二氧化锡纳米线的生长机理研究

使用水平石英管式电炉，以二氧化锡和石墨的混合物为原材料、高纯氮气为载气，在850℃温度下用直接热蒸发法制备二氧化锡纳米线．衬底硅片的直径为10mm，其上覆盖一层5nm厚的金催化剂．原材料放在石英舟中，离原材料30mm的下风口处放置硅衬底，原材料和硅衬底都放置在石英管的中部电炉的恒温区内．用扫描电子显微镜（SEM）和透射电子显微镜（TEM）观察到二氧化锡的纳米线结构；X射线衍射（XRD）表明二氧化锡纳米线具有四方金红石结构；选区电子衍射（SAED）照片表明二氧化锡纳米线具有完善的晶体结构．不同生长时间下制备样品的扫描电子显微镜和透射电子显微镜照片再现了二氧化锡纳米线的生长过程，该纳米线的生长符合传统的VLS生长机制．     

真空气相沉积可控制备有机半导体单晶薄膜

利用多温区温度可控的真空气相沉积设备,在热氧化硅片衬底上沉积了并五苯（PEN）与甲氧基寡聚苯乙烯撑（MOPV）2种有机半导体材料的薄膜。研究了不同的沉积条件下有机半导体材料在二氧化硅衬底上的成核和生长模式。MOPV的生长遵循Volmer-Weber模式。在理想的条件下分别得到了岛状与线状的单晶结构。偏振显微荧光研究证明单晶纳米线有显著的荧光各向异性。     

锰及其硅化物在Si(100)表面的反应外延生长

采用超高真空分子束外延-扫描隧道显微镜(UHVMBE-STM)系统研究了不同温度下锰及其硅化物在Si(100)-2 ×1重构表面上的外延生长情况.实验结果表明当生长过程中衬底温度控制在室温到135℃时,生成大小基本一致的锰纳米团簇;当衬底温度达到210℃时锰与硅开始发生反应,形成硅化物,并有纳米线结构出现;当衬底温度达到330℃时,纳米线完全被棒状物或不规则的三维岛状硅化物取代.随着沉积时衬底温度升高,生成物的成核密度与生长温度的关系与经典的二维岛成核理论相符合.     

化学气相沉积法制备GaN纳米线及其形貌结构和生长机理研究

采用化学气相沉积(CVD)法,分别以Ni、Au为催化剂,氨化金属Ga制备出GaN纳米线。运用SEM,EDX,TEM等表征手段分析了GaN纳米线的形貌与结构。通过改变氨化温度、生长时间、催化剂、衬底以及Ga源和衬底间的距离等生长条件,研究了其对GaN纳米线形貌和结构的影响,通过分析探讨纳米线的生长过程与机制,得到了生长GaN纳米线的最佳工艺。     

热蒸发铜粉法制备硅纳米线的研究

研究发现,热蒸发铜粉即可在硅衬底上直接生长出硅纳米线.场发射电子扫描电镜和透射电镜分析表明,纳米线的形貌、结构及生长机制,随沉积区域的不同而变化.在高温沉积区,硅纳米线高度弯曲且相互缠绕,按气-液-固机制生长;在低温沉积区,高度定向生长的直硅纳米线,规整地排列在硅衬底表面,其生长机制是氧化辅助生长机制.     

图形化硅纳米线阵列的制备

本文主要研究了在常态(常温、常压等)条件下,利用金属催化化学腐蚀方法在硅片表面上大面积制备排列整齐、取向一致的硅纳米线阵列.同时,出于对后续制作硅纳米线传感器考虑,利用微电子标准加工工艺,以氮化硅做掩膜,通过选择合适的实验参数,在硅片表面选择性生长纳米线阵列,得到图形化的硅纳米线阵列.     

超高真空中锗衬底上铁锗化合物纳米结构的外延生长

采用分子束外延法在250~700℃的Ge(111)衬底表面生长出铁的锗化物纳米结构,原位扫描隧道显微镜观察表明,在300℃以下,Ge(111)衬底上生长的铁锗化合物以三维岛的形式存在,高于此温度,Ge(111)衬底上将生长出短棒和纳米线形状的铁锗化合物。当温度高于550℃时,Ge(111)衬底上只有纳米线生成,且纳米线沿着1-10三个等价方向生长,具有三重对称性。扫描隧道谱测量表明,三维岛具有金属特性而短棒和纳米线则呈现半导体性质。此外,X射线光电子能谱测试表明,相对于三维岛,纳米线的Fe2p3/2和Fe2p1/2峰向低结合能方向发生了移动,进一步证明了从三维岛到纳米线发生了相变。     

AZO晶种层对ZnO纳米线生长及紫外光电导性能的影响

采用溶液化学法实现了在Zn(NO3)2/C6H12N4混合溶液中ZnO纳米线在AZO薄膜修饰过衬底上生长。AZO薄膜由射频磁控溅射法制备,通过溅射时间和基底温度的变化改变薄膜形态,重点研究了不同薄膜形态对ZnO纳米线形貌和结构的影响,最终在溅射2h、基底温度250℃晶种上得到垂直于衬底、高度平行取向的ZnO纳米线阵列。在此基础上研究了不同形貌ZnO纳米线阵列的紫外光电导性能差异。结果表明,垂直生长的纳米线较倒伏纳米线紫外响应迅速,分析认为是紫外光照下曝光面积不同造成的。     

反应源温度对ZnO纳米线阵列定向性及发光性能的影响

以Au薄膜为催化剂、ZnO与碳混合粉末为反应源,采用碳热还原法在单晶Si衬底上制备了ZnO纳米线阵列.通过扫描电子显微镜( SEM)、X射线衍射仪(XRD)、荧光分光光度计对样品的表征,研究了反应源温度对ZnO纳米线阵列的定向性和光致发光性能的影响.样品在源温度920℃条件下沿(002)方向择优生长,定向性最好,温度过低不利于ZnO纳米线阵列密集生长,而温度过高导致Zn原子二次蒸发,因而也不利于纳米线阵列的定向和择优生长;样品在源温度880℃有最强的近紫外带边发射,表明温度过高和过低都不利于ZnO晶体结构的优化;由于ZnO纳米线在缺氧氛围下生长,氧空位是缺陷存在的主要形式,因此所有样品都有较强的绿光发射.温度升高导致纳米线生长速度提高而增加了氧空位缺陷数量,从而使样品绿峰强度增强并在源温度920℃时达最大值,但温度的进一步升高可导致ZnO纳米线表面Zn元素的蒸发而降低氧空位缺陷的数量,从而抑制绿峰强度.     

用VLS机制制备硅纳米线的生长阶段研究

在镀Ni的Si衬底上用硅烷高温分解的方法由VLS机制制备了硅纳米线，在不同的实验条件下研究了VLS机制生长的三个阶段：结晶阶段、共熔阶段和生长阶段，特殊条件下制备的处于结晶阶段的长度仅几十纳米的硅纳米线显示硅纳米线是从催化剂颗粒中长出来的，观察到的硅纳米线的生长过程说明VLS机制在纳米尺度仍然有效，可用于各种材料纳米线的制备。     

Self-catalytic growth of silicon nanowires on stainless steel

Silicon nanowires were grown on a stainless steel substrate using a vapor-liquid-solid mechanism in self-catalytic mode. The multi-component Fe-Cr-Ni-Mn-Si catalyst that was formed from the substrate leads the growth of single-crystal Si nanowires with lengths of several micrometers and diameters ranging from 100 to 150 nm. A systematic investigation of the processing parameters revealed that the hydrogen flow rate is critical to the growth of the nanowires. At a high flow rate that exceeds 1000 sccm, the substrate is embrittled by H₂, and liquid droplets, which lead the growth of nanowires by the vapor-liquid-solid mechanism, are formed on the substrate. Electrical transport measurements indicated that the nanowires grown with the multi-component catalyst have electrical properties comparable to those grown by a single-component Ti catalyst.     

The effects of Au surface diffusion to formation of Au droplets/clusters and nanowire growth on GaAs substrate using VLS method

Using VLS method with the separated 220 nm thick Au catalyst circles/stripes configurations sputtered onto GaAs substrate surface, this paper investigated the effects of the Au droplets/clusters formation as well as the nanowires growth process inside and outside the Au circles/stripes configurations. The Au surface outward diffusion from the Au layer edge up to several tens of micrometers has strongly dominated. The effects of Au surface diffusion to formation of Au droplets/cluster and to the nanowires growth on GaAs semiconductor substrate in the region outside the Au layers have been shown. The mechanism of the droplets/clusters formation outside the Au layer could explained by the surface cluster diffusion, meanwhile the nanowires have grown simultaneously during the Au outward diffusion. The growth could explain by the diffusion of Ga and As atoms into the diffusing Au droplets/clusters via dissociative mechanism to form nanowire seeds inside for nanowires growth. The Au droplets/clusters formation and nanowires growth on GaAs substrate outside Au layer could be applied for making nanodevices blocks outside the Au layer. Unfortunately if this Au surface diffusion phenomenon is occurring on the GaAs semiconductor containing the Au stripes interconnections in micro/nanocircuits this could also cause the short-circuits phenomenon, even at thin Au layer.     

High quality GaAs nanowires grown on glass substrates

We report for the first time the growth of GaAs nanowires directly on low-cost glass substrates using atmospheric pressure metal organic vapor phase epitaxy via a vapor-liquid-solid mechanism with gold as catalyst. Substrates used in this work were of float glass type typically seen in household window glasses. Growth of GaAs nanowires on glass were investigated for growth temperatures between 410 and 580 °C. Perfectly cylindrical nontapered nanowires with a growth rate of ~33 nm/s were observed at growth temperatures of 450 and 470 °C, whereas highly tapered pillar-like wires were observed at 580 °C. Nanowires grew horizontally on the glass surface at 410 °C with a tendency to grow in vertically from the substrate as the growth temperature was increased. X-ray diffraction and transmission electron microscopy revealed that the nanowires have a perfect zinc blende structure with no planar structural defects or stacking faults. Strong photoluminescence emission was observed both at low temperature and room temperature indicating a high optical quality of GaAs nanowires. Growth comparison on impurity free fused silica substrate suggests unintentional doping of the nanowires from the glass substrate.     

Growth of InN Nanowires with Uniform Diameter on Si(111) Substrates: Competition Between Migration and Desorption of In Atoms

The effects of the growth parameters on the uniformity and the aspect ratio of InN nanowires grown on Si(111) substrates have been studied systematically, and a modified quasi‐equilibrium model is proposed. The growth temperature is of great importance for both the nucleation of the nanowires and the migration of In and N atoms, thus affecting the uniformity of the InN nanowires. In order to improve the uniformity of the InN nanowires, both traditional substrate nitridation and pre‐In‐droplet deposition have been implemented. It is found that the substrate nitridation is favorable for the nucleation of InN nanowires. However, the initial In atoms adhered to the substrate are insufficient to sustain the uniform growth of the InN nanowires. We have found that the initial In droplet on the substrate is not only advantageous for the nucleation of the InN nanowire, but also favorable for the In atom equilibrium between the initial In droplets and the direct In flux. Therefore, InN nanowires with a uniform aspect ratio and optimal diameter can be achieved. The results reported herein provide meaningful insights to understanding the growth kinetics during the InN nanowires growth, and open up great possibilities of developing high‐performance group III‐nitride‐based devices.     

Investigation of initial growth of ZnO nanowires and their growth mechanism

ZnO nanowires were synthesized on Si substrates by a simple metal vapor deposition method without any catalysts. The initial growth and the growth mechanism of the ZnO nanowires were studied using scanning and transmission electron microscopy. We found that the ZnO nanowires grew on the Si substrate via a self-seeding vapor-solid mechanism. The growth process of the ZnO nanowires consisted of four steps: self-seeding, one-dimensional epitaxial growth of the nanowires on the seeds by a base-growth mode, further acceleration of nanowire growth with additional seeding, and active formation of the nanowires.     

Gallium nitride nanowires doped with magnesium

GaN nanowires doped with Mg have been synthesized on Si (111) substrate through ammoniating Ga₂O₃ films doped with Mg under flowing ammonia atmosphere. The Mg-doped GaN nanowires were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), high-resolution transmission electron microscopy (HRTEM) and photoluminescence (PL). The results demonstrate that the nanowires were single crystalline with hexagonal wurzite structure. The diameters of the nanowires ranged 20-30 nm and the lengths were about hundreds of micrometers. The intense PL peak at 359 nm showed a blueshift from the bulk band gap emission, attributed to Burstein-Moss effect. The growth mechanism of the crystalline GaN nanowires is discussed briefly.     

Diameter-dependent or independent: toward a mechanistic understanding of the vapor-liquid-solid si nanowire growth rate

Si nanowires have received continued increased attention because they keep the promise of monolithic integration of high-performance semiconductors with new functionality into existing silicon technology. Most Si nanowires are grown by vapor-liquid-solid mechanism, and despite many years of study, this growth mechanism remains under lively debate. For instance, contradictory results have been reported on the effect of diameter size on nanowire growth rate. Here, we developed a universal kinetic model of Si nanowire growth based on surface diffusion which takes into account adatom diffusion from the sidewall and substrate surface into the liquid droplet as well as the Gibbs-Thomson effect. Our analysis shows that the diameter independence for Si nanowires is affected by the interplay between the Gibbs-Thomson effect and the surface diffusion, whereas the diameter dependence is mainly influenced by the Gibbs-Thomson effect. The results based on the proposed model are in good agreement with experimental data.     

Synthesis of vertically aligned ultra-long ZnO nanowires on heterogeneous substrates with catalyst at the root

The synthesis of ultra-long high-quality ZnO nanowires with uniform size and orientation on heterogeneous substrates is highly desirable, not only for investigating the fundamental properties of ZnO nanowires, but also for fabricating integrated functional nanodevices. Here we present a novel and general technique for growing vertically aligned ultra-long ZnO nanowires on various substrates. More importantly, the metal catalyst is experimentally determined not at the tip ends of the nanowires but at the junction area between the nanowires and the underlying substrate. Based on detailed analysis and control group results, we then propose a three-stage growth mechanism, in which vapor-liquid-solid growth and vapor-solid growth compete with each other to become dominant.     

Synthesis of single-crystal GaN nanowires on Si(111) substrate by ammonification technology

GaN nanowires have been synthesized on Si(111) substrate through ammoniating Ga₂O₃/BN films under flowing ammonia atmosphere at the temperature of 900 °C. The as-synthesized GaN nanowires were characterized by X-ray diffraction (XRD), selected-area electron diffraction (SAED), Fourier transform infrared (FTIR) spectroscopy, scanning electron microscope (SEM) and transmission electron microscope (TEM). The results demonstrated that the nanowires are hexagonal wurtzite GaN and possess a smooth surface with diameters ranging from 40 to 100 nm and lengths up to several tens of micrometers. The growth mechanism of crystalline GaN nanowires is discussed briefly.     

Growth of silicon nanowires by electron beam evaporation using indium catalyst

For the first time silicon nanowires have been grown on indium (In) coated Si (100) substrates using e-beam evaporation at a low substrate temperature of 300 °C. Standard spectroscopic and microscopic techniques have been employed for the structural, morphological and compositional properties of as grown Si nanowires. The as grown Si nanowires have randomly oriented with an average length of 600 nm for a deposition time of 15 min. As grown Si nanowires have shown indium nanoparticle (capped) on top of it confirming the Vapor Liquid Solid (VLS) growth mechanism. Transmission Electron Microscope (TEM) measurements have revealed pure and single crystalline nature of Si nanowires. The obtained results have indicated good progress towards finding alternative catalyst to gold for the synthesis of Si nanowires.