Circuit model for the GaAs m.e.s.f.e.t. valid to 12 GHz

A new equivalent circuit is given for the GaAs m.e.s.f.e.t., which includes resistive loss in the feed back elements. The circuit values are given for several 1 ?m-gate GaAs m.e.s.f.e.t.s. A method for fitting s12 to the measured data is described. Finally, the gain and stability factor of several GaAs m.e.s.f.e.t.s. are extrapolated to 24 GHz from the present model.     

V-shaped-gate GaAs m.e.s.f.e.t. for improved high-frequency performance

The idea of gate shaping in f.e.t.s was implemented into the GaAs-m.e.s.f.e.t. structure. A m.e.s.f.e.t. with 2 ?m gate length was fabricated, the measured m.a.g. data of which allow an extrapolation to an fmax of about 45 GHz.     

High-speed 1 ?m GaAs m.e.s.f.e.t.

By minimising parasitic series resistances, a GaAs m.e.s.f.e.t. with 1 ?m gate length was fabricated, possessing the highest known r.f. power gain, measured up to 18 GHz, for GaAs m.e.s.f.e.t.s.     

U.H.F. low-noise GaAs m.e.s.f.e.t. amplifier for colour t.v. broadcasting translator

Low-noise amplifiers for u.h.f. colour t.v. broadcasting translator use have been successfully developed by using 1 ?m gate GaAs m.e.s.f.e.t.s. The obtained performances revealed that a GaAs m.e.s.f.e.t. has low-noise and low intermodulation distortion characteristics, even in the 500?800 MHz frequency range, compared with a Si bipolar transistor.     

Microwave capability of 1.5 ?m-gate GaAs m.o.s.f.e.t.

1.5 ?m-gate GaAs m.o.s.f.e.t.s have been fabricated by anodic oxidation, and the microwave capability has been examined. The maximum oscillation frequency fmax is 22 GHz and the noise figure is 6.1 dB at 8 GHz. The results are comparable to those of GaAs m.e.s.f.e.t.s.     

Simplified GaAs m.e.s.f.e.t. model to 10 GHz

A simplified design-oriented equivalent circuit for the GaAs m.e.s.f.e.t. is presented. Its relation to a common, but more complex, model is derived and characteristics are compared. Element values are easily determined from measurements, and the simple model shows good agreement with measured parameters to 10 GHz for 1 ?m-gate m.e.s.f.e.t.s.     

New estimate of the minimum noise figure of a m.e.s.f.e.t.

New estimates of the drain and gate noise multiplication parameters, the correlation coefficient and the minimum noise figure for a m.e.s.f.e.t. are advanced. For an uncooled GaAs m.e.s.f.e.t. having a 1 ?m gate length, a minimum possible noise figure of 1 dB at 10 GHz is predicted. InP is only marginally better.     

Conversion gain of m.e.s.f.e.t. drain mixers

A theoretical analysis of the gain properties of m.e.s.f.e.t. drain mixers is presented. The m.e.s.f.e.t. model includes the nonlinearity of both the transconductance and the drain resistance. For a special case, a simple analytical expression for the gain is given. Numerical results for a typical example are briefly presented as an illustration.     

Low-noise microwave f.e.t.s fabricated by molecular-beam epitaxy

The growth of m.b.e. GaAs suitable for f.e.t. fabrication is reported. The m.b.e. structure consists of an n+ = 2.5×1018 cm?3 contact layer on top of an n+ = 3.5×1017 cm?3 active layer. Using this material, f.e.t.s. have been fabricated that have a minimum noise figure of 1.5 dB with an associated gain of 15 dB at 8 GHz. These are the best results yet reported for low-noise m.b.e. GaAs f.e.t.s.     

Silicon-on-sapphire m.o.s.f.e.t.s fabricated by back-surface laser-anneal technology

Self-aligned aluminium-gate silicon-on sapphire (s.o.s.) m.o.s.f.e.t.s have been fabricated by applying laser-anneal technology from the back surface for activation of the ion-implanted channel layer. The threshold voltage and surface electron mobility were similar to the conventional silicon-gate m.o.s.f.e.t.s, but the low resistivity of gate and interconnection electrodes using aluminium is advantageous for high switching speed m.o.s. l.s.i.     

Leak-compensated analog memory with pair m.o.s.f.e.t.s

A fast, simple, and relatively stable analog memory element is proposed, composed of two condensers and a pair of complementary m.o.s.f.e.t.s. The memory element was made sufficiently stable by the use of complementary m.o.s.f.e.t.s to enable a learning machine to complete the learning process within a comparatively short time.     

X and Ku band GaAs m.e.s.f.e.t.

A GaAs Schottky-barrier f.e.t. (m.e.s.f.e.t.) with a 1 ?m gate has been built, which is suitable for X band and Ku band applications. The unilateral power gain over the X band is above 9 dB and the noise figure is only 5 dB at 10 GHz.     

GaAs power f.e.t.s with semi-insulated gates

GaAs semi-insulated-gate f.e.t.s (s.i.g.f.e.t.s) have been fabricated by Ar+ bombardment in the gate region. The d c. characteristics and microwave performance are compared with those of conventional power m.e.s.f.e.t.s fabricated from the same slice. Up to 2.9W output power with 4dB gain has been obtained from s.i.g.f.e.t. devices at 8 GHz.     

Offset-voltage temperature-coefficient in dual m.o.s.f.e.t. source followers

A technique is given for predicting the approximate temperature coefficient of offset voltage of a differential m.o.s.f.e.t. source-follower arrangement incorporated in a unity-gain buffer amplifier set up for zero offset at room temperature. The prediction is dependent on only one measurement, using a bridge-circuit technique, and takes account of possible power-law differences in the nominally matched dual m.o.s.f.e.t.s.     

Noise behaviour of the m.o.s.f.e.t. at v.h.f. and u.h.f.

The optimum noise figures of an m.o.s.f.e.t. at u.h.f. and at pinch-off are calculated using a simplified equivalent circuit. The noise parameters are also determined experimentally. Theory and experiment are shown to be in good agreement. Noise parameters of the m.o.s.f.e.t. for the frequency range 0.1?0.8 GHz are given.     

I.C.-compatible completely planar GaAs m.e.s.f.e.t.s. by selective diffusion

Completely planar GaAs m.e.s.f.e.t.s were produced by selective open tube diffusion from tin-doped spin-on SiO2 films. After the diffusion process no change in the surface morphology was observed in the doped regions. The evaluation of saturation currents of the m.e.s.f.e.t.s show very good homogeneity. Isolation between doped areas was excellent. Sample preparation and device results are presented; possible applications are outlined.     

Remediable and nonremediable causes of parasitic elements in InP m.e.s.f.e.t.s

Two-dimensional analyses of InP and GaAs m.e.s.f.e.t. structures are used to qualitatively explain relative magnitudes of parasitic element values observed in experimental InP m.e.s.f.e.t.s. Large drain-gate capacitance observed in InP is attributed mainly to substrate conduction, whereas large drain conductance at certain drain biases in InP may be unavoidable due to large velocity dropback and large high-field diffusion in this material. Low Schottky-barrier height and substrate conduction also increase gD     

n-channel formation on semi-insulating InP surface by m.i.s.f.e.t.

InP m.i.s.f.e.t.s using Fe-doped semi-insulating material surface have been fabricated. The devices, composed of sulphur-diffused n-type source and drain and c.v.d. Al2O3 gate insulator, exhibited n-channel normally-off behaviour and a source drain capacitance two orders of magnitude smaller than that of p-InP m.i.s.f.e.t.s with the same dimensions.     

Applications of dual-gate GaAs m.e.s.f.e.t.s for fast pulse shape regeneration systems

The suitability of dual-gate GaAs m.e.s.f.e.t.s for pulse shape reconstruction in the Gbit/s range is presented. The properties of these f.e.t.s and the circuitry for reduction of pulse width and pulse slope are both described. The variation of the input/output pulse-width ratio and the time behaviour for fast pulses are shown.     

n- and p-channel m.o.s.f.e.t.s as Rayleigh-surface-wave detectors

We have studied the piezoresistance effect in an m.o.s.f.e.t. structure used as a Rayleigh-surface-wave transducer. The investigation was carried out over a large frequency range about a central value of 100 MHz. Results for silicon?m.o.s.f.e.t. n- and p- channel inversion layers are given.