Bi1.5Zn1.0Nb1.5O7/Ba0.5Sr0.5TiO3复合薄膜介电性能的频率特性研究

采用射频磁控溅射法在蓝宝石基片上制备了Bi1.5Zn1.0Nb1.5O7(BZN)/Ba0.5Sr0.5TiO3(BST)双层复合薄膜,并研究了该薄膜在100 kHz~6 GHz频率范围内的介电性能。研究结果表明,BZN/BST复合薄膜的介电性能具有良好的频率稳定性。该复合薄膜的介电常数在研究的频率范围内基本与频率无关;其介电损耗在频率低于1 GHz时与频率无关,在频率高于1 GHz时随频率的上升而略微增大;薄膜在研究的频率范围内具有稳定的介电调谐率。     

烧结助剂引入方式对 (Bi1.5Zn0.5)(Zn0.5Nb1.5)O7陶瓷性能的影响

分别以液相包覆法和固相混合法引入助烧剂CuO制备(Bi1.5Zn0.5)(Zn0.5Nb1.5)O7(BZN)陶瓷。采用X线衍射、扫描电镜及电感-电容-电阻测试仪等对其烧结特性、相结构及介电性能进行了研究。液相包覆法可减少助烧剂的加入量从而降低其对陶瓷介电性能的恶化。CuSO4溶液的浓度为0.5mol/L,900℃烧结3h所制得(Bi1.5Zn0.5)(Zn0.5Nb1.5)O7陶瓷的介电常数εr=161,介电损耗tanδ=0.005,τf=-398×10-6/℃(1MHz)。     

Au/Si基片上沉积Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7薄膜介电性能的研究

采用磁控溅射法在Au/Si基片上制备了铌酸锌铋BZN(Bi1.5Zn1.0Nb1.5O7)薄膜。在基片温度200℃、本底真空1×10-3Pa条件下,BZN靶溅射0.5h,作为自缓冲层;然后在400℃下溅射1.5h,薄膜总厚度为200nm,650℃原位真空退火1h。XRD分析显示该薄膜为〈222〉单一取向,结晶良好;AFM扫描显示表面平整;测试表明不同频率下薄膜的性能没有大的改变。实验证明,选用电阻率较小的Au电极材料有利于器件性能的提高,实验得到介电常数可调率约20%、损耗为0.002~0.004。     

Bi_(1.5)ZnNb_(1.5)O_7纳米粉体对其陶瓷性能的影响

采用水热法制备Bi1.5ZnNb1.5O7(BZN)纳米粉体,传统固相法制备Bi1.5ZnNb1.5O7(α-BZN)陶瓷。研究了掺入BZN纳米粉体对α-BZN陶瓷性能的影响。结果表明:掺入BZN纳米粉体对α-BZN陶瓷的烧结温度和物相没有影响,随BZN纳米粉体掺入量的增加,α-BZN陶瓷密度下降。但掺入质量分数10%的BZN纳米粉体,在1 000℃烧结的α-BZN陶瓷样品结晶良好,呈现出更优异的介电性能:1 MHz下εr约148,tanδ小于3.365×10–4。     

(Ba0.5Sr0.5)TiO3/LaNiO3异质薄膜的介电调谐特性

用脉冲激光沉积工艺制备Ba0.5Sr0.5TiO3(简称BST)薄膜和Ba0.5Sr0.5TiO3/LaNiO3(简称BST/LNO)薄膜。在650℃原位退火10 min,获得了(100)和(110)择优取向生长的BST和BST/LNO薄膜,薄膜晶粒呈柱状结构,BST薄膜和BST/LNO异质结构薄膜的晶粒尺寸分别为150~200 nm和50~80 nm。在室温和1 MHz条件下,BST薄膜和BST/LNO异质结构薄膜的相对介电常数和介电调谐率分别达811和58.9%、986和60.1%;用LNO作底电极,可增益介电常数和介电调谐率。     

(Pb0.45Ca0.55){(Fe0.5Nb0.5)1-xSnx}O3微波陶瓷及独石介质滤波器的设计

研究了Sn改性(Pb0.45Ca0.55)(Fe0.5Nb0.5)O3微波介质陶瓷的微波介电性能,在此基础上以切比雪夫响应法设计制备出四腔独石型介质滤波器,并分析影响滤波器性能的因素。结果表明,添加Sn可改善(Pb0.45Ca0.55)(Fe0.5Nb0.5)O3陶瓷的介电性能,且能在1 150℃烧结出致密的陶瓷材料;当x(Sn)=0.1(摩尔分数)时,其介电常数rε=84.7,频率温度系数fτ=0.5,品质因数与频率之积Q×f=8 452 GHz。成功设计制备出中心频率1.075 GHz、插入损耗2.3 dB、驻波比为1.1的介质滤波器,该器件满足900~1200 MHz范围的通讯应用要求。     

铁电（Ba,Sr）TiO3及介电Bi2O3-ZnO-Nb2O5薄膜材料应用于电调谐微波器件研究进展

铁电钛酸锶钡BaxSr1-xTiO3(BST)是一种拥有十分优越铁电/介电性能的材料,在可调谐微波器件方面具有很好的应用前景。本文概括介绍了BST薄膜的研究意义、基本结构、薄膜的制备方法,并针对可调谐微波器件应用需求,详细探讨了通过掺杂、组分梯度变化、纳米铁电多层薄膜以及将铁电BST与新型介电Bi2O3-ZnO-Nb2O5(BZN)薄膜相结合等对铁电薄膜性能进行优化的手段,最后对该领域的前沿问题从材料研究层面作了小结与展望。     

xCa_(0.8)Sr_(0.2)TiO_3-(1-x)Li_(0.5)La_(0.5)TiO_3系陶瓷介电性能的调控

采用烧成法制备了xCa_(0.8)Sr_(0.2)TiO_3-(1-x)Li_(0.5)La_(0.5)TiO_3(CST-LLT)(x=0.4~0.8)系介质陶瓷,表征了其物相组成、结构特征及介电性能。所制备的材料具有钙钛矿结构特征,随着Li_(0.5)La_(0.5)TiO_3组分的减少,1 170~1 260℃烧结的CST-LLT陶瓷介电常数(ε_r)变化范围在154.8~275.2,而品质因数(Q·f)在1 360~1 479GHz内先增加后逐渐减小,谐振频率温度系数(τ_f)变化范围为(-720.6~470.5)×10~(-6)/℃。当x=0.5,烧成温度为1 200℃,保温3h时,可得到理想的介电性能的介质陶瓷:ε_r=230,Q·f=1 455GHz,τ_f=24.5×10~(-6)/℃。     

CeO_2缓冲层对蓝宝石基Ba_(0.6)Sr_(0.4)TiO_3薄膜结构和介电性能的影响

利用磁控溅射法制备Ce O_2缓冲层,通过脉冲激光沉积法制备Ba_(0.6)Sr_(0.4)TiO_3(BST)薄膜,在Al_2O_3(11—02)蓝宝石基片上构架了Pt/BST/Ce O_2/Al_2O_3和Pt/BST/Al_2O_3叉指电容器,对比研究了Ce O_2缓冲层对BST薄膜结构和叉指电容器介电性能的影响。通过X射线衍射仪、原子力显微镜和LCR表分别对叉指电容器的结构、表面形貌和介电性能进行了表征。实验发现,直接沉积在蓝宝石上的BST薄膜为多晶结构,生长在Ce O_2缓冲层上的BST为(001)取向的高质量外延薄膜。生长在Ce O_2缓冲层上的BST薄膜相对于没有缓冲层的BST薄膜具有更小的晶粒和均方根粗糙度。在40 V偏置电压下,Pt/BST/Al_2O_3和Pt/BST/Ce O_2/Al_2O_3叉指电容器的调谐率分别是13.2%和25.8%;最小介电损耗为0.021和0.014。结果表明Ce O_2缓冲层对生长在蓝宝石基片上的BST薄膜结构和介电性能具有重要影响。     

微波烧结Ba_(6-3x)Sm_(8+2x)Ti_(18)O_(54)陶瓷材料的初步研究

研究了Ba_(6-3x)Sm_(8+2x)Ti_(18)O_(54)(x=0.67,BST)陶瓷材料的微波烧结情况,从烧结特性、微结构与相组成及微波介电性能等方面对微波烧结的样品与传统工艺制得的样品进行了对比.结果表明, 与传统制备工艺相比,微波烧结BST陶瓷缩短了烧结周期,并促进了样品的致密化,其物相组成和传统烧结的样品没有区别,且晶粒细小分布均匀.微波烧结BST陶瓷可获得较优的微波介电性能:介电常数ε_r=82.89,品质因数与频率之积Qf=8 450 GHz(频率f=4.75 GHz),谐振频率温度系数τ_f=22.58×10~(-6)/℃.     

钛酸锶钡/铋锌铌多层复合薄膜的制备及性能

采用溶胶一凝胶法在Pt/Ti/SiO2/Si衬底上制备了钛酸锶钡/铋锌铌多层复合薄膜样品.研究了不同退火温度下多层复合薄膜的结构、微观形貌及介电性能.结果表明:在退火温度高于700℃时,所得复合薄膜中会出现立方焦绿石结构的铋锌铌和钙钛矿结构的钛酸锶钡.750℃退火处理得到的多层复合薄膜,表面致密,无裂纹,其相对介电常数...     

Recent progress of (Ba,Sr)TiO<Subscript>3</Subscript> thin films for tunable microwave devices

The (Ba_1−xSr_x)TiO₃ (BST) ferroelectric thin films exhibit outstanding dielectric properties, even at high frequencies (>1 GHz), and large, electric-field dielectric tunability. This feature makes them suitable for developing a new class of tunable microwave devices. The dielectric properties and dielectric tuning property of BST thin films are closely related to the film compositions, substrate types, and post-deposition process. The successful implementation of BST films as high-frequency dielectrics in electrically tunable microwave devices requires a detailed understanding of both their processing and material properties. This paper will review the recent progress of BST thin films as active dielectrics for tunable microwave devices. The technical aspects of BST thin films, such as processing methods, post-annealing process, film compositions, film stress, oxygen defects, and interfacial structures between film and substrate, are briefly reviewed and discussed with specific samples from the recent literature. The major issues requiring additional investigations to improve the dielectric properties of BST thin films for tunable microwave applications are also discussed.     

溅射气压对Bi1.5Mg1.0Nb1.5O7薄膜结构及介电性能的影响

采用射频磁控溅射法在Pt/Si基片上沉积了铌酸铋镁(Bi1.5Mg1.0Nb1.5O7,BMN)薄膜.研究了溅射气压对BMN薄膜结构、表面形貌、化学成分及介电性能的影响.结果表明,制备的薄膜具有立方焦绿石结构.高溅射气压下制备的BMN薄膜晶粒的平均尺寸比低溅射气压下制备的薄膜晶粒的大.薄膜的介电调谐率及相对介电常数随溅...     

Low-Dielectric-Loss Barium Strontium Titanate Thin Films with MgO Buffer Layer for Tunable Microwave Devices

The dielectric and microwave properties of Ba_0.6Sr_0.4TiO₃ (BST60) thin films with a MgO buffer layer deposited on Al₂O₃ substrates were investigated. Insertion of the MgO buffer layer is demonstrated to be an effective approach to fabricate low-dielectric-loss BST thin films. x-Ray pattern analysis indicates that the thin films exhibit good crystalline quality with a pure perovskite phase and that insertion of the MgO buffer layer does not change the crystal structure of BST. The nonlinear dielectric properties of the BST films were measured by using an interdigital capacitor (IDC). At room temperature, the tunability of the BST films with a MgO buffer layer was 24.1% at a frequency of 1 MHz with an applied electric field of 80 kV/cm. The dielectric loss of the BST thin films is only 0.005 to 0.007 in the frequency range from 20 Hz to 2 MHz, the same as for BST films prepared on single-crystal MgO substrates. The microwave dielectric properties of the BST thin films were also measured by a vector network analyzer from 50 MHz to 10 GHz.     

Voltage and frequency dependent dielectric properties of BST-0.5 thin films on alumina substrates

Dielectric properties of Ba/sub 0.5/Sr/sub 0.5/TiO/sub 3/ (BST-0.5) polycrystalline thin films, deposited on alumina substrates by means of reactive pulsed laser deposition (PLD), were measured at GHz frequencies using an interdigital capacitor (IDC). By applying a voltage up to 40 V between the two groups of fingers at room temperature, a high tunability of /spl sim/27% was achieved at 5 GHz. A relative dielectric constant of /spl sim/500 (consistent with the low-frequency IDC measurements) has been obtained using coplanar waveguides by means of the through-reflect-line (TRL) analysis combined with either a conformal mapping model or a full wave calculation. The BST loss tangent was estimated as /spl sim/0.05 in the range 3-16 GHz.     

（Ba0.5Sr0.5）TiO3铁电薄膜的制备工艺及电学性质研究

采用溶胶 凝胶方法制备出纯立方钙钛矿相、介电性能和漏电流特性良好的 (Ba0 .5Sr0 .5)TiO3 铁电薄膜 .研究发现 ,随着烧结温度的升高 ,(Ba0 .5Sr0 .5)TiO3 薄膜纯度和结晶度增高 ,介电常数提高 ,漏电流密度降低 .在 75 0℃进行保温 1h热处理的薄膜性能较好且稳定 :在室温下测得薄膜介电常数为 2 5 0 ,介电损耗为 0 .0 30 ,漏电流密度为 6 .9× 10 -8A/cm2 .较高的介电常数、较低的漏电流密度可能源于良好的纯度和结晶度 .进一步研究表明 ,薄膜导电遵从空间电荷限制电流机制 .     

BST铁电薄膜的制备及介电性能研究

通过射频磁控溅射法,采用高温溅射、低温溅射高温退火两种不同的工艺制备了钛酸锶钡（BST）薄膜。分析两种不同的工艺对BST薄膜的结构、微观形貌及介电性能的影响。采用X线衍射（XRD）分析了样品的微观结构。采用扫描电镜（SEM）和台阶仪分别测试了样品的微观形貌和表面轮廓。通过能谱分析（EDS）得到了薄膜均一性的情况。最后通过电容 电压（C V）曲线测试得到BST薄膜的介电常数偏压特性。结果表明,与低温溅射高温退火工艺制备的BST 薄膜相比,高温溅射制备的BST薄膜结晶度好,致密性高,表面光滑,薄膜成分分布较均一。因此,采用高温溅射得到的BST薄膜性能较好。在频率300 kHz时,采用高温溅射制备的BST薄膜介电常数为127.5~82.0,可调谐率为23.86%~27.9%。