高品质钼靶材低压等离子喷涂成形技术研究

采用低压等离子喷涂成形技术制备了片状及回转体钼靶材,研究了钼靶材孔隙率、氧含量、微观结构、显微硬度及拉伸强度等性能,开展了片状钼靶材的磁控溅射镀膜研究。研究结果表明:低压等离子喷涂成形钼靶材为典型的定向凝固柱状晶层片结构,层片界面结合紧密,孔隙率约1.1%、氧质量分数为0.18%,显微硬度为HV0.025 361.8,抗拉强度达到373.2 MPa,各项指标均明显优于大气等离子喷涂成形钼制品。低压等离子喷涂成形片状钼靶材可磁控溅射沉积出平整、致密、连续的钼薄膜,镀膜厚度约700 nm,X射线衍射谱线表明钼薄膜为体心立方结构,沿(110)方向择优生长。磁控溅射离子的均匀轰击导致钼靶材表面快速溅射及均匀减薄,溅射表面及截面较为平整光滑,溅射凹坑均为纳米级。     

高纯溅射靶材回收研究现状

高纯溅射靶材在晶圆代工企业和液晶面板企业作为耗材使用。高纯溅射靶材利用率低,一般平面靶利用率低于30%,旋转靶难超过70%,回收溅射后的残靶具有非常高的经济价值和环保意义。本文综述了贵金属、ITO、钛、钽、铝、铜等高纯靶材的回收研究现状,总结了靶材回收过程中面临的共同问题。目前在高纯靶材的残靶回收中还存在金属回收率低、回收的纯度不高、工艺流程长等问题需要攻克和改善,作者展望了开发较短的流程、环境友好的工艺、探索高价值的用途,是未来高纯残靶回收技术改进和发展的方向。     

铝铜合金靶材的微观结构对溅射沉积性能的影响

磁控溅射中高沉积速率有利于获得高纯度薄膜,节省镀膜时间;高沉积效率的靶材可制备出更多数月的晶圆.通过建立平面靶的溅射模型研究了Al-Cu合金靶的品粒取向和品粒尺寸对溅射速率、沉积速率和沉积效率的影响.实验结果显示,溅射速率与靶材的原子密排度成正比关系,靶材的原子密排度受品粒取向和晶粒尺寸的影响,有特定的变化范围,因此溅射速率也只在一个范围内变化.沉积速率和沉积效率受靶材表面窄间内原子密排方向分布的影响,原子密排方向分布则由靶材的晶粒取向和晶粒尺寸决定.     

热处理温度对钼靶材微观组织和性能的影响

通过定量金相技术和显微硬度测试等方法,研究了热处理温度对钼溅射靶材的微观组织、硬度及I-U曲线的影响规律。研究结果表明,钼靶材晶粒尺寸随着热处理温度的升高而增大,而靶材硬度随之呈下降趋势。钼靶材在1200℃进行1 h热处理,晶粒尺寸分布最均匀。所研究钼靶材的I-U曲线均符合Thornton经验公式,热处理温度为1200℃的靶材具有最佳的磁控溅射放电性能。     

钼靶材变形量及热处理对薄膜微观组织及性能的影响

通过研究靶材变形量及热处理工艺对溅射薄膜的微观组织、表面粗糙度及晶形的影响,结果表明:变形量为80%的钼靶材溅射制备的薄膜晶化程度优于变形量小的靶材溅射薄膜;溅射相同的薄膜厚度,随着靶材变形量的增大,溅射薄膜的方阻越大;1 100℃退火靶材溅射薄膜的粗糙度最小,表面颗粒最细小均匀,晶粒取向明显。     

等离子喷涂技术在溅射靶材制备中的应用

镀膜行业的快速发展对溅射靶材的大型化、利用率等提出了更高要求。但传统的靶材制备方法在靶材大型化方面存在很大局限。等离子喷涂技术可喷涂几乎所有的陶瓷、金属、金属化合物,在靶材制备领域有着巨大的应用潜力。本文重点介绍了目前溅射靶材主要制备方法及存在问题,并对等离子喷涂制备溅射靶材的特点及设备现状及发展方向进行了阐述。     

W和W/Ti合金靶材的应用及其制备技术

近年来随着磁控溅射技术的应用日趋广泛,对各种高纯金属及合金溅射靶材的需求量也愈来愈大.本文简要介绍了当前W和W/Ti合金靶材的应用和制备方法等,对W和W/Ti合金靶材未来的制备技术进行了展望.     

靶材热处理温度对磁控溅射Mo薄膜组织和性能的影响

采用磁控溅射设备和经过不同温度热处理的Mo靶材,以相同的溅射工艺参数,在Si基片上制备了Mo金属薄膜,研究了靶材的热处理温度对Mo薄膜组织和性能的影响。研究结果发现,所制备Mo薄膜均呈现（110）晶面择优取向,而靶材热处理温度的升高能够提高（110）晶面的择优取向程度。所有薄膜均为T型低温抑制生长。比较结果表明：经1 200℃热处理的Mo靶材溅射率最高（18.5 nm/min）,且其溅射膜具有较小的方阻值和较好的厚度均匀性,综合性能最优。     

光伏及LED行业用特种钼制品研究现状

钼溅射靶材以溅射薄膜方式被消耗,钼合金薄膜是目前信息存储、集成电路芯片、特别是平板显示器、薄膜太阳能电池、蓝宝石制造等行业中必不可少的关键材料。这些行业中用的特殊钼制品主要有钼溅射靶材,包括平面靶和管状旋转靶,制作结晶蓝宝石用的钼坩埚等。随着平面显示器面板(LCD)生产线不断向大型化发展,对平面溅射板靶的尺寸要求也越来越大。管状溅射靶材利用率理论上可达70%,大大高于平面靶20%~30%的利用率,因此降低了镀膜生产成本,是靶材发展的方向。大口径薄壁钼坩埚是蓝宝石晶体生长炉中常用的耗材,可大大降低电耗,节能效果明显,近年来得到了各厂商广泛使用。     

YBCO高温超导靶材制备工艺研究

进行了用钇钡铜氧（ＹＢＣＯ）系高温超导粉制备磁控和激光溅射超导薄膜用靶材的工艺研究。对靶材原料粉末的质量要求和制靶工艺进行了探讨，对影响靶材质量进而影响膜材质量的主要因素（如成分、纯度、均匀性、粒度及超导电性等）进行了研究。多家超导薄膜研究单位对本工艺靶材的使用结果证明了材料的优良品质，采用本工艺研制的大直径环形靶制出的超导薄膜，Ｊｃ值均在１０￣６Ａ／ｃｍ￣２水平。     

Development of a hybrid process of obtaining wear-resistant coatings based on ion-plasma arc sputtering and magnetron sputtering

This work is devoted to the development of a new hybrid method of deposition of coatings based on ion-plasma arc sputtering and magnetron sputtering. The objects of investigation were samples of coatings of the Ti-Al-N system on the VK-6 hard-alloy plates obtained by three different methods, namely, ion-plasma sputtering, magnetron sputtering, and hybrid sputtering. Deposition processes were performed under the rarefaction of 1.3 × 10^?3 Pa at a substrate temperature of 550–600°C. A VT-5 alloy of the composition Ti-Al (6 at %) was used as the sputtered material. The phase and elemental compositions of the coatings, their mechanical properties (microhardness and the Young modulus), and adhesion strength were studied. All samples were tested under the conditions of continuous cutting. The results of investigations showed that the coating obtained by the hybrid method possesses a complex of positive properties of the ion-plasma and magnetron coatings, specifically, a high adhesion strength along with the uniformity of the composition and structure, which explains its increased durability.     

1J22合金材料应用于溅射垂直磁记录薄膜的尝试

1J22合金带作为溅射靶材的一种尝试,充分利用1J22合金冷轧带材产品具有高饱和磁感应强度、高居里温度、成分均匀、纯度高的优点．避免粉末法制备FeCo产品所产生的纯度低、成分不均匀等缺陷．磁控溅射出成分均匀、磁性能较好,用于垂直磁记录的薄膜,可以替代其它FeCo和FeNi合金靶材,成为更加理想的垂直磁记录溅射靶材．     

Structure and Properties of TiO2-CeO2 Films Deposited on Soda-Lime Silicate Glass Substrates by R.F.Magnetron Sputtering

TiO2-CeO2 films were deposited on soda-lime glass substrates at different ratio of O2 to Ar (0.10, 0.15,0.20) by R. F. magnetron sputtering. The structure, surface composition, UV-visible spectrum of the films were measured by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and spectrometer. The results show that the films are amorphous, and the relative molar ratio of Ce to Ti is higher than that of the target at lower ratio of O2 to Ar. Only tetravalent Ti 4 and Ce 4 ions are present in the films, and the obtained TiO2 -CeO2 films appear good uniformity and high density. The films deposited on the glass can shield ultraviolet light without significant absorption of visible light.     

钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层

采用非平衡磁控溅射技术在TCA钛合金表面沉积NiCoCrAlY抗烧蚀涂层,分析了不同溅射工艺下沉积涂层的微观结构以及对涂层组织的影响。结果表明：溅射沉积涂层成分主要与靶材成分均匀性有关,沉积涂层的成分与靶材成分基本一致;溅射过程中由于涂层表面不均匀的择优生长,造成涂层表面粗糙度有提高的趋势,涂层表面会产生大量的微米级的颗粒状突起以及出现少量直径约十几个微米的圆丘形突起,都呈现中心高、四周低的特征。实验制备涂层厚度在7～60μm之间,组织致密,厚度均匀,与基体结合良好,涂层增厚与溅射时间呈线性关系。XRD分析说明涂层表面主要是AlNi3,Al0.9Ni0.22相,其他涂层元素以非晶态存在,随涂层沉积时间延长,涂层表面晶态结构发生破坏,涂层元素之间形成的化合物相趋于消失。     

Deposition of Nano-Scaled Coatings Using Inductively Coupled Plasma

Nano-scaled Ti-B-N coatings could be produced by inductively coupled plasma (ICP) assisted magnetron spurtering. The properties and microstructure of the coating can be changed drastically by applying ICP to conventional magnetron sputtering. In this work, an internal type rf ICP process is used. The core of this technology is the efficient production and control of self-depositing ions and reactive gas ions by an induced electric field. Ti-B-N coatings were prepared by using a TiB2 target and a gas mixture of N2 and Ar at 200 ℃ and a pressure of 60 mTorr. In addition to ICP, the effect of the substrate bias voltage on the structure and properties of the coating was investigated. By applying ICP and a bias voltage to the substrate the hardness of the Ti-B-N coating is increased by more than 75 GPa, as a result of enhanced ionization in the plasma. The Ti-B-N coating, which has the highest hardness, shows the best surface uniformity and a very dense structure with a grain size of 3 nm. This sample also shows a high crystallinity compared to the coating prepared using other deposition parameters.     

Magnetic property and microstructure of SmCo magnetic recording films

Cr/SmCo/Cr thin films with Sm concentration of 37.7 at.% were deposited on glass substrates by magnetron sputtering. Meas-urement of magnetic properties showed that the SmCo film possessed good magnetic anisotropy, a high coercivity of 3019 kA/m and low magnetic exchange coupling. Microstructure analysis showed that crystallized SmCo5 magnetic phase, non-magnetic SmCo2 phase and Sm2Co7 phase co-existed ill the film. The non-magnetic SmCo2 phase might function as isolator of SmCo grains, leading to a decrease of magnetic exchange coupling. Moreover, a Cr2)3 oxide layer which could protect the SmCo layer from oxidation formed at the surface of the Cr cap layer.     

简述表面抗菌不锈钢材料的制备方法

综述了表面抗菌不锈钢的最新研究进展。制备表面抗菌不锈钢的方法有化学热处理、磁控溅射、离子注入、溶胶-凝胶和化学沉积。分析了存在的问题，并提出了建议。     

晶界扩散Tb对烧结Nd-Fe-B组织与磁性能的影响

用磁控溅射法在烧结Nd-Fe-B磁体表面沉积Tb金属薄膜并进行晶界扩散处理,对比经不同热扩散温度及时间处理后的磁体组织和磁性能变化。结果表明,925℃×10 h+500℃×2 h为最佳晶界扩散工艺,可将磁体矫顽力提高到1630.9 kA·m^-1,较原始磁体提升50%,同时剩磁和磁能积无明显下降,磁体仍具有较高的退磁曲线方形度。晶界扩散处理后磁体取向度有所提高,主相晶粒表面形成了明显的富Tb壳层结构,其厚度随离开磁体表面距离的增加逐渐变薄,随热扩散温度升高和时间延长逐渐增厚。长时间热扩散处理使磁体内形成沿晶界分布的连续薄层富Nd相,将主相晶粒彼此分隔,有效降低磁性相颗粒间交换耦合作用。能谱(EDS)分析表明,适当的热扩散工艺可使Tb元素扩散至磁体芯部,渗透厚度4 mm的磁体。