星载DPCMABSAR系统主要性能指标分析

星载分离相位中心方位多波束合成孔径雷达可以同时实现方位向高分辨率和宽测绘带成像。分辨率、测绘带宽度、模糊度和作用距离等性能指标是系统设计的目标,同时也是用户最为关心的指标。通过对这种新体制SAR技术原理进行分析,并参照常规SAR上述指标的定义,给出了DPCMABSAR系统的分辨率、测绘带宽度、模糊度和作用距离等性能指标的计算公式,可用于系统工程设计时参考。同时计算结果与常规SAR对照,进一步体现了DPCMAB技术的优势。     

调频连续波SAR方位多波束成像

调频连续波合成孔径雷达(FMCW SAR)结合了调频连续波和合成孔径雷达的双重优点,不但体积小、造价低廉,而且还可以高分辨率成像.在无人机和临近空间飞行器的应用方面前景广阔.对于常规SAR,方位分辨率和宽测绘带的矛盾限制了其更广泛的应用,且FMCW载波泄露问题影响其探测距离从而影响测绘带.为此,以距离多普勒成像算法为基础,探索使用多相位中心方位多波束技术实现FMCW SAR的高分辨率宽测绘带成像,最后通过仿真验证了方位多波束成像方法的有效性.     

基于脉内波束指向的单相位中心多波束星载SAR系统接收端DBF处理

该文将单相位中心多波束(SPCMB)星载SAR系统与脉内波束指向相结合,有效地解决了传统SPCMB- SAR系统方位模糊较大的问题。该文推导了接收端方位向、距离向及2维联合数字波束形成(DBF)的处理方法,并归纳出先方位向DBF后距离向DBF,先距离向DBF后方位向DBF,以及2维DBF 3种处理流程。同时分析了该系统的主要系统参数,对比了3种处理流程的数据率和计算复杂度。仿真验证了3种处理方法的有效性,并通过模糊度分析证明采用该系统能降低方位模糊和距离模糊,有效实现高分辨率宽测绘带成像。     

星载多站方位多通道高分辨宽测绘带SAR成像

结合数字波束形成技术,星载方位多通道合成孔径雷达(SAR)系统可以克服最小天线面积限制,实现高分辨宽测绘带(High Resolution and Wide Swath, HRWS)SAR成像。结合多站SAR系统即可实现高分辨干涉合成孔径雷达(Interferometric SAR, InSAR)地形测绘。该文通过分析星载多站模式下各接收通道接收回波的信号模型,推导得到了其相对于参考接收通道接收回波的通用相位补偿公式,该公式同时补偿了由沿航向和垂直航向基线引起的相位误差,然后对基于最优Capon法的多相位中心解模糊成像的保相性进行了分析证明,由此得到了解模糊后每个方位时刻回波所对应的卫星轨道信息,为后续干涉处理及目标定位等奠定基础,最后利用地球椭球模型仿真的星载双通道多普勒模糊回波数据验证了该文方法的有效性。     

利用相位中心偏移方位多波束来实现宽测绘带SAR成像

该文提出了一种基于相位中心偏移方位多波束的宽测绘带星载SAR实现方案。通过在方位向上配置相位中心偏移的多个波束使雷达在一个脉冲周期内完成多个多普勒历程的信号采样,显著降低系统对脉冲重复频率的要求,实现宽测带SAR成像。针对卫星速度的非恒定性和不同波位所需PRF的多样性造成的方位信号非均匀采样,该方案采用了多通道信号重建技术来恢复均匀采样信号的算法。与采用高轨技术和分布式技术的宽测绘带SAR方案相比,这种方案的技术难度较小、易于实现。     

分布式小卫星多中心频率SAR实现宽域二维高分辨率成像

分布式小卫星SAR能够打破传统单星SAR测绘带宽和方位分辨率的矛盾。该文分析了一种沿航向排列分布式小卫星宽测绘带二维高分辨率成像技术,每颗卫星同时发射接收不同频率的线性调频信号,先分别在每个子带解方位多普勒模糊,并将方位多普勒中心频率调整至零频,然后在距离向进行子带拼接得到大带宽的线性调频信号从而得到高的距离向分辨率。此外,这种多发多收的工作方式还增加了系统平均发射功率,提高了信噪比。     

FDA-SAR高分辨宽测绘带成像距离解模糊方法

由于多普勒模糊和距离模糊的制约,星载合成孔径雷达（SAR）成像方位高分辨率和宽测绘带成像之间存在严重的矛盾.针对这一问题,该文提出了基于频率分集阵列（FDA）SAR系统的高分辨宽测绘带成像距离解模糊方法.该方法基于FDA的距离维可控自由度,利用FDA发射导向矢量的距离和角度二维依赖性,在空间频率域实现距离模糊回波的分离并对不同距离模糊区域分别进行成像处理,解决了星载SAR成像测绘带宽对方位高分辨率的制约问题.仿真实验验证了所提方法的正确性和有效性.     

方位多波束SAR系统中天线长度和PRF选择分析

基于方位多波束合成孔径雷达可以同时实现方位高分辨率和宽测绘带 ,首先简要介绍了方位多波束SAR的基本原理 ,然后详细分析了该系统的方位分辨率与天线长度及脉冲重复频率 (PRF)之间关系。通过与单波束系统对比 ,揭示了方位多波束技术在同时获得高分辨率、宽测绘带方面的优势 ,并探讨了不同分辨率时 ,天线长度、脉冲重复频率选择情况 ,以资工程设计考虑。最后 ,提出了有待进一步考虑的问题     

基于自适应滤波的DPC-MAB SAR方位向信号重建

偏置相位中心方位多波束(DPC-MAB)SAR系统利用方位向多个子孔径同时接收回波,在PRF较低时根据多波束回波的相关性对其进行联合处理,实现方位向信号的重构,从而在保证高方位分辨率的同时增加测绘带宽。该文针对DPC-MAB SAR系统研究了基于波束形成理论的多普勒解模糊方法。传统非自适应的波束形成算法敏感于通道幅相误差以及各类噪声,而基于Capon算法的自适应最小方差无畸变(MVDR)最优波束形成器在多个模糊分量相关性较强时性能大大衰减,针对以往方法的局限性与不足之处,该文提出了一种改进的最小输出能量(MOE)波束形成算法,该算法首先利用多通道回波数据自适应的估计统计自相关矩阵,根据子空间投影理论对理想导向矢量进行修正,然后利用多重约束条件有效抑制相关模糊分量,解模糊性能明显提升。仿真实验和实测数据处理均验证了其有效性。     

基于柱形抛物面天线的MIMO SAR研究

为了实现星载合成孔径雷达(SAR)的高分辨率宽测绘带成像,该文提出一种基于柱形抛物面天线的多发多收合成孔径雷达系统(MIMO SAR)。根据对系统结构和短偏移正交(STSO)发射波形的分析,该文给出该系统的具体处理方法。基于柱形抛物面天线易于在俯仰向形成高增益窄波束的优势,该系统能够利用数字波束形成技术对不同波形回波数据进行有效分离,从而获取更多的方位向等效相位中心。通过方位向多通道数据重构处理,成像场景回波数据可利用传统成像算法进行成像。仿真结果表明,该系统能够确保MIMO SAR的成像质量,并具有良好的成像性能。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.