KH550硅烷偶联剂对复合材料结构和介电性能影响

采用KH550硅烷偶联剂对BaTiO3粉体进行了表面处理,用溶液混合法及热压工艺制备了BaTiO3/PVDF复合材料.通过扫描电子显微镜对复合材料形貌的分析发现偶联剂的用量对复合材料形态影响较大; 用傅立叶变换红外光谱仪和X射线衍射分析了偶联剂用量对BaTiO3/PVDF复合材料微观结构影响; 通过阻抗分析仪研究了复合材料的介电性能, 发现偶联剂用量对复合材料介电性能影响很大,当偶联剂用量在1%(质量分数)时,BaTiO3体积分数为40%的复合材料介电常数高达51.     

Ce、V共掺杂BiFeO3多铁薄膜及其电性能研究

采用sol-gel法在Pt/Ti/SiO2/Si衬底上成功制备出纯BiFeO3(BFO)和Ce、V共掺杂Bi0.97 Ce0.03Fe1-x VxO3 (x=0,0.01,0.02,0.03)(BCFVx)薄膜.结构和形貌测试表明,Ce、V共掺杂使得BFO薄膜发生从菱方结构到伪四方结构的转变,且薄膜晶粒变小.介电性能和...     

KNN/PVDF纳米复合膜的制备及介电性能研究

采用聚合物前驱体法合成了K0.5Na0.5Nb O3(KNN)纳米粉体。X射线衍射(XRD)和扫描电子显微镜(SEM)分析表明,制备出的KNN粉体为单一的纯钙钛矿结构,并且其晶粒尺寸在15~25 nm之间。采用溶液混合法制备了KNN/聚偏氟乙烯(KNN/PVDF)纳米复合膜,研究了KNN纳米粉体的含量对复合膜微观形貌和介电性能的影响。结果表明,KNN纳米粉体均匀地分散在聚偏氟乙烯(PVDF)基体中,KNN/PVDF复合膜材料的介电常数和介电损耗均随着KNN含量的增加而增加。在1 k Hz下,当KNN质量分数为20%时,复合膜的介电性能较为优越,其介电常数为29.9,介电损耗为0.053。     

交替中间热处理BST薄膜介电性能研究

用溶胶凝胶(Sol-Gel)法制备了三种钛酸锶钡(Ba_0.6Sr_0.4TiO₃, BST)薄膜：常规的四层薄膜, 在逐层制备过程中,对首层薄膜进行中间热处理(Preheat-treatment, PT)的四层薄膜及间隔或交替地对奇数层薄膜进行中间热处理（称为交替中间热处理(Alternate-preheat-treatment, APT)）的八层薄膜. 用XPS研究薄膜表面成分化学态, 用SEM和AFM观察表面形貌及晶化, 并进行了介电性能测试. 结果表明, 常规薄膜介电性能差; 经PT, 薄膜裂纹和缩孔显著减少,形貌明显改善,表面非钙钛矿结构显著减少, 介电性能明显提高; 经APT, 薄膜形貌进一步改善,平均晶粒大小约30nm,非钙钛矿结构进一步减少, 介电损耗明显降低,介电稳定性和介电强度大幅度提高. APT为制备退火温度低及结构均匀致密的纳米晶BST薄膜提供了新方法, 可满足低频实用要求. 退火温度对薄膜厚度的影响也进行了讨论.     

Ba0.6Sr0.4TiO3薄膜的微结构及铁电性能研究

采用射频磁控溅射法制备了Ba0.6Sr0.4TiO3(简称BST)薄膜材料,研究了BST薄膜的组成、晶体结构、表面形貌及介电性能.介电偏压特性曲线和电滞回线都表明其具有铁电性,厚度为500 nm、晶粒尺寸为30 nm的BST薄膜,介电系数电压变化率(介电调谐率)为29.4%,矫顽场强(EC)约为12.1 kV/cm,并讨论了介电偏压特性曲线和电滞回线之间的联系,解释了电滞回线不对称的原因.     

生长温度对PLD原位生长SrTiO3薄膜结构与非线性介电性能的影响

采用脉冲激光沉积法 ( PLD ) 制备的Y1B2Cu3O7-x薄膜作为叉指底电极,然后生长 SrTiO3介质薄膜,形成叉指型压控电容结构。通过对 SrTiO3薄膜的原位生长温度与薄膜微观结构及非线性介电性能之间的关系研究,发现随生长温度的升高薄膜晶粒逐步增大然后变小,薄膜的介电常数可调率和本征介电损耗随晶粒大小的增大而增加,而非本征损耗则随晶粒取向的增加而减小。     

硅片上集成高介电调谐率的柱状纳米晶BaTiO3铁电薄膜

钛酸钡(BaTiO₃)具有优异的介电、铁电、压电和热释电等性能, 在微电子机械系统和集成电路领域具有广泛的应用。降低BaTiO₃薄膜的制备温度使其与现有的CMOS-Si工艺兼容, 已成为应用研究和技术开发中亟需解决的问题。本研究引入与BaTiO₃晶格常数相匹配的LaNiO₃作为缓冲层, 以调控其薄膜结晶取向, 在单晶Si(100)基底上450 ℃溅射制备了结构致密的柱状纳米晶BaTiO₃薄膜。研究表明：450 ℃溅射温度在保持连续柱状晶结构和(001)择优取向的前提下, 能获得相对较大的柱状晶粒(平均晶粒直径27 nm), 一定残余应变也有助于其获得了较好的铁电和介电性能。剩余极化强度和最大极化强度分别达到了7和43 μC·cm^-2。该薄膜具有良好的绝缘性, 在 0.8 MV·cm^-1电场下, 漏电流密度仅为10^-5 A·cm^-2。其相对介电常数ε_r展现了优异的频率稳定性：在1 kHz时ε_r为155, 当测试频率升至1 MHz, ε_r仅轻微降低至145。薄膜的介电损耗较小, 约为0.01~0.03 (1 kHz ~ 1 MHz)。通过电容-电压测试, 该薄膜材料展示出高达51%的介电调谐率, 品质因子亦达到17(@1 MHz)。本研究所获得的BaTiO₃薄膜在介电调谐器件中有着良好的应用前景。     

衬底温度对磁控溅射ZrN薄膜结构和物理性能的影响

采用直流反应磁控溅射法在Si(111)衬底上制备了ZrN薄膜,通过X射线衍射仪、拉曼光谱仪、场发射扫描电子显微镜、原子力显微镜以及霍尔测量等测试分析手段表征了薄膜的微观结构、表面形貌及电学性能。结果表明,制备的ZrN薄膜为立方相NaCl结构,具有(111)面择优取向。在T_s=550～650℃时,薄膜的结晶性最佳。薄膜呈柱状生长,晶粒尺寸会随着衬底温度的升高先增大后减小,当T_s=550～750℃时,表面出现三角锥状晶粒。制备的ZrN薄膜表面较为平整,表面粗糙度在3.9～6.67 nm之间。测得薄膜的电阻率大小在1.43～24.5×10~(-3)Ω·cm之间,且电阻率与薄膜的结晶性以及晶粒尺寸相关;薄膜的载流子浓度在0.869～4.38×10~(20) cm~(-3)之间,T_s=550～650℃的薄膜电学性能较好。     

溶胶-凝胶模板法制备K_(0.5)Na_(0.5)NbO_3纳米管阵列及其表征

以乙醇铌、乙酸钾和乙酸钠为原料,乙二醇甲醚为溶剂,采用溶胶-凝胶(Sol-Gel)阳极氧化铝(AAO)模板法制备了K0.5Na0.5NbO3(KNN)纳米管阵列.利用热分析确定晶化温度,采用X射线衍射、扫描电子显微镜和透射电子显微镜表征KNN纳米管的物相、形貌和微观结构.结果表明,KNN最佳的晶化温度为700℃;KNN纳米管阵列结晶性良好,为单斜钙钛矿多晶结构,单根纳米管的外径约为200nm,管壁厚约为20nm.对KNN纳米管阵列的铁电性能表征显示,其剩余极化率Pr约为1.86μC/cm2,矫顽场Ec约为0.68kV/cm。     

溶胶–凝胶法制备Au-BaTiO_3纳米复合薄膜及其介电性能

采用溶胶–凝胶法在Pt/Ti/Si O2/Si基板上制备了Au-Ba Ti O3纳米复合薄膜,并且对其晶体结构、微观组织和介电性能进行了研究。结果表明,Au在复合薄膜中以直径为5~22 nm的Au纳米粒子弥散地分布在Ba Ti O3基体中。Au的添加量对复合薄膜的介电性能和表面形貌有很大影响,其最佳添加量约为5mol%。复合薄膜经过550℃的低温退火已经完全结晶为钙钛矿相,其介电常数与700℃退火的纯Ba Ti O3薄膜的相当。在Au-Ba Ti O3复合薄膜的结晶过程中,一方面,Au纳米粒子可能促进了中间相的分解;另一方面,Au纳米粒子诱发了钙钛矿相的异质形核,促进了Ba Ti O3的结晶化。因此,Au纳米粒子大幅度地降低了复合薄膜的退火温度,并显著提高了复合薄膜的介电性能。     

Preparation of Oriented Barium Titanate Thin Films by Combination of Electrophoretic Deposition with Hydrothermal Treatment

Highly oriented barium titanate (BaTiO 3) thin films on Pt substrate were fabricated by combination of electrophoretic deposition with hydrothermal treatment.The structure and morphology of thin films were characterized by X-ray diffraction and field-emission scanning electron microscopy.It is found that the titania precursor film,Ba(OH)2 concentration and hydrothermal temperature play crucial roles in the film morphology and orientation.The BaTiO3 thin films with highly (110) preferred orientation can be f...     

（Ba0.6Sr0．4）Ti1-xZnxO3薄膜的介电调谐性能

利用溶胶-凝胶法在Pt／TiO2/SiO2/Si衬底上制备了（Ba0．6Sr0．4）Ti1-xZnxO3（BSTZ）薄膜,用X射线衍射和扫描电镜分析测定了BSTZ的微结构和薄膜的表面形貌,研究Zn掺杂量对其介电调谐性能的影响,结果表明,随Zn含量的增加BSTZ物相无明显变化,其介电常数、调谐量先增加后降低,但介电损耗却先降低后增加。在室温1MHz下,1．5m01％Zn掺杂BSTZ薄膜有最大的调谐量54．26％;2．5mol％Zn掺杂BSTZ薄膜有最低的介电损耗0．0148和最大的优值因子30．3。     

Effect of lattice-mismatch strain on the structural and dielectric properties of (Pb,Sr)TiO3 thin films grown by pulsed laser deposition

Pb_0.35Sr_0.65TiO₃ (PST) thin films have been fabricated on LaAlO₃ (LAO) and MgO substrates using the pulsed laser deposition technique. The microstructure characteristics of the films were examined by means of X-ray diffraction, atomic force microscopy, scanning electron microscopy and Raman spectroscopy, and the results indicate that the films are epitaxially grown and show good crystallinity. The dielectric constant dependence on DC bias voltage and temperature were measured in a planar capacitor configuration for these films. Compared to the PST thin film grown on LAO, the film grown on MgO showed a higher temperature of the capacitance maximum and a higher dielectric constant at zero bias. We explain the results by taking into account the lattice-mismatch strain between the substrate and the film. In contrast to the in-plane compressive strain induced by the LAO substrate, the in-plane tensile strain induced by the MgO substrate enlarges the unit cell of PST and enhances the magnitude of dipole moments, which increases the dielectric constant. These results indicate that a reasonable in-plane tensile strain could improve the dielectric properties of PST thin films.     

低温水热合成钛酸钡纳米管阵列薄膜及性能研究

以二氧化钛纳米管阵列为模版,用水热法合成了钛酸钡纳米管阵列薄膜.讨论了水热温度、水热时间、碱的浓度对其生长形貌的影响.用X射线衍射仪、扫描电子显微镜表征了其晶体结构及微观形貌;用热重-差示扫描量热仪测定了材料的热学性能;用宽频介电阻抗谱仪测试了样品的介电性能.结果表明,在低至100℃水热温度下反应6h即可制得单一相的钛...     

The properties of Ba0.5Sr0.5TiO3 thin film prepared by RF magnetron sputtering from powder target

The Ba_0.5Sr_0.5TiO₃ (BST) thin film with the thickness of 400 nm deposited from powder target is prepared by the radio-frequency magnetron sputtering technique. The deposition rate of BST film is estimated to be 45 nm/min, which is very fast for ferroelectric materials. The dielectric properties of the as-prepared BST thin film are demonstrated. High dielectric tunability up to 42.7% and low dielectric loss small to 0.01 are achieved at a low applied voltage of 5 V. The results demonstrate that the RF magnetron sputtering from powder target is a versatile, novel technique for the deposition of high-quality ferroelectric thin films.     

Hydrothermal synthesis of β-nickel hydroxide nanocrystalline thin film and growth of oriented carbon nanofibers

Novel well-crystallized β-nickel hydroxide nanocrystalline thin films were successfully synthesized at low temperature on the quartz substrates by hydrothermal method, and the oriented carbon nanofibers (CNFs) were prepared by acetylene cracking at 750 °C on thin film as the catalyst precursor. High resolution transmission electron microscopy (HR-TEM) measurement shows that thin films were constructed mainly with hexagonal β-nickel hydroxide nanosheets. The average diameter of the nanosheets was about 80 nm and thickness about 15 nm. Hydrothermal temperature played an important role in the film growth process, influencing the morphologies and catalytic activity of the Ni catalysts. Ni thin films with high catalytic activity were obtained by reduction of these Ni(OH)₂ nanocrystalline thin films synthesized at 170 °C for 2 h in hydrothermal condition. The highest carbon yield was 1182%, and was significantly higher than the value of the catalyst precursor which was previously reported as the carbon yield (398%) for Ni catalysts. The morphology and growth mechanism of oriented CNFs were also studied finally.     

Pechinin synthesis and luminescence properties of Y3Ga5O12(YGG):Tb thin film

YGG:Tb thin films were successfully prepared by Pechni sol-gel process. The structure, surface morphology, evolution of film crystallization and their luminescent properties were investigated. We find the annealing process is very important to the YGG:Tb film crystallization. Uniform crack-free films can be obtained by conventional annealing for 1 h after rapid thermal treating for 10 min at 800 °C. The excitation and emission spectra of photoluminescence (PL) were used to characterize the luminescent properties. The excitation spectrum of YGG:Tb is dominated by the 4f-4f5d transition of Tb³⁺at 260 nm. The emission peaks of phosphor thin film lie at 488 and 543 nm. It can be used as a promising phosphor material for FED or ELD application.     

不同阳极氧化条件下TiO_2纳米管阵列的制备及表征

分别在三种不同的电解液中,以钛为基体采用阳极氧化的方法制备了TiO2纳米管阵列薄膜,用SEM观察纳米管阵列薄膜的形貌、测量纳米管管径大小;用XRD、拉曼光谱检测TiO2纳米管阵列薄膜热处理前后的晶型.结果表明:不同的电解液体系和氧化电压下得到的纳米管形貌各不相同.在0.24wt%HF水溶液中得到的TiO2纳米管排列整齐,管径为110nm;在0.5wt%NaF+2.7wt%Na2SO4水溶液和0.88wt%NH4F的丙三醇-水(体积比1:1)混合溶液中得到的纳米管排列不规整,管径为100nm;在0.24wt%HF条件下生成的TiO2纳米管管径与氧化电压成线性关系:d=k×U+b,其中,系数k=5.2nm/V,b=2.2nm,0≤U≤25V.经450℃热处理2h后TiO2纳米管结构由无定形态转变为锐钛矿.     

Structural, dielectric and optical properties of Ba(Ti, Zr)O3 thin films prepared by chemical solution deposition

Ba(Ti_0.95Zr_0.05)O₃ (BTZ) thin films grown on Pt/Ti/SiO₂/Si(100) substrates were prepared by chemical solution deposition. The structure and surface morphology of BTZ thin films has been studied by X-ray diffraction (XRD) and scanning electron microscope (SEM). At 100 kHz, the dielectric constant and dissipation factor of the BTZ film are 121 and 0.016, respectively. The ellipsometric spectrum of the BTZ thin film annealed at 730 °C was measured in the range of wavelength from 355 to 1700 nm. Assuming a five-layer model (air/surface roughness layer/BTZ/interface layer/Pt) for the BTZ thin films on platinized silicon substrates, the optical constant spectra (refractive index n and the extinction coefficient k) of the BTZ thin films were obtained.     

Progress of (Sr,Ba) TiO<Subscript>3</Subscript> ferroelectric thin film and tunability

The fabrication method, technology route and structure performances of (Sr, Ba) TiO₃ (SBT) ferroelectric thin film have been summarized in this paper. The tunability of dielectric constant, dielectric loss and leakage current are the basic parameters of tunable microwave devices. The thin films of SBT with high properties could be fabricated by means of RF magnetron sputtering and sol- gel processing. The electrical performances of thin film material can be improved largely by dopants. Some problems are put forward to pay attention to this material research process.