GaN外延膜的红外椭偏光谱研究

利用红外椭偏光谱法（IRSE）对生长在蓝宝石衬底上的非故意掺杂的GaN外延膜进行了研究。通过对椭偏光谱的理论计算，拟合了本征GaN中的声子振动参量和等离子振荡的频率及阻尼常量，并由此得到了各向异性的折射率和消光系数的色散曲线以及载流子浓度和迁移率。将得到的电学参数同霍耳测量结果进行了比较。     

GaN1-xPx三元合金的红外谱

对GaN1-xPx三元合金进行了红外谱的测试和拟合. 分析结果表明在GaN1-xPx三元合金中存在两个彼此竞争的机制制约着载流子浓度的变化. 一个是来自等电子陷阱的影响，它将减少三元合金中载流子的浓度；另一个来自缺陷的影响，它将增加三元合金中载流子的浓度. 对合金介电函数的倒数的虚部进行了计算，其结果显示，随着合金中P组分比的增加，纵向光学声子-等离激元（LPP）耦合模式向高频方向移动，同时LPP模式线宽逐渐增宽，说明随着合金中P组分比的增加，LPP模式的耦合作用增加，阻尼增强.     

GaN1-x Px三元合金的红外谱

对GaN1-xPx三元合金进行了红外谱的测试和拟合.分析结果表明在GaN1-xPx三元合金中存在两个彼此竞争的机制制约着载流子浓度的变化.一个是来自等电子陷阱的影响,它将减少三元合金中载流子的浓度;另一个来自缺陷的影响,它将增加三元合金中载流子的浓度.对合金介电函数的倒数的虚部进行了计算,其结果显示,随着合金中P组分比的增加,纵向光学声子-等离激元(LPP)耦合模式向高频方向移动,同时LPP模式线宽逐渐增宽,说明随着合金中P组分比的增加,LPP模式的耦合作用增加,阻尼增强.     

GaN1-x Px三元合金的红外谱

对GaN1-xPx三元合金进行了红外谱的测试和拟合.分析结果表明在GaN1-xPx三元合金中存在两个彼此竞争的机制制约着载流子浓度的变化.一个是来自等电子陷阱的影响,它将减少三元合金中载流子的浓度;另一个来自缺陷的影响,它将增加三元合金中载流子的浓度.对合金介电函数的倒数的虚部进行了计算,其结果显示,随着合金中P组分比的增加,纵向光学声子-等离激元(LPP)耦合模式向高频方向移动,同时LPP模式线宽逐渐增宽,说明随着合金中P组分比的增加,LPP模式的耦合作用增加,阻尼增强.     

GaN1-xPx三元合金的红外谱

对GaN1-xPx三元合金进行了红外谱的测试和拟合.分析结果表明在GaN1-xPx三元合金中存在两个彼此竞争的机制制约着载流子浓度的变化.一个是来自等电子陷阱的影响,它将减少三元合金中载流子的浓度;另一个来自缺陷的影响,它将增加三元合金中载流子的浓度.对合金介电函数的倒数的虚部进行了计算,其结果显示,随着合金中P组分比的增加,纵向光学声子-等离激元(LPP)耦合模式向高频方向移动,同时LPP模式线宽逐渐增宽,说明随着合金中P组分比的增加,LPP模式的耦合作用增加,阻尼增强.     

半导体技术

TN3()1 01030399G aN载流子浓度和迁移率的光谱研究/李志锋,陆卫,口侣江娟,袁先璋,沈学础(中国科学院上海技术物理所)11物理学报·一200(),纽9(8)一1(,14一1619用红外反射光谱的方法对生长在蓝宝石衬底上的。一G aN夕诞薄膜的载流子浓度和迁移率进行了研究.通过测量蓝宝石衬底和不同51掺杂浓度的一系列GaN外延膜的远红外反躺替并进行理论计算和拟合,得到GaN中的声子振动参量和等离子振荡的频率及阻尼常量,并由此计算得到其载流子浓度和迁移率.计算结储特性,但具有较高的工作温度及工作稳定性.图4表1参六金)红外方法得到的载流子浓度与H…     

MOCVD生长的GaN膜的光学性质研究

本文报道（0001）晶向蓝宝石衬底上金属有机化学气相淀积（MOCVD）方法生长的单晶六角GaN薄膜室温光学性质．由光吸收谱和488umAr+激光激发的光调制反射光谱（PR）确定的禁带宽度分别为3．39和3．400eV，从光吸收谱得到了GaN薄膜的折射率随光谱能量的变化关系．对PR谱的调制机理进行的分析，发现信号来自缺陷作用下的表面电场调制．应用喇曼光谱研究了GaN薄膜中的声子模，通过对LO声子-等离激元的耦合模散射峰的研究，得到了材料中的载流子浓度和等离激元阻尼常数．     

AlGaN/GaN HEMT电容及充电时间的研究

通过计算AlGaN/GaN HEMT二维电子气中的电势、载流子以及调制掺杂载流子寿命,得到AlGaN/GaN HEMT电容和充电时间,研究了AlGaN掺杂层浓度和厚度对器件的时间响应分析了AlGaN/GaN HEMT器件的高频特性。结果表明,栅电容随着AlGaN掺杂层浓度和厚度的增加逐渐减小。随着AlGaN层掺杂浓度的增大,电容充电时间先减后增,当掺杂浓度达到 时,电容充电时间达到极小值,在AlGaN掺杂层厚度等于7nm时电容充电时间最短。     

常压MOCVD生长的ZnO薄膜的电学性能

利用常压MOCVD法在蓝宝石(0001)衬底上沉积了非故意掺杂ZnO单晶薄膜．用Van der Pauw法测量了其从15K到室温的载流子浓度和霍耳迁移率，并用双层结构单施主模型对载流子浓度和迁移率进行了拟合分析．研究表明：ZnO薄膜浅施主能级为20.4meV，温度较低时，以电离杂质散射为主，温度较高时，以极性光学波散射为主．     

半导体材料的霍耳测量

利用霍耳效应研究半导体材料的电阻率，载流子浓度和迁移率是霍耳测量的主要技术之一。文章简单介绍了ＨＬ５５００霍耳测量系统；列举了用该霍耳系统测量的各种半导体材料，特别是高阻和高迁移率材料的结果，并讨论了有关的干扰问题。     

Far Infrared Investigation of Plasmon-LO Phonon Coupling and Surface Polaritons Modes in Donor Doped Cd1-xHgxTe and CdTe Thin Layer on GaAs Substrate

Infrared Fourier transform spectroscopy has been used to investigate phonon and plasmon modes in Cd_1-xHg_xTe and CdTe thin layer on GaAs substrate. Attenuated total reflection (ATR) spectroscopy has been used to excite surface plasmon and phonon polaritons. The plasmon-LO phonon coupling modes in samples are studied by dispersion curve calculation for various carrier concentrations. There exist three branches of coupled modes in dispersion curve. For analysis of the far infrared polarized reflectivity spectra we employ the harmonic oscillator dielectiic function model and the Drude model for free carrier response. We find that the coupling modes dependent to the concentration of free carriers. Furthermore, the experimental data have been used to calculate carrier concentration, composition parameter, mobility of carrier, thickness of layer and gap energy.     

Effects of high electrical-field stressing on hall mobility and carrier concentration in MOSFET's

The effect of high field stress on inversion layer mobility and carrier concentration in MOSFET's was studied by the use of Hall effect measurements at 77 and 298 K. The results show that Coulomb scattering by the increased interface charges causes mobility degradation. The near-threshold results are also consistent with the carrier fluctuation model. The mobility degradation is the most severe at low bias and low temperature. In contrast to former speculations made by a few investigators, Hall measurement results showed no decrease of mobile carrier concentration at the same effective gate bias in the entire bias range investigated. The mobility degradation is found to be strongly dependent on the gate oxide thickness of samples subjected to the same stress charges.     

Influence of deposition rate on the structural,optical and electrical properties of electron beam evaporated SnO2 thin films for transparent conducting electrode applications

The role of deposition rate in the structural,optical and electrical properties of SnO2 thin films deposited by electron beam evaporation method is investigated by varying the deposition powers viz.50,75,and 100 W.The structural characterization of the films is done by X-ray diffraction (XRD) technique.The surface morphology of the films is studied by scanning electron microscopy (SEM).Rutherford back scattering (RBS) measurements revealed the thickness of the films ranging from 200 nm to 400 and also a change in the concentration of oxygen vacancies which is found to be the maximum in the film deposited at the lowest deposition rate.Optical absorption spectrum is recorded using the UV-V is spectroscopy and the films are found to be transparent in nature.A shift in the absorption edge is observed and is attributed to a different level of allowed energy states in conduction band minimum.The Hall effect and electrical measurements show a variation in the carrier concentrations,mobility and resistivity of the films.In order to explore a better compromise in electrical and optical properties for transparent electrode applications,skin depths calculations are also done to find the optimized values of carrier concentration and mobility.     

The evaluation of radiation damaged epitaxial silicon

A technique has been developed for the determination of the concentration and Hall mobility of majority carriers in n on p homoepitaxial silicon using micro-Hall samples. These devices are essentially the same size as monolithic integrated circuits, and, since junction isolated integrated circuit processes are used in the manufacture of these samples, they have the properties of as-processed integrated-circuit materials. After initial characterization, the samples were exposed to pulse reactor spectrum neutron fluences at room temperature. Subsequent characterization permitted the determination of majority carrier removal rates and mobility dagradation. As expected, the carrier removal rate for epitaxial silicon at the onset of electrically observable displacement damage is essentially the same as that for bulk silicon with the same resistivity, 2.65 neutrons^-1cm^-1. Mobility degradation is not significant at room temperature. Low-temperature characterization indicates the importance of damage clusters on mobility when charge scattering dominates over lattice scattering.     

平面正六边形晶格振动的色散关系

基于晶格动力学理论推导了平面正六边形晶格振动的色散关系，得到第一布里渊区中沿 -M、M-K和 -K三个对称方向的色散关系表达式，沿每一对称方向有四支格波，其中两支声学波和两支光学波。分析讨论了只考虑最近邻原子间作用时和计及次近邻原子间作用下的色散关系，结果表明：只考虑最近邻原子间作用时， 点两声学模频率为零、两光学模频率简并， 点高频声学支与低频光学支频率简并，而 点声子频率非简并；沿三个对称方向都存在一支频率为零的声学波和一支频率不变的无色散光学波，并且 方向的声学波和光学波间具有频隙，另外两个方向的格波间无频隙。当计及次近邻原子间作用时，晶格振动的频率升高，三个对称方向的四支格波都表现出明显的色散性，沿 方向声学支与光学支间的频隙减小，由此可见次近邻原子间作用对色散关系有显著影响，但是对 点声子频率的大小和简并无影响，对 点声子频率的简并也无影响。     

Hall and drift mobilities in molecular beam epitaxial grown GaAs

A series of nominally undoped and Si-doped GaAs samples have been grown by molecular beam epitaxy (MBE) with Hall concentrations ranging from 10¹⁵ to 10¹⁹ cm⁻³ and mobilities measured at 77 and 300K by Hall-van der Pauw methods. Drift mobilities were calculated using the variational principle method and Hall scattering factors obtained from a relaxation-time approximation to permit cross-correlation of experimental data with drift or Hall mobilities and actual or Hall electron concentrations. At 77K, both high purity and heavily doped samples are well represented by either drift or Hall values since piezoelectric acoustic phonon scattering and strongly screened ionized impurity scattering hold the Hall factor close to unity in the respective regimes. Between n≊10¹⁵ and 10¹⁷ cm⁻³, where lightly screened ionized impority scattering predominates, Hall mobility overestimates drift mobility by up to 50 percent and Hall concentration similarly underestimates n. At 300K, polar optical phonons limit mobility and a Hall factor up to 1.4 is found in the lowest doped material, falling close to unity above about 10¹⁶ cm⁻³. Our calculation also agrees remarkably well with the Hall mobility of the highest purity MBE grown sample reported to date.     

Investigation of Multicarrier Transport in LPE-Grown Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Cd<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te Layers

A detailed study is presented of multicarrier transport properties in liquid-phase epitaxy (LPE)-grown n-type HgCdTe films using advanced mobility spectrum analysis techniques over the temperature range from 95 K to 300 K. Three separate electron species were identified that contribute to the total conduction, and the temperature-dependent characteristics of carrier concentration and mobility were extracted for each individual carrier species. Detailed analysis allows the three observed contributions to be assigned to carriers located in the bulk long-wave infrared (LWIR) absorbing layer, the wider-gap substrate/HgCdTe transition layer, and a surface accumulation layer. The activation energy of the dominant high-mobility LWIR bulk carrier concentration in the high temperature range gives a very good fit to the Hansen and Schmit expression for intrinsic carrier concentration in HgCdTe with a bandgap of 172 meV. The mobility of these bulk electrons follows the classic μ ~ T ^−3/2 dependence for the phonon scattering regime. The much lower sheet densities found for the other two, lower-mobility electron species show activation energies of the order of ~20 meV, and mobilities that are only weakly dependent on temperature and consistent with expected values for the wider-bandgap transition layer and a surface accumulation layer.     

Stress, structural and electrical properties of Si-doped GaN film grown by MOCVD

The stresses, structural and electrical properties of n-type Si-doped GaN films grown by metalorganic chemical vapor deposition (MOCVD) are systemically studied. It is suggested that the main stress relaxation is induced by bending dislocations in low doping samples. But for higher doping samples, as the Si doping concentration increases, the in-plane stresses in the grown films are quickly relaxed due to the rapid increase of the edge dislocation densities. Hall effect measurements reveal that the carrier mobility first increases rapidly and then decreases with increasing Si doping concentration. This phenomenon is attributed to the interaction between various scattering process. It is suggested that the dominant scattering process is defect scattering for low doping samples and ionized impurity scattering for high doping samples.