热补偿方法,采取该方案补偿后的光学镜头在环境温度发生变化时像面与传递函数保持相对稳定,即光学系统基本实现无热化,这对红外镜头的无热化设计具有重...     

大视场、大相对孔径长波红外机械无热化光学系统设计

研究了大视场大相对孔径长波红外机械无热化光学系统的设计, 设计了8～12 μm波段内F数为0.8、温度在-40～60℃范 围内无热化的光学系统。结果表明,该系统结构简单,像质好,在空间频率20 lp/mm处的 光学传递函数值大于0.5。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.