Preliminary results of optical emission spectroscopy by line ratio method in the RF negative ion source at ASIPP

Optical emission spectroscopy (OES) using the trace rare gases of Ar and Xe have been carried out in a radio frequency (RF) driven negative ion source at Institute of Plasma Physics, Chinese Academy of Science (ASIPP), in order to determine the electron temperature and density of the hydrogen plasma. The line-ratio methods based on population models are applied to describe the radiation process of the excited state particles and establish their relations with the plasma parameters. The spectral lines from the argon and xenon excited state atoms with the wavelength of 750.4 and 828.0 nm are used to calculate the electron temperature based on the corona model. The argon ions emission lines with the wavelength of 480 and 488 nm are selected to calculate the electron density based on the collisional radiative model. OES has given the preliminary results of the electron temperature and density by varying the discharge gas pressure and RF power. According to the experimental results, the typical plasma parameters is T_e ≈ 2–4 eV and n_e ≈ 1×10 ¹⁷– 8×10¹⁷ m⁻³ in front of plasma grid.     

Investigation of E–H mode transition in magnetic-pole-enhanced inductively coupled neon–argon mixture plasma

In this paper, E–H mode transition in magnetic-pole-enhanced inductively coupled neon–argon mixture plasma is investigated in terms of fundamental plasma parameters as a function of argon fraction(0%–100%), operating pressure(1 Pa, 5 Pa, 10 Pa and 50 Pa), and radio frequency(RF) power(5–100 W). An RF compensated Langmuir probe and optical emission spectroscopy are used for the diagnostics of the plasma under study. Owing to the lower ionization potential and higher collision cross-section of argon, when its fraction in the discharge is increased, the mode transition occurs at lower RF power; i.e. for 0% argon and1 Pa pressure, the threshold power of the E–H mode transition is 65 W, which reduces to 20 W when the argon fraction is increased. The electron density increases with the argon fraction at afixed pressure, whereas the temperature decreases with the argon fraction. The relaxation length of the low-energy electrons increases, and decreases for high-energy electrons with argon fraction, due to the Ramseur effect. However, the relaxation length of both groups of electrons decreases with pressure due to reduction in the mean free path. The electron energy probability function(EEPF) profiles are non-Maxwellian in E-mode, attributable to the nonlocal electron kinetics in this mode; however, they evolve to Maxwellian distribution when the discharge transforms to H-mode due to lower electron temperature and higher electron density in H-mode. The tail of the measured EEPFs is found to deplete in both E-and H-modes when the argon fraction in the discharge is increased, because argon has a much lower excitation potential(11.5 eV) than neon(16.6 eV).     

Comparison of heating mechanisms of argon helicon plasma in different wave modes with and without blue core

In this work,we investigated the discharge characteristics and heating mechanisms of argon helicon plasma in different wave coupled modes with and without blue core.Spatially resolved spectroscopy and emission intensity of argon atom and ion lines were measured via local optical emission spectroscopy,and electron density was measured experimentally by an RFcompensated Langmuir probe.The relation between the emission intensity and the electron density was obtained and the wavenumbers of helicon a...     

Trace-Rare-Gas Optical Emission Spectroscopy of Nitrogen Plasma Generated at a Frequency of 13.56 MHz

Optical emission spectroscopic measurement of trace rare gas is carried out to determine the density of nitrogen (N) atom, in a nitrogen plasma, as a function of filling pressure and RF power applied. 2% of argon, used as an actinometer, is mixed with nitrogen. In order to normalize the changes in the excitation cross section and electron energy distribution function at different operational conditions, the Ar-I emission line at 419.83 nm is used, which is of nearly the same excitation efficiency coefficients as that of the nitrogen emission line at 493.51 nm. It is observed that the emission intensity of the selected argon and atomic nitrogen lines increases with both pressure and RF power, as does the nitrogen atomic density.     

Experimental and simulation investigation of electrical and plasma parameters in a low pressure inductively coupled argon plasma

The electrical and plasma parameters of a low pressure inductively coupled argon plasma are investigated over a wide range of parameters(RF power, flow rate and pressure) by diverse characterizations. The external antenna voltage and current increase with the augment of RF power, whereas decline with the enhancement of gas pressure and flow rate conversely.Compared with gas flow rate and pressure, the power transfer efficiency is significantly improved by RF power, and achieved its maximum value of 0.85 after RF power injected excess125 W. Optical emission spectroscopy(OES) provides the local mean values of electron excited temperature and electron density in inductively coupled plasma(ICP) post regime, which vary in a range of 0.81 eV to 1.15 eV and 3.7×10~(16)m~(-3)to 8.7×10~(17)m~(-3)respectively. Numerical results of the average magnitudes of electron temperature and electron density in twodimensional distribution exhibit similar variation trend with the experimental results under different operating condition by using COMSOL Multiphysics. By comprehensively understanding the characteristics in a low pressure ICP, optimized operating conditions could be anticipated aiming at different academic and industrial applications.     

Spatial Evolution Study of EEDFs and Plasma Parameters in RF Stochastic Regime by Langmuir Probe

An RF compensated cylindrical Langmuir probe system has been developed and used to characterize an RF capacitive two temperature plasma discharge in a stochastic mode. The novelty of the work presented here is the use of the driven electrode （cathode） without ground shield. Measurements of the electron energy distribution function （EEDF） and plasma parameters were achieved under the following conditions： 50 W of RF power and 5× 10-2 mbar of argon pressure. The probe measurements are performed at 3 cm above the electrode and the probe was shifted radially （r direction） from the center （r = 0 cm） of the inter-electrodes region towards the chamber wall （R = 10.75 cm）. The results show that the EEDF is bi-Maxwellian and its shape remains the same through the scanned region. The farther the probe from the central region, the lower the EEDF maximum. The plasma density is observed to decrease according to a Gaussian profile along the radial direction and falls to 50% of its maximum when close to the cathode edge （r = 5.5 cm）. At the same time the effective electron temperature remains constant for r〈4 cm and increases for r≥4 cm. The high-temperature and low-temperature electrons＇ densities and temperatures are also discussed in the article.     

Effects of direct current discharge on the spatial distribution of cylindrical inductively-coupled plasma at different gas pressures

Stable operations of single direct current(DC) discharge, single radio frequency(RF) discharge and DC?+?RF hybrid discharge are achieved in a specially-designed DC enhanced inductivelycoupled plasma(DCE-ICP) source. Their plasma characteristics, such as electron density,electron temperature and the electron density spatial distribution profiles are investigated and compared experimentally at different gas pressures. It is found that under the condition of single RF discharge, the electron density distribution profiles show a ‘convex' shape and ‘saddle' shape at gas pressures of 3 m Torr and 150 m Torr respectively. This result can be attributed to the transition of electron kinetics from nonlocal to local kinetics with an increase in gas pressure.Moreover, in the operation of DC?+?RF hybrid discharge at different gas pressures, the DC discharge has different effects on plasma uniformity. The plasma uniformity can be improved by modulating DC power at a high pressure of 150 m Torr where local electron kinetics is dominant,whereas plasma uniformity deteriorates at a low pressure of 3 m Torr where nonlocal electron kinetics prevails. This phenomenon, as analyzed, is due to the obvious nonlinear enhancement effect of electron density at the chamber center, and the inherent radial distribution difference in the electron density with single RF discharge at different gas pressures.     

Wave Propagation in a Coaxial Glow Discharge

The propagation of electromagnetic radiation from 500 to 4200 Mc in a coaxial cage transmission line passing through a cylindrical discharge chamber is investigated experimentally. Measurements were conducted in argon, helium, and nitrogen gas at pressures between 0.09 mm Hg and 2 mm Hg for a discharge-electromagnetic radiation interaction length of 30.48 cm. The results are compared with theory using a Lorentzian model to describe the electron motion in the presence of the RF field. A graphical method for determining the plasma frequency and electron momentum transfer collision frequency from measurements of the power transmission coefficient at two different radio frequencies is discussed. A comparison is made between the plasma frequency determined by this method and that obtained by the use of a cylindrical Langmuir probe. The electron momentum transfer collision probability is calculated from the RF and probe data.     

Development of a Helicon Plasma Source for Neutral Beam Injection System of the Alborz Tokamak

Amirkabir Helicon plasma source (AHPS) has been designed and developed at the fusion laboratory of Amirkabir University of Technology for the neutral beam injection (NBI) system of the Alborz tokamak. The design parameters of the Helicon plasma source are determined to get the \( n_{e} \cong 10^{19} \,{\text{m}}^{ - 3} \) plasma density. However, the Nagoya type III antenna was used to excite the Argon plasma by the applied magneto-static field of 750 G and RF power up to 2 kW at the frequency of 13.56 MHz. Preliminary experiments are performed to confirm the Helicon mode operation of the AHPS. Mode changing from the ICP to the Helicon mode was proved by using the optical emission spectroscopy and polaroid photography technique of the plasma “blue core”. Spectroscopy measurements results show that the emission line intensity of the \( {\text{Ar}}\;{\text{II}} \) at 434.8 nm increases as the RF power increases in the range of values of 300–1000 W at the neutral background pressure of 0.7 mTorr. Also, we found that, in Helicon mode, the increase of the magneto-static field from 350 to 750 G not only increases the plasma density besides the efficiency of the RF power absorption increases.     

Optical emission measurement of high-uniformity and high-density O2 supermagnetron plasma

The density and spatial distribution of O₂ supermagnetron plasma generated in between two parallel cathodes were measured by optical emission spectroscopy. Uniform plasma could be generated for the cathode spacing of 20–30 mm and a gas pressure of 2–10 mTorr on a magnetic field application of 130 G. The highest optical emission intensity (OEI) was observed at the cathode spacing of about 20 mm. OEIs of O-ions (464.9 nm) and O-radicals (777.1 nm) showed a strong RF-voltage-phase-difference dependencies of two supplied RF powers, and the OEIs at about 150°, i.e. around 180°, were about 2 times stronger than those of a conventional magnetron plasma generated at a gas pressure of 3–80 mTorr. In the spatial distribution measurements of OEIs, high-uniform plasmas were observed at a wide range of the RF phase difference, e.g. 0 and 120°.     

Low pressure mercury–argon electrodeless fluorescent lamp simulation using the finite volume method

A finite volume model of a low pressure Ar–Hg electrodeless lamp with external coils is established. The physical configuration is similar to the OSRAM/ENDURA 70 W lamp. A Maxwellian energy distribution is assumed. Two dimensional behaviors of the most important plasma parameters such as the electron density, the electron temperature and the most important mercury states are discussed. Results are in good agreement with former studies and the general understanding in this area. Also, the influence of the argon pressure is studied. Based on the simulation, the population of the main resonance state, Hg (6³P₁ ) depends on the argon pressure and the optimized value is about 300 mTorr.     

Electrical model parameters identification of radiofrequency discharge in argon through 1D3V/PIC-MC model

This work represents a contribution to the modeling of a radiofrequency (RF) discharge in argon at low pressure (from 25 to 200 mTorr). It is started by the validation of the collision cross sections used in the particle model through a comparison between the transport coefficients calculated by these data and the measurements of the transport coefficients already exist in the literature, the particle model is also validated by a comparison between the calculated plasma density and that measured in the literature. The electrical model proposed in this work consists of replacing the RF discharge by a passive circuit (resistance in series with a capacitor), where the resistance represents the plasma medium and the obstruction of the passage of the electronic current, and the capacitor represents the sheaths and the appearance of the displacement current in these regions. The parameters of the electrical model are obtained through particle modeling. The electrical model presented accurately reproduces the current of the discharge, but without considering the phenomenon of distortion. The total harmonic distortion rate follows the variation of the plasma density; its maximum value is 5.75％ at 100 mTorr.     

Diagnostics of Argon Inductively Coupled Plasma and Dielectric Barrier Discharge Plasma by Optical Emission Spectroscopy

1. IntroductionArgon plasma has been frequently used for mate-rial processing and film fabrication processes [1l [21 [31.The efficiency of these processes has very close rela-tion with plasma parameters [4][5], such as ion den-sity, electron temperature and ion energy dlstrlbu-tion. Lots of research has been done on the relation-ship between efficiency and availability of materialprocessing and plasma parameters [6][7].Both lCP dlscharge and DBD discharge are newtype plasma systems developed…     

Characteristics of Single Cathode Cascaded Bias Voltage Arc Plasma

A single cathode with a cascaded bias voltage arc plasma source has been developed with a new quartz cathode chamber,instead of the previous copper chambers,to provide better diagnostic observation and access to the plasma optical emission.The cathode chamber cooling scheme is also modified to be naturally cooled only by light emission without cooling water to improve the optical thin performance in the optical path.A single-parameter physical model has been developed to describe the power dissipated in the cascaded bias voltage arc discharge argon plasmas,which have been investigated by utilizing optical emission spectroscopy(OES) and Langmuir probe.In the experiments,discharge currents from 50 A to 100 A,argon flow rates from 800 sccm to 2000 sccm and magnetic fields of 0.1 T and 0.2 T were chosen.The results show:(a) the relationship between the averaged resistivity and the averaged current density exhibits an empirical scaling law as η∝ j~(-0.63369) and the power dissipated in the arc has a strong relation with the filling factor;(b) through the quartz,the argon ions optical emission lines have been easily observed and are dominating with wavelengths between 340 nm and 520 nm,which are the emissions of Ar~+-434.81 nm and Ar~+-442.60 nm line,and theintensities are increasing with the arc current and decreasing with the inlet argon flow rate;and(c) the electron density and temperature can reach 2.0 × 10~(19) m~(-3) and 0.48 eV,respectively,under the conditions of an arc current of 90 A and a magnetic field of 0.2 T.The half-width of the n_e radial profile is approximatively equal to a few Larmor radii of electrons and can be regarded as the diameter of the plasma jet in the experiments.     

Bended probe diagnostics of the plasma characteristics within an ECR ion source with a rectangular waveguide

To reveal the argon plasma characteristics within the entire region of an electron cyclotron resonance(ECR) ion source, the plasma parameters were diagnosed using a bended Langmuir probe with the filament axis perpendicular to the diagnosing plane. Experiments indicate that,with a gas volume flow rate and incident microwave power of 4 sccm and 8.8 W, respectively,the gas was ionized to form plasma with a luminous ring. When the incident microwave power was above 27 W, the luminous ring was converted to a bright column, the dark area near its axis was narrowed, and the microwave power absorbing efficiency was increased. This indicates that there was a mode transition phenomenon in this ECR ion source when the microwave power increased. The diagnosis shows that, at an incident microwave power of 17.4 W, the diagnosed electron temperature and ion density were below 8 eV and 3?×?10~(17) m~(-3), respectively, while at incident microwave power levels of 30 W and 40 W, the maximum electron temperature and ion density were above 11 eV and 6.8?×?10~(17) m~(-3), respectively. Confined by magnetic mirrors, the higher density plasma region had a bow shape, which coincided with the magnetic field lines but deviated from the ECR layer.     

Experimental Investigation on Electromagnetic Attenuation by Low Pressure Radio-Frequency Plasma for Cavity Structure

This paper reports on an experiment designed to test electromagnetic(EM)attenuation by radio-frequency(RF)plasma for cavity structures.A plasma reactor,in the shape of a hollow cylinder,filled with argon gas at low pressure,driven by a RF power source,was produced by wave-transmitting material.The detailed attenuations of EM waves were investigated under different conditions:the incident frequency is 1-4 GHz,the RF power supply is 13.56 MHz and1.6~(-3) k W,and the argon pressure is 75-200 Pa.The experimental results indicate that 5-15 d B return loss can be obtained.From a first estimation,the electron density in the experiment is approximately(1.5-2.2)×1016m~(-3)and the collision frequency is about 11~(-3)0 GHz.The return loss of EM waves was calculated using a finite-difference time-domain(FDTD)method and it was found that it has a similar development with measurement.It can be confirmed that RF plasma is useful in the stealth of cavity structures such as jet-engine inlet.     

Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe

We present the axial profiles of argon helicon plasma measured by a local optical emission spectroscope (OES) and Langmuir RF-compensated probe. The results show that the emission intensity of the argon atom lines (750 nm, 811 nm) is proportional to the plasma density determined by the Langmuir probe. The axial profile of helicon plasma depends on the discharge mode which changes with the RF power. Excited by helical antenna, the axial distribution of plasma density is similar to that of the external magnetic field in the capacitive coupled mode (E-mode). As the discharge mode changes into the inductively coupled mode (H-mode), the axial distribution of plasma density in the downstream can still be similar to that of the external magnetic field, but becomes more uniform in the upstream. When the discharge entered wave coupled mode (W-mode), the plasma becomes nearly uniform along the axis, showing a completely different profile from the magnetic field. The W-mode is expected to be a mixed pattern of helicon (H) and Trivelpiece-Gould (TG) waves.     

Study of axial double layer in helicon plasma by optical emission spectroscopy and simple probe

In this work we used a passive measurement method based on a high-impedance electrostatic probe and an optical emission spectroscope (OES) to investigate the characteristics of the double layer (DL) in an argon helicon plasma.The DL can be confirmed by a rapid change in the plasma potential along the axis.The axial potential variation of the passive measurement shows that the DL forms near a region of strong magnetic field gradient when the plasma is operated in wavecoupled mode,and the DL strength increases at higher powers in this experiment.The emission intensity of the argon atom line,which is strongly dependent on the metastable atom concentration,shows a similar spatial distribution to the plasma potential along the axis.The emission intensity of the argon atom line and the argon ion line in the DL suggests the existence of an energetic electron population upstream of the DL.The electron density upstream is much higher than that downstream,which is mainly caused by these energetic electrons.     

Numerical simulation and experimental research on an inductively coupled RF plasma cathode

In this study, numerical simulation and discharge current tests were conducted on an inductively coupled radio frequency (RF) plasma cathode. Numerical simulations and experimental measurements were performed to study the factors influencing the electron extraction characteristics, including the gas type, gas flow, input power and extracting voltage. The simulation results were approximately consistent with the experimental results. We experimentally found that the RF input power mainly determines the extracted electron current. An electron current greater than 1 A was acquired at 270 W (RF input power), 2.766 sccm (xenon gas). Our results prove that an inductively coupled RF plasma cathode can be reasonable and feasible, particularly for low power electric propulsion devices.     

Reactive ion etching of PECVD silicon nitride in SF6 plasma

The reactive ion etching of PECVD silicon nitride thin films has been investigated using SF₆ plasma. Effects of variations of process parameters such as pressure (50–350 mTorr), RF power (50–250 W), gas flow rate (3–130 sccm) and additions of O₂ and He (0–50%) in SF₆, on the PECVD silicon nitride etch rate and selectivity to the AZ 1350J photoresist were examined. An etch rate of 1 μm/min has been obtained under the condition of 150 mTorr, 100 W and 60 sccm. Experimental results also indicated a maximum etch rate at approximately 30% O₂ while addition of He showed only dilution effect. A nitride/photoresist selectivity ranging from 1 to 3:1 has been obtained.