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采用脉冲激光沉积制备了新型无铅压电Bi0.5(Na0.7K0.1Li0.2)0.5TiO3陶瓷薄膜,分别利用X射线衍射仪、X射线光电子谱、俄歇电子能谱、原子力显微镜及扫描电镜研究了该薄膜的晶体结构、组成成分及表面形貌.结果表明,薄膜基体温度和工作气压对所生长的薄膜影响较大;在SiO2/Si基片上制备Bi0.5(Na0.7K0.1Li0.2)0.5TiO3薄膜的最佳温度和氧气压力分别为600℃和13Pa;利用脉冲激光沉积的薄膜具有精细的表面结构. 相似文献
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利用微等离子体氧化方法,在纯Ti金属表面制备TiO2、TiO2(W)薄膜,并用X射线衍射(XRD)、扫描电镜(SEM)初步研究了薄膜的组织结构和表面形貌.在不同的条件下,得到3种不同类型结构组成的薄膜单一TiO2的锐钛型结构、单一TiO2金红石结构及TiO2(W)薄膜;同时对薄膜的催化特性进行了初步的研究. 相似文献
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采用非平衡磁控溅射法制备了3种TiO2薄膜,对医用NiTi合金弹簧圈进行了表面改性处理.运用X射线衍射(XRD)、X射线光电子能谱仪(XPS)、原子力显微镜(AFM)﹑扫描电子显微镜(SEM)等手段系统研究了薄膜的表面结构、成分、微观形貌等,同时对薄膜的接触角进行了测试.通过血小板粘附和人脐静脉内皮细胞种植试验研究和评价了薄膜的血栓形成能力和内皮化性能.结果表明,医用NiTi合金弹簧圈表面镀一定结构和性质的TiO2薄膜后,其血栓形成能力和内皮化性能得到明显提高. 相似文献
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氧化钛薄膜表面羟基活化能力及对生物相容性的影响 总被引:1,自引:0,他引:1
采用非平衡磁控溅射法制备了3种不同结构的TiO2薄膜,对所得TiO2薄膜运用碱处理方法进行表面处理,期望在材料表面获得羟基活性基团.运用X射线衍射(XRD)研究了薄膜的表面结构.利用傅里叶红外技术(FTIR)和X射线光电子能谱仪(XPS)等手段对活化处理前后样品表面的羟基基团进行检测,并对活化前后样品进行了内皮细胞培养和血小板黏附实验.结果表明,运用碱处理方法,可以在锐钛矿型以及金红石与锐钛矿的混晶结构TiO2薄膜表面形成活性羟基基团;相比于金红石型TiO2薄膜,混晶结构和锐钛矿型具有较好的羟基活化能力.生物相容性实验表明,碱活化处理后样品表面细胞生长数目多于活化前样品,血小板黏附数量少于活化前样品,表面活性基团的存在有利于提高TiO2薄膜材料的生物相容性.此外,影响TiO2薄膜表面生物活化性能的因素进行了初步探讨. 相似文献
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以酒石酸和柠檬酸钠为络合剂,采用水浴法(CBD)制备ZnS薄膜.利用X射线衍射(XRD)、X射线能谱仪(EDAX)、扫描电镜(SEM)、紫外-可见分光光度计(UV-vis)研究ZnS薄膜的结构、成分、形貌及光学性能.利用透射光谱计算了ZnS薄膜的光学禁带宽度.结果表明:ZnS薄膜呈立方相晶体结构,水浴沉积时间为3h的ZnS薄膜原子比Zn∶S为1∶0.85,薄膜表面均一致密,在可见光区有着好的透射性能,在300~800 nm的光谱范围内平均透射率达到80.8%,光学禁带宽度为3.78eV,适合作为太阳能电池过渡层. 相似文献
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采用磁控溅射沉积方法在Si基底表面制备U2N3+xOy薄膜, 采用X光电子能谱(XPS)分析技术观测CO气氛环境下U2N3+xOy薄膜表面腐蚀行为, 以期获得U2N3+xOy薄膜在CO环境下的表面腐蚀机理。结果表明: 超高真空条件下, CO在U2N3+xOy薄膜表面表现为氧化特性; CO在薄膜表面吸附解离生成的C以无定形碳形式聚集在薄膜表面, 深度剖析过程中并未观察到C向U2N3+xOy薄膜内部扩散; 而解离生成的氧在薄膜内扩散并发生氧化反应, 生成高价氧化物或铀氮氧化物和氮。氧化反应生成的氮向薄膜内部扩散, 并在次表面反应生成富氮中间产物。随着CO暴露反应进程的推进, 富氮层逐渐向薄膜内部迁移, 这是导致U4f谱卫星峰变化的主要原因。 相似文献
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The mechanism and chemical nature of uranium and thorium sequestration by a Pseudomonas strain was investigated by transmission electron microscopy, energy dispersive X-ray (EDX) analysis, FTIR spectroscopy and X-ray diffractometry. Atomic force microscopy (AFM) used in the tapping mode elucidated the morphological changes in bacterial cells following uranium and thorium binding. Transmission electron microscopy revealed intracellular sequestration of uranium and thorium throughout the cell cytoplasm with electron dense microprecipitations of accumulated metals. Energy dispersive X-ray analysis confirmed the cellular deposition of uranium and thorium. EDX and elemental analysis of sorption solution indicated the binding of uranium and thorium by the bacterial biomass via displacement of cellular potassium and calcium. The strong involvement of cellular phosphate, carboxyl and amide groups in radionuclide binding was ascertained by FTIR spectroscopy. X-ray powder diffraction (XRD) analyses confirmed cellular sequestration of crystalline uranium and thorium phosphates. Overall results indicate that a combined ion-exchange-complexation-microprecipitation mechanism could be involved in uranium and thorium sequestration by this bacterium. Atomic force microscopy and topography analysis revealed an undamaged cell surface with an increase in cell length, width and height following radionuclide accumulation. The arithmetic average roughness (R(a)) and root mean square (RMS) roughness (R(q)) values indicated an increase in surface roughness following uranium and thorium sequestration. 相似文献
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采用等离子体聚合的方法对正丙醇和丙烯醇进行了聚合,成功地在Si基体上得到了有机高分子薄膜,利用FT-IR,XPS研究了薄膜的结构,表明薄膜呈现出一种嵌段的高分子薄膜结构,利用AFM研究了薄膜的表面形貌并且测量了表面粗糙度,研究表明,等离子体聚合后薄膜表面十分平整,平均粗糙度在2 nm以内,利用测量薄膜表面接触角的方法计算了材料的表面能以及临界表面自由能,并且进行了讨论分析. 相似文献
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金属铀的化学性质十分活泼, 极易发生氧化腐蚀. 为改善基体的抗腐蚀性能, 采用非平衡磁控溅射技术在金属铀表面制备了不同氮含量的CrNx薄膜. 采用扫描电子显微镜(SEM)、X射线衍射技术(XRD)、X射线光电子能谱(XPS)、动电位极化曲线, 分别研究了薄膜形貌、物相结构、表面元素化学价态及抗腐蚀性能. 结果表明, 当氮流量为10 sccm时薄膜主要为体心立方的α-Cr, 随氮流量的增大, 薄膜转化为六方Cr2N和立方CrN结构, 其择优取向由Cr(110)转化为Cr2N(111)及CrN(200), 金属态Cr的含量逐渐减少, 氮化态Cr的含量增多, Cr2p3/2的结合能峰位逐渐向高结合能方向移动. CrNx薄膜呈纤维状结构, 当氮流量增大到30 sccm时, 生成了Cr2N的密排结构, 有效改善了薄膜的致密性. 在金属铀表面制备CrNx薄膜后, 自然腐蚀电位增大, 腐蚀电流密度降低, 当氮流量增大到30 sccm时, 薄膜的自然腐蚀电位提高了近550 mV左右, 腐蚀电流密度降低约两个数量级, 有效改善了贫铀表面的抗腐蚀性能. 相似文献
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Polarity conversion of hydride vapor phase epitaxy growing GaN via growth interruption modulation 总被引:1,自引:0,他引:1
Benliang Lei Guanghui Yu Haohua Ye Xinzhong Wang Chaotong Lin Ming Qi Gérard Nouet Jun Chen 《Thin solid films》2008,516(12):3772-3775
GaN films were deposited by hydride vapor phase epitaxy with and without adopting growth interruption modulation (GIM). The surface morphologies of these samples were observed by atomic force microscopy. After chemical etching, the surface morphology of GaN film grown directly on sapphire changed greatly and turned out to be N-polarity, which could be changed into Ga-polarity when growing via interruption modulation. Photoluminescence spectra showed that optical property of Ga-polar film was better than that of N-polar film. High resolution X-ray diffraction revealed the high crystalline quality GaN film grown by using the GIM method. The polarity conversion was the result of surface reconstruction when adopting GIM method. 相似文献
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Hydroxyapatite (HA) films were deposited using dual ion beam sputtering. Deposition was carried out with an in situ heat treatment at three temperature settings during deposition. X-ray diffraction of the films at the surface revealed that the deposited film is composed of hydroxyapatite crystalline and amorphous phases. Cross-sectional transmission electron microscopy analysis displayed that the films have a graded crystal structure with the crystalline layer near the substrate and the amorphous layer at the top surface. Compositional analysis was performed using SEM-EDX at the top surface as well as STEM-EDX at the cross-section of the film. The average calcium to phosphorous ratio at the surface is 1.46, obtained by SEM-EDX. The Ca/P ratios in the crystalline and amorphous layers of the film are 1.6 to 1.7, close to the ratio of 1.67 for HA. 相似文献
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采用自行设计制造的离子束联合溅射系统,将磁控溅射与离子注入技术相结合,在镁合金表面形成多层TiAlN强化膜.用金相显微镜、X射线衍射仪、原子力显微镜、摩擦磨损仪等手段,研究了多层膜的表面形貌、结构和性能.结果表明,TiAlN膜膜表面光滑致密、孔隙率大大降低,粗糙度为42.28nm,由TiAlN强化相组成;成膜后耐磨性有所提高,但摩擦系数变化不大,未达到减摩作用. 相似文献