Properties of thin FePt films synthesized by sequential sputtering of components

Thin (001)-oriented FePt films in the form of multilayer [Pt/Fe] _n structures have been synthesized by means of sequential RF magnetron sputtering of the components. The dependence of the microstructure, magnetic properties, and magnetic anisotropy of the [Pt/Fe] _n system on the substrate temperature during deposition, the type of the first deposited layer, the thicknesses of the partial Fe and Pt layers, and the total film thickness has been studied.     

Corrosion-resisting Co-Pt thin film medium for high density recording

This paper describes a new material medium for high density longitudinal recording. Sputtered Co-Pt thin films will be shown to have excellent corrosion resistance and magnetic properties. Co-Pt thin films do not need a thick overcoat like plated Co-Ni-P films do, and have higher remanent flux density than ferrite thin films. Co1-xPtx(X=0-0.60) thin films prepared by r.f. diode sputtering have a maximum Hc value near X=20. The Hc, Bs and squareness, for 20 at.% Pt film are 1,100 Oe, 12,000 G and 0.80-0.90, respectively, at 0.1 μm film thickness. These values are not changed over 1-15 Watt/cm²power densities, corresponding to 6-85nm/min deposition rates. Films with more than 28 at.% Pt have no Bs change after immersion in water for over one month, indicating that the films are passive by this test, at least. Ni additions improve magnetic and corrosion properties. There is no Bs change for Co0.070Ni0.010Pt0.020films after immersion in water for over one month. Finally, 51 KFRPI linear recording density was obtained, at D50, using a Co0.70Ni0.10Pt0.20thin film disc with a 0.46 μm gap length head and a 0.12 μm head-medium spacing.     

Effects of Magnetic Annealing on Structure and Magnetic Properties of L10-FePt/Ag Films

The structural and magnetic properties of L1₀-FePt/Ag films were studied by X-ray diffraction and a vibrating sample magnetometer. The FeAg/Pt films were obtained by depositing FeAg thin films on thermally oxidized Si (001) substrates via magnetron sputtering and Pt layers on their surface after annealing FeAg thin films at 400 °C with and without an out-of-plane magnetic field of 10 kOe. These films were further annealed at various temperatures to obtain L1₀-FePt phase. The results indicated that the pre-annealing of FeAg thin films under 10 kOe magnetic field caused (001) orientation of Fe particles, and the deposition of Pt layer on such orientated underlayers reduced the ordering temperature of FePt in FeAg/Pt films, realizing the L1₀-FePt phase at 400 °C. The higher coercivity and ordering degree were also observed in the samples, compared with those pre-annealed without magnetic field at the same annealing condition.     

Onset of hard magnetic L10 FePt phase with (001) texture

The perpendicular anisotropic magnetic properties of in-situ deposited FePt/Pt/Cr trilayer films were elucidated as functions of the deposition temperature and the sputtering rate of the FePt magnetic layer. Ordered L1₀ FePt thin films with perpendicular anisotropy and a (001) texture can be developed at a temperature as low as 300 °C with the sputtering of a FePt layer at a low rate. The larger Pt(001)[100] lattice induced an expansion of the FePt a- and b-axis, leading to the contraction of the FePt c-axis, enabling the epitaxial growth of the L1₀ FePt(001) texture to occur. A low rate of sputtering of the FePt thin film promotes the formation of the magnetically hard FePt(001) texture on the surface of the Pt(001) buffer layer at low temperature, while the high sputtering rate of FePt layer suppresses the phase transformation.     

Structure and magnetic properties of Fe films with pyramid-like nanostructures deposited by oblique target direct current magnetron sputtering

Fe thin films were deposited by oblique target direct current magnetron sputtering on Si (100) and (111) substrates. The structure, surface morphology and magnetic properties of the thin films were characterized using X-ray diffraction, field emission scanning electron microscopy, and superconducting quantum interference device magnetometer, respectively. The results reveal that the structure of the as-deposited Fe thin films is body-centered cubic with the preferential [110] crystalline orientation. A pyramid-like nanostructure with sharp tip was formed on the surfaces of Fe thin films under appropriate sputtering power. Formation of the pyramid-like nanostructure is mainly owed to the enhancement of atomic mobility and the bombardment effect with increasing of sputtering power. Meanwhile, the crystalline orientation of Si substrate and the intrinsic stress in the films are expected to have little contribution to the formation of the pyramid-like nanostructure. The magnetic anisotropy was found in the as-deposited Fe thin films, and varies with the thickness of the Fe thin films. As the film thickness increases from 604 to 1,786 nm, the magnetic anisotropy field and the uniaxial anisotropy constant increase from 3.8 to 5.6 kOe, and from 0.4 × 10⁶ to 1.1 × 10⁶ erg/cm³, respectively, which indicates that besides magnetocrystalline anisotropy, stress induced anisotropy and shape anisotropy also exist in the as-deposited Fe thin films.     

溅射工作气压对Fe/Si_3N_4多层膜微波磁性的影响

在不同的溅射气压下,采用连续磁控溅射制备了Fe/Si3N4多层膜,探讨了溅射气压对多层膜微波磁性的影响。研究发现,溅射气压影响着多层膜的沉积速率和微结构,在溅射铁子层时,Ar气流量控制在300sccm~400sccm下,在溅射氮化硅子层时,氩气与氮气的流量控制在2∶1,总流量控制在320sccm时制备得到的多层膜具有最好的磁性能。     

The effects of oxygen partial pressure on BST thin films deposited on multilayered bottom electrodes

Ba_0.5Sr_0.5TiO₃ (BST) thin films have been deposited by r.f. magnetron sputtering on silicon and platinum-coated silicon substrates with different buffer and barrier layers. BST films deposited on Si/SiO₂/SiN/Pt and Si/SiO₂/Ti/TiN/Pt multilayer bottom electrode have been used for the fabrication of capacitors. XRD and SEM studies were carried out for the films. It was found that the crystallinity of the BST thin film was dependent upon oxygen partial pressure in the sputtering gas. The role of multilayered bottom electrode on the electrical properties of Ba_0.5Sr_0.5TiO₃ films has been also investigated. The dielectric properties of BST films were measured. The results show that the films exhibit pure perovskite phase and their grain sizes are about 80–90 nm. The dielectric properties of the BST thin film on Si/SiO₂/Ti/TiN/Pt electrode was superior to that of the film grown on Si/SiO₂/SiN/Pt electrode.     

Ferromagnetic Resonance Study of Fe/Cu Multilayer Thin Film

Fe/Cu/Fe multilayer thin film was grown on Si (100) substrate by using magnetron sputtering technique at room temperature. Dynamic and static magnetisations of the film have been investigated using ferromagnetic resonance (FMR) and vibrating sample magnetometer (VSM) techniques in the temperature range of 10–300 K. From the room-temperature in-plane FMR measurements, a growth-induced uniaxial magnetic anisotropy was observed. Out-of-plane FMR measurements exhibited a large magnetic anisotropy due to a large saturation magnetisation of Fe. A computer code was written to simulate the experimental FMR data and to obtain the magnetic parameters of the Fe/Cu/Fe multilayer thin film. g value, effective magnetisation, uniaxial anisotropy field and perpendicular anisotropy constant from the fitting of the angular dependence of the resonance field at both the in-plane and out-of plane geometries were determined. The exchange bias effect was observed from the low-temperature VSM measurements. The saturation magnetisation and coercive field decrease with increasing temperature due to the increase of the thermal fluctuations.     

Sputtered FeCoN soft magnetic thin films with high resistivity

Fe/sub 70/Co/sub 30/N thin films with thickness from 20 to 1100 /spl Aring/ were prepared by radio- frequency reactive sputtering in an N/sub 2/--Ar mixture. The FeCoN films prepared in a low nitrogen flow rate percentage (<6%) and sputtering pressure (<8 mTorr) have a high B/sub s/ of about 24.0 kG, but a moderate hard-axis coercivity H/sub ch/ of 5-30 Oe. With further increase in N/sub 2/ percentage or sputtering pressure, films become significantly softer, with H/sub ch/ of about 0.1-0.6 Oe, and have a higher resistivity of up to about 160 /spl mu//spl Omega//spl middot/cm. The change in the magnetic properties with nitrogen flow rate percentage and sputtering pressure can be attributed to the formation of an ultrafine grain size nanocrystalline FeCoN thin film as observed by high-resolution transmission electron microscope. The soft properties of FeCoN films with nano-sized crystallites remain stable even after being annealed at 270/spl deg/C.     

钛酸锶钡薄膜C-V曲线不对称现象研究

采用射频（RF）磁控溅射在Pt／Ti／SiO2／Si（100）衬底上制备了Ba0.6Sr0.4TiO3（BST）薄膜。通过研究BST薄膜的电容-偏压（C-V）特性曲线发现,溅射过程中的离子注入引起底电极／铁电薄膜界面处产生了过渡层,从而导致C-V曲线不对称。最后我们通过改进溅射工艺对这一机理进行了实验验证。     

RF sputtered PLZT thin film on Pt/Ti electrode

PLZT (7.5/65/35) thin films were deposited by rf magnetron sputtering on single crystal Si substrates using an oxide sintered target with excess PbO. The effects of postannealing and bottom Pt/Ti electrodes on the thin film crystal structures and ferroelectric properties were studied. Film deposited at 200°C or below crystallizes to a perovskite phase after annealing treatment at 550°C or above, and the crystal structure depends on the annealing treatment. The best crystal structures and electronic properties were obtained when the thin films were annealed at 600°C to 650°C for 1 h in O₂. For the Pt/Ti two-layer bottom electrode, the thickness of the Ti layer has a dominant effect. When the Ti layer was too thick or too thin, the PLZT thin film structures consist mainly of pyrochlore phases. However, using an appropriate Ti layer thickness, PLZT thin films having good crystal structures and ferroelectric properties can be obtained, with typical remanent polarization value of 220 mC/m² and coercive field strength of 6.5 MV/m     

High tunnel magnetoresistance in epitaxial Co/sub 2/Cr/sub 0.6/Fe/sub 0.4/Al/MgO/CoFe tunnel junctions

We have fabricated fully epitaxial magnetic tunnel junctions (MTJs) using a Co-based full-Heusler alloy Co/sub 2/Cr/sub 0.6/Fe/sub 0.4/Al (CCFA) thin film and an MgO tunnel barrier. The CCFA thin film for the lower ferromagnetic electrode was deposited by magnetron sputtering on an MgO-buffered MgO single-crystal substrate, and the MgO tunnel barrier was formed by electron beam evaporation. The microfabricated epitaxial CCFA/MgO/CoFe MTJs showed high tunnel magnetoresistance ratios of 42% at room temperature and 74% at 55K.     

溅射工艺条件对TbFeCo/Pt薄膜磁性能的影响

采用射频磁控溅射法在玻璃基片上成功制得了TbFeCo/Pt非晶垂直磁化膜,系统研究了溅射工艺参数对TbFeCo薄膜磁性能的影响.振动样品磁强计测量结果表明:Tb含量在补偿成分点附近,采用较低的溅射氩气压与Pt底层,有利于提高TbFeCo薄膜的磁性能;当Tb含量为0.24,溅射功率为300W,溅射气压为0.53Pa,薄膜厚度为140nm时,TbFeCo/Pt薄膜矫顽力达到476kA/m,饱和磁化强度为151kA/m,剩磁矩形比超过0.8,该薄膜有望用作高密度光磁混合记录介质.     

SmCo薄膜磁控溅射沉积速率的影响因素

SmCo薄膜的厚度是影响其磁性能的重要因素,而沉积速率是控制薄膜厚度的关键。采用直流磁控溅射工艺制备SmCo薄膜,设计正交实验并通过数理统计方法研究了溅射工艺参数中溅射功率、靶基距及氩气压强对SmCo薄膜沉积速率的影响,并同时考察了不同厚度SmCo薄膜的磁性能变化规律。研究结果表明:溅射功率与靶基距都对薄膜的沉积速率有较大的影响,其中在溅射功率为40~120W范围内时,随着溅射功率的增大SmCo薄膜的沉积速率逐渐提高;在靶基距为50~70mm的范围内,SmCo薄膜的沉积速率随靶基距的增大而逐渐降低;而在氩气压强处于0.7~1.5Pa范围内时,SmCo薄膜的沉积速率几乎不随氩气压强的改变而变化。在溅射功率为80W、靶基距为60mm及氩气压强为1.1Pa的工艺条件下,SmCo薄膜的沉积速率具有很好的稳定性。随膜厚从0.59μm增加到0.90μm,SmCo薄膜的矫顽力由23.4kA/m降低到8.2kA/m。     

不同电极形式对掺镧钛酸铅铁电薄膜的介电性能的影响

采用射频磁控溅射技术在Si(100) 基底和Pt/Ti/SiO2/Si(100)基底上生长了掺镧钛酸铅[(Pb0.9,La0.1)TiO3, PLT10]铁电薄膜.用X射线衍射技术(XRD)研究了PLT10薄膜结晶性能.使用光刻工艺在Si(100) 基底的PLT10薄膜上制备了叉指电极,测试了PLT10薄膜的介电性能.在室温下,测试频率为1kHz时,PLT10薄膜的介电常数为386.而采用相同工艺条件制备的具有平行电极结构的PLT10薄膜, 其介电常数为365.但利用叉指电极测试的PLT10薄膜的介电常数和介电损耗随频率的下降比利用平行电极测试的PLT10薄膜的快些.这是因为叉指电极结构引入了更多的界面态影响的缘故.     

Structure and Magnetic Properties of BaCoTiFe10O19 Thin Films with an Easy-Axis In-Plane Orientation

BaCoTiFe10O19 hexaferrite thin films with an easy-axis in-plane orientation were prepared by crystallization of amorphous films deposited by rf magnetron sputtering. The structure and magnetic properties were investigated. It is shown that CoTi-doping leads to a reduction of spontaneous magnetization and magnetic moment, which is caused by non-collinear magnetic structure and surface spin canting of small particles. The substitution of CoTi for Fe can adjust coercivity and Curie temperature over a very wide range, while still maintaining the room temperature magnetization. It is found that BaCoTiFe10O19 films exhibit a large squareness of hysteresis loop, Sq = 0.68. Thus, this film is desirable for high-density longitudinal recording systems.     

Optical,electrical and mechanical properties of Ga-doped ZnO thin films under different sputtering powers

We present the optical, electrical and mechanical properties of Ga-doped zinc oxide (GZO) thin films prepared by radio-frequency (RF) magnetron sputtering at room temperature under different RF powers (80–180 W). The thickness, electron concentration, and electron mobility of the GZO thin film were determined by fitting the visible-to-near-infrared transmittance spectrum of GZO film/glass using the transfer matrix method. The bending force per unit width was measured by a home-made Twyman–Green interferometer with the fast Fourier transform method. The obtained results show that the optical, electrical and mechanical properties of GZO thin film are subject to the RF power. At an RF power of 140 W, the local minimum of bending force per unit width corresponds to the highest electron mobility in GZO thin film. This study demonstrates that the optical, electrical and mechanical properties of GZO thin film can be fully resolved by non-contact optical methods.     

Study of the surface morphology of platinum thin films on powdery substrates prepared by the barrel sputtering system

The transition of Pt from a nanoparticle to a film on SiO₂ particles modified by the sputtering system with barrel-type powder sample holder (the barrel sputtering system). X-ray diffraction (XRD) and scanning electron microscopy (SEM) measurements reveal that the Pt nanoparticles grow in size with an increase in the duration of sputter deposition. The morphology of Pt changes from highly dispersed nanoparticles to a worm-like structure followed by a continuous Pt film, depending on the amount of Pt modified. Transmission electron microscopy (TEM) measurements reveal that the thin Pt film in the worm-like structure has a uniform thickness of approximately 2.6 nm, indicating film growth in a two-dimensional mode followed by an island mode.     

超薄Ni81Fe19薄膜的各向异性磁电阻及磁性能

利用磁控溅射方法制备了一系列超薄Ta(5nm)/Ni81Fe19(20nm)/Ta(3nm)磁性薄膜。着重研究了基片温度、缓冲层厚度对Ni81Fe19薄膜各相异性磁电阻(AMR)及磁性能的影响。利用X射线衍射仪分析了薄膜结构、晶粒取向;用四探针技术测量了薄膜的电阻率和各向异性磁电阻;用FD-SMOKE-A表面磁光克尔效应试验系统测量了薄膜的磁滞回线。结果表明:在基片温度为400℃时制备的Ni81Fe19薄膜具有较大的各向异性磁电阻效应和较低的磁化饱和场,薄膜最大各向异性磁电阻为3.5%,最低磁化饱和场为739.67A/m。基片温度为500℃制备的薄膜,饱和磁化强度Ms值最大。随着缓冲层厚度x的增加,坡莫合金薄膜的AMR值先变大后减小,在x=5nm时达到最大值。     

柱弧离子镀和非平衡磁控溅射镀制备Ti-N-C黑色硬质膜

采用柱弧离子镀和中频孪生靶非平衡磁控溅射镀膜技术制备了Ti-N-C多层复合黑色硬质膜.采用轮廊仪扫描电子显微镜(SEM)、分光光度计、显微硬度计等手段研究了所得膜层的各项性能.结果表明,两种工艺都可以获得颜色较深的黑色硬质膜,柱弧离子镀制备黑色硬质膜的效率高、力学性能更好;中频孪生靶非平衡磁控溅射制备的黑色硬质膜表面光滑、颜色更深.