基于XML和MA的下一代电子商务

XML和MA技术是电子商务发展的重要技术基础，文章在介绍XML和MA的基础上，讨论了基于XML和MA的下一代电子商务应用模式，在未来电子商务应用中，它们将发挥无可比拟的巨大作用。     

基于XML的电子商务关键技术标准

介绍了我国基于XML的电子商务关键技术两大系列标准GB/T 19256<基于XML的电子商务>和GB/T 20538((基于XML的电子商务业务数据和过程>的构成、研究进展以及内容等.通过建立基于XML的电子商务标准技术体制和关键技术标准,基本确立了我国第二代电子商务技术标准的总体架构.     

基于XML技术的信息系统集成在电子商务中的应用

XML标准作为新一代的数据交换标准．具有很多优点采用XML标准的系统相互间可以便捷的交换数据．本文先简单介绍了XML技术和电子商务．然后着重讨论了基于XML技术的信息系统集成的特点和优势，提出了基于XML技术的电子商务平台的整体构架．最后通过开发实例介绍了基于XML的信息系统集成在电子商务中的应用。     

XML数据的查询技术及优化策略

随着科学技术的发展,计算机为主的一系列科学技术得到了迅猛发展,XML,可扩展标记语言,也成为网络应用中重要的组成部门。XML广泛应用于金融、电子政务、电子商务、科学数据、出版、以及各种资料的数字化管理,成为数据交换的标准。IBM公司直接就把XML作为产品的新卖点,微软也称能够实现XML的查询和存储。XML数据管理市场竞争激烈,引发了XML技术的不断改革和提高。     

用BizTalk Server 2000构建B2B电子商务应用

从技术层面来说，电子商务就是应用互联网传输和交换商务数据，并根据商务数据进行自动或人工处理。数据的标准化在数据传输和交换构成中起着至关重要的作用。本文介绍了如何采用Microsoft提出的XML定义语言，利用XML Schema技术，用BizTalk Server 2000服务器来实现具体的电子商务应用。     

基于XML的电子商务业务过程标准化研究

介绍了电子商务标准化的发展和基于XML的电子商务业务过程标准化研究内容，并对业务过程相关标准之间关系及其未来趋势进行了分析。     

XML-EDI:企业间电子商务成功的解决方案

本文介绍了XML技术在电子商务中的应用 ,分析了XML与EDI在企业间电子商务中具体应用的技术方案和关键技术。探讨了该方案的优势和应用前景。     

从EDI到Web Service--看电子商务中数据交换技术的发展

电子商务从二十世纪六七十年代开始的电子数据交换系统算起已有几十年的发展历史。在这期间，作为电子商务中关键技术之一的数据交换技术取得了不断进步，历经电子数据交换、基于中间件的数据交换、Web等。近年来，随着XML技术的出现和成熟，基于XML的Web Service技术又为数据交换增添了一种新方法，成为人们研究热点。本文介绍了电子商务中几种主要数据交换技术的特点、应用背景和它们产生的必然性，重点比较了这几种技术的相对优势和不足并阐述了采用Web Service技术应用方案的优势和前景。从而让读者对电子商务中的数据交换技术有一个比较全面的认识，为电子商务系统的实现提供参考。     

电子商务中XML数字签名技术的应用研究

本文将XML与数字签名相结合,应用于电子商务来确保数据的安全可靠.在研究XML数字签名原理的基础上,讨论了基于Hash算法的XML数字签名方法,并给出了生成XML数字签名的方法.     

电子商务中XML数字签名技术的应用研究

本文将XML与数字签名相结合,应用于电子商务来确保数据的安全可靠。在研究XML数字签名原理的基础上,讨论了基于Hash算法的XML数字签名方法,并给出了生成XML数字签名的方法。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.