射频芯片内DCXO的晶体振荡主电路设计

描述了一种射频芯片内数控晶体振荡器(DCXO)的振荡主电路设计,以Deep-N-Well CMOS工艺的PMOS为主工作管,采用Santos(改进Colpitts)结构、非对称差分式振幅控制环,避免了因Vt依赖工艺与温度等而产生的可靠启振问题.该10MHz DCXO振荡器主电路,采用TSMC Mixed/RF 0.18μm CMOS工艺,在2V电源电压下,仿真得到输出特性为:振幅峰峰值0.8V,平均电流2.9mA,相位噪声-140dBc/Hz@1kHz,-173dBc/Hz@1MHz,启动时间约2.8毫秒,可作为DCXO核心振荡模块.     

应用于DVB电视调谐器的低相位噪声数控晶体振荡器设计

本文提出了一种全集成的25-MHz数字控制晶体振荡器。该数控晶体振荡器基于Colpitts结构实现。通过自动幅度控制电路实现相位噪声的优化。通过10位的温度计译码电容阵列实现自动频率控制。测试结果表明,该数控晶体振荡器在1kHz和10kHz频偏处的相位噪声分别为–139 dBc/Hz和–151 dBc/Hz。频率调谐范围约为35ppm,频率精度为0.04ppm。该数控晶体振荡器在SMIC 0.18μm CMOS工艺下实现,电源电压1.8V,消耗电流1mA。     

一种低相位噪声的毫米波压控振荡器

基于推推振荡器结构设计了一种低相位噪声的毫米波压控振荡器,相比传统采用直接振荡和倍频实现的振荡器,该振荡器具有体积小、相位噪声低及电路简单等优点.振荡器中的谐振电路采用多级串联谐振,电感采用微带线的形式,提高了谐振器的品质因数,进而降低了振荡器的相位噪声,且在谐振电路通过微带耦合方式实现了基频输出.基于GaAs异质结双极晶体管(HBT)工艺对振荡器进行了设计和流片,芯片尺寸为1.8 mm×1.4 mm.在5V工作电压和0～13 V调谐电压条件下,振荡器的输出频率为42.1～46.2 GHz,电流为120 mA,输出功率为1 dBm,1/2次谐波抑制大于15 dB,相位噪声为-60 dBc/Hz@10 kHz、-85 dBc/Hz@100 kHz和-105 dBc/Hz@1 MHz.     

一种钽酸锂压控振荡器的设计与实现

该文使用具有低电容比、宽调谐范围的钽酸锂晶体设计了一巴特勒共基低相位噪声压控振荡器,此设计在寻求高有载品质因数QL的同时保持了振荡器的输出功率。使用的钽酸锂晶体的无载品质因数Q0约为1.24×103,其频率为10.727MHz。设计出的巴特勒振荡器QL≈33%Q0,输出功率约为11dBm。不加压控的情况下,实际测得该振荡器的相位噪声结果为-85dBc/Hz@10 Hz和-145dBc/Hz@1kHz。在此基础上,增加一变容二极管作为压控元件设计了钽酸锂压控振荡器,在2~10 V范围内,测得控制电压压控斜率约为86.6×10-6/V,相位噪声测试结果优于-82dBc/Hz@10Hz和-142dBc/Hz@1kHz,实现了具有宽调谐范围的低相位噪声钽酸锂振荡器的设计。     

晶体振荡器双层隔振系统的设计与实验

分析了振动环境对晶体振荡器的影响,并以此为依据设计了一种针对晶体振荡器的双层被动隔振系统。仿真结果表明该隔振系统具有较低的位移传递率。实验结果表明,在频率为20～2 000 Hz、功率谱密度为0.05 g2/Hz的随机振动下,加速度灵敏度约为2×10-9/g、中心频率为12.8 MHz的AT-切晶体振荡器,通过应用此双层被动隔振系统,晶体振荡器的动态相位噪声可由-102 dBc/Hz@1 kHz降低到-120 dBc/Hz@1 kHz。     

2.5 GHz低相位噪声LC压控振荡器

在0.35 μm SiGe BiCMOS工艺条件下,设计了一个全集成的低相位噪声LC压控振荡器(VCO).该VCO采用尾电阻结构替代传统的尾电流源结构实现电流控制,以减小尾电流源产生的噪声.该VCO的调谐范围为480 MHz,可以覆盖2.32～2.8 GHz.当振荡频率为2.5 GHz时,100 kHz和1 MHz频偏处的相位噪声分别为-104.3 dBc/Hz和-124.3 dBc/Hz.振荡器工作电压为5 V,尾电流为5 mA.工作在2.5 GHz时,其100 kHz频偏处的性能系数为-178 dBc/Hz.     

一种基于开关电容调谐的宽带压控振荡器设计

设计了一种频率可调范围约600 MHz的全集成CMOS LC宽带压控振荡器.该压控振荡器工作电压为3.3 V,基于Chartered 0.25 μm 标准CMOS工艺设计,利用开关电容调谐的方法扩大其调谐范围.测试结果表明:该压控振荡器工作在中心频率为1.9 GHz时,单边带相位噪声为-85 dBc/10 kHz,调谐范围达到32%.     

100.450 MHz五次泛音温度补偿晶体振荡器

应用新的温度补偿方法研制了100.450MHz五次泛音温度补偿晶体振荡器,该振荡器由450kHz陶瓷振荡器,100MHz五次泛音晶体振荡器,混频器,晶体滤波器组成。450kHz陶瓷振荡器的输出频率与100MHz晶体振荡器的输出频率混频,滤波,取其和频。直接利用450kHz陶瓷振荡器输出频率对100MHz晶体振荡器进行温度补偿。实验结果表明,在0~70℃该振荡器的频率-温度稳定度<±7×10-7,初步测量相位噪声为-119dBc@1kHz。     

一种适用于2 4GHz ISM射频波段的全集成CMOS压控振荡器

提出了一种频率可调范围约 2 30MHz的全集成LC压控振荡器 (VCO) .该压控振荡器是用 6层金属、0 18μm的标准CMOS工艺制造完成 .采用MOS晶体管和电容组合来实现等效变容管 ,为降低芯片面积仅使用一个片上螺旋电感 ,并实施了低电压、低功耗的措施 .测试结果表明 ,该压控振荡器在电源电压为 1 8V的情况下功耗约为10mW ,在振荡器中心频率为 2 46GHz时的单边带相位噪声为 - 10 5 89dBc/Hz @6 0 0kHz .该压控振荡器可以应用于锁相环电路或频率综合器中.     

一种VHF频段具有抗振性能的晶体振荡器的设计

描述了一个100.0 MHz的石英晶体振荡器的设计和性能,提出了一种在振动条件下获得较好相位噪声性能的方法。测试结果表明:在静止状态下,晶体振荡器的相位噪声为:-143.0 dBc/Hz@1 kHz,-156.8 dBc/Hz@10 kHz;在任一方向的随机振动条件下,晶体振荡器的相位噪声优于-137.4 dBC/Hz@1 kHz,-150.9 dBC/Hz@10 kHz。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.