非平衡磁控溅射La-Ti/WS2 自润滑薄膜的摩擦磨损行为

要满足航天器机械转动部件在恶劣工况下的工作,需研制高硬度、低摩擦系数的固体润滑薄膜。采用非平衡磁控溅射法分别制备了纯WS₂薄膜、Ti掺杂WS₂复合薄膜和La-Ti掺杂WS₂复合薄膜。分析了薄膜的微观形貌、成分、硬度和摩擦学性能。结果表明,与纯WS₂薄膜和Ti/WS₂复合薄膜相比,La-Ti/WS₂复合薄膜的微观结构更加致密。La-Ti/WS₂复合薄膜的硬度H和弹性模量E也显著提高。此外,La-Ti/WS₂复合薄膜的摩擦系数减小,并且H/E比值增大,La-Ti/WS₂复合薄膜的磨损率降低。结果表明,La的掺杂有助于在摩擦接触表面形成稳定的转移膜,提高La-Ti/WS₂复合薄膜的耐磨性和承载能力。     

不同调制周期WS_x/a-C多层膜的组织结构及摩擦学特性

采用磁控溅射法交替溅射WS2和石墨靶制备周期为4~23 nm的WSx/a-C纳米多层膜。采用扫描电镜(SEM)、能谱仪(EDS)、X射线衍射仪(XRD)和X射线光电子谱(XPS)等分析薄膜的组织结构和元素的化学价态;采用纳米压痕仪、涂层附着力划痕仪和球盘式摩擦磨损试验机测试薄膜的硬度、结合力和在潮湿大气下(相对湿度70%)的摩擦磨损特性。结果表明:多层膜结构致密,表面平整。a-C的加入改变WS2的结晶状态,多层膜为微晶或非晶结构;随着调制周期的增大,多层膜的硫与钨摩尔比逐渐降低并趋于稳定(约为1.32),其硬度稍有上升,而结合力明显降低,摩擦因数由0.32降至0.26,而磨损率逐渐上升但显著低于纯WSx膜的。调制周期为4 nm的多层膜的耐磨性能最佳,磨损率约为1.03×10-13 m3·N-1·m-1。     

GLC/成分梯度CNx多层膜的微观结构和摩擦学性能

类金刚石碳膜通常内应力大、结合力低,而多层膜结构可提高结合力。 采用磁控溅射技术在 Si 基体上沉积不同 CNx 层厚度的 GLC/ 成分梯度 CNx 纳米多层膜。 通过扫描电子显微镜(SEM)、X 射线衍射仪(XRD)、X 射线光电子能谱(XPS)、Raman 光谱仪、球盘式摩擦仪、纳米压痕仪等对多层膜的表面形貌、微观结构、力学以及摩擦性能进行分析。 结果表明:多层膜表面平整光滑,CNx 层厚度为 50 nm 的多层膜有明显的层状结构。 多层膜中存在石墨相而 CNx 以微晶或非晶存在。 薄膜的 sp3 键含量、结合力、硬度等均随 CNx 层厚度的增加先增加后减小。 CNx 层厚度对多层膜的大气环境摩擦因数影响很小,但显著降低其真空环境摩擦因数。 多层膜的硬度为( 15 ~ 17. 6) GPa,大气中的磨损率为 (1. 03~ 2. 33)×10^-16 m³N^-1m^-1 ,真空中为(2. 06~ 3. 34)×10^-16 m³N^-1m^-1 。 CNx 层厚度为 20 nm 的多层膜综合性能最佳。     

清净剂、分散剂与ZDDP复配对a-C薄膜摩擦学性能的影响*

固-液复合润滑系统是获得高燃油经济性和高耐用性发动机系统的关键技术。极压抗磨剂二烷基二硫代磷酸锌（Zinc dialkyldithiophosphate, ZDDP）、清净剂高碱基磺酸钙（Over-base calcium sulfonate, OBCaSu）与分散剂聚异丁烯丁二酰亚胺 （Polyisobutylene succinimide, PIBSI）作为配方润滑油中使用最广泛的三种润滑油添加剂，与常用发动机表面强化薄膜类金刚石（Diamond-like carbon, DLC）薄膜复配下摩擦学性能的相关研究仍较少。利用非平衡磁控溅射方法制备 a-C 薄膜，通过 CSM 摩擦磨损试验机评价 ZDDP 与 OBCaSu（ZDDP+OBCaSu）、ZDDP 与 PIBSI（ZDDP+PIBSI）复配条件下 a-C 薄膜的摩擦学性能，并利用拉曼光谱、SEM 和 EDS 能谱等手段分析摩擦化学反应，探究摩擦机理。结果表明，ZDDP、ZDDP+OBCaSu 和 ZDDP+PIBSI 润滑三种润滑条件下，GCr15 钢和 a-C 薄膜磨损表面形成含磷酸盐的摩擦反应膜，两者摩擦学性能随润滑剂的变化规律相似。ZDDP+OBCaSu 复配润滑下，磨损表面形成的 Ca₃(PO₄)₂ 和 Zn₃(PO₄)₂ 复合摩擦反应膜可以提高 GCr15 钢和 a-C 薄膜的抗磨损性能。ZDDP+PIBSI 复配润滑下，GCr15 钢和 a-C 薄膜摩擦学性能下降。通过对比研究传统润滑油添加剂在 GCr15 钢和 a-C 薄膜表面的摩擦学行为和摩擦化学反应机理，为 a-C 薄膜在发动机系统中应用以及研发适配 a-C 薄膜的润滑油配方提供数据支持和理论指导。     

溅射能量对WC/a-C:H薄膜结构与性能的影响

为探究溅射能量对WC/a-C:H薄膜结构与性能的影响,并讨论WC掺杂对a-C:H薄膜的影响。通过非平衡磁控溅射+等离子体增强化学气相沉积法(UBMS+PACVD),以WC靶作为溅射靶,C_2H_2为反应气体,通过调制溅射靶电流,在316不锈钢基体上制备WC/a-C:H系列薄膜。用场发射电镜、透射电镜、X射线衍射仪、XPS、拉曼光谱等对薄膜的微观结构和成分进行表征,用划痕仪、纳米硬度仪测试了薄膜的力学性能,用多功能摩擦机对薄膜的摩擦学性能进行分析。结果表明:WC主要以β-WC_(1-x)纳米晶的形式均匀分布在非晶碳中,随着溅射靶电流的上升,薄膜中W含量和膜基结合力呈上升趋势,在11A时上升至21.9%(摩尔分数)和18.6 N,而I_D/I_G比值和硬度逐渐降低至0.55和11 GPa。溅射靶电流为4 A时,WC/a-C:H薄膜表现出较好的磨损性能,摩擦因数低至0.15,磨损率为5.38×10~(-7) mm~3/(N?m)。     

聚酰亚胺基自润滑材料与WS2-Ag固体润滑膜的相容性

为研究聚酰亚胺基新型润滑材料与钢表面固体润滑膜的相容性,采用离子束辅助沉积技术在 9Cr18 轴承钢材料上制备掺杂 Ag 的 WS₂ 固体润滑膜,并在摩擦磨损试验机(MS-T3000)上进行聚酰亚胺基自润滑保持架材料做成的球面销(简称:PI 基销)与 9Cr18 钢,以及 PI 基销与 WS2 -Ag 膜的摩擦试验。 通过场发射扫描电子显微镜(FESEM)、光学显微镜、激光共聚焦显微镜及红外光谱仪检测 WS₂ -Ag 固体润滑膜与 PI 基销的表面和磨痕形貌、成分和官能团。 结果显示:摩擦磨损后,WS₂ -Ag 膜与 PI 基材料均未发生化学反应,各自保持固有的润滑性能,并表现出了良好的相容性。     

磁控溅射W/DLC/W-S-C复合膜的制备及其性能（英文）

采用磁控溅射方法制备W/DLC/W-S-C复合膜,研究不同WSx含量对复合膜结构和结合强度的影响;采用球-盘式摩擦试验仪研究复合膜在大气环境以及氮气环境下的摩擦磨损性能。结果表明:复合膜结构致密,在非晶类金刚石基质中存在WSx和WCx化合物。合适的WSx含量有利于提高复合膜的膜/基结合强度。在大气环境下,随着C含量的增加复合膜的耐磨性能提高,其摩擦因数在0.15~0.25之间;在氮气环境下,随着WSx含量的增加复合膜的耐磨性能提高,其摩擦因数在0.03~0.10之间。     

Al2O3/Ti2AlN复合材料在900℃,1000℃和1100℃空气中的氧化行为

利用综合热分析仪、背散射扫描电镜(BSE)和能谱分析(EDS)对Al₂O₃/Ti₂AlN复合材料在900 ℃,1 000 ℃和1 100 ℃/20 h空气中连续氧化20h后的氧化增重及氧化层截面进行了研究。结果表明：Al₂O₃/Ti₂AlN复合材料在空气中的氧化行为符合抛物线规律,在900 ℃,1 000 ℃和1 100 ℃/20 h氧化增重分别为2.78×10_-2 kg/m₂、10.4 ×10_-2 kg/m₂、21.9 ×10_-2 kg/m₂,抛物线速率常数相应为1.08×10_-8 kg₂/m₄s、1.44×10_-7 kg₂/m₄s、6.56×10_-7 kg₂/m₄s,氧化激活能为274 kJ/mol。氧化层主要由TiO₂和Al₂O₃组成的,连续的Al₂O₃次外层可以提高其抗氧化性能。氧化层结构的改变是由于氧化温度对Ti₄₊、Al₃₊由基体表面向外扩散和O_2-向内扩散的影响,以及TiO₂和Al₂O₃在不同温度下的形核生长速率导致的。对Al₂O₃/Ti₂AlN而言,控制材料与氧化气氛的界面是提高该材料抗氧化性能的关键。     

碳黑含量对放电等离子烧结Fe-Cr-C/TiCN复合材料组织和耐磨性的影响

采用机械合金化和放电等离子烧结法制备了不同碳含量的Fe-Cr-C/TiCN复合材料。通过扫描电镜、X射线衍射、维氏硬度和球-盘式摩擦试验,系统地研究了碳含量对Fe-Cr-C/TiCN复合材料组织和磨损性能的影响。结果表明,在含碳量为1.0%~5.0%（质量分数,下同）的烧结样品中形成了(Cr, Fe)₇C₃碳化物,而当碳含量达到4.0%~5.0%时,出现了(Cr, Fe)₃C相。碳含量对Fe-Cr-C/TiCN复合材料的组织均匀性和致密化有着较为重要的影响,当烧结温度为~1000 ℃时,致密度由未加碳时的95.0%提高到的99.7%（含碳量为3.0%）,说明已实现了完全致密化。当含碳量为3.0%时,维氏硬度达到11 940 MPa。此外,添加适量的碳（3.0%）有助于获得良好的磨损性能,即摩擦系数波动范围小,平均摩擦系数为0.320,磨损率为6.8×10^-4 mm³·N^-1·m^-1。     

煤油流量对NiCrBSi-CrSi2涂层微观结构及高温磨损性能的影响

在12CrMoVG基体上通过超音速火焰喷涂(HVOF)技术,分别采用不同煤油流量制备了NiCrBSi-CrSi₂复合涂层。利用 XRD、SEM、EDS、Raman、维氏显微硬度计、电子拉伸试验机和高温旋转式摩擦磨损试验机分别表征了不同煤油流量下涂层物相、组织结构、力学性能和高温摩擦磨损性能。结果表明: 不同煤油流量涂层的物相组成基本相同,均有γ-Ni、Ni₃B、Cr₂B、CrSi₂和Cr₅Si₃,但随着煤油流量升高,涂层中的CrSi₂和Cr₂B的部分会分别转变为Cr₅Si₃和CrB相。涂层显微硬度和结合强度随着煤油流量的升高均呈现先增后减的趋势,孔隙率和磨损率表现出先减后增的趋势。当煤油流量为30 L/h时,粉末熔融效果最好,涂层的孔隙率最低为0.17 %,显微硬度较高达到569 HV_0.3,结合强度较高为59 MPa,磨损率最低为2.84×10_-14 m₃^/(N.m)。磨痕表面产生的 Cr₂O₃、SiO₂和NiCr₂O₄等氧化物以及较高的涂层硬度使得30 L/h的涂层显示出最优的耐高温摩擦磨损性能。涂层的磨损机制以氧化磨损和黏着磨损为主。     

溅射功率对La-Ti/WS2 复合薄膜高温摩擦学行为的影响

高温条件下WS₂易于氧化生成WO3,导致WS₂固体润滑薄膜的摩擦学性能受到较大影响。为改善WS₂固体润滑薄膜在高温条件下的摩擦学性能,采用非平衡磁控溅射技术制备了共掺杂La-Ti/WS₂复合薄膜,研究了靶功率对磁控溅射La-Ti/WS₂复合薄膜结构和高温摩擦学性能的影响。利用扫描电镜(SEM)、X射线衍射仪(XRD)、纳米压痕仪和X射线光电子能谱仪(XPS)分析了薄膜微观形貌、成分、力学性能、微观结构。利用高温摩擦磨损试验机研究了复合薄膜的高温摩擦学性能。结果表明,高温环境下,靶功率为20W时La-Ti/WS₂复合薄膜表现出优异的摩擦学性能。此时,复合薄膜H/E值最大,摩擦系数最小,平均为0.012,磨损率最低为1.56×10^-8mm³/N·m,这主要归因于高温下摩擦界面产生的稀土氧化物,促使La-Ti/WS₂复合薄膜的摩擦磨损机制发生了改变,使得WS₂在高温受破坏的情...     

Structural, mechanical and tribological properties of Mo-S-C solid lubricant coating

Mo-S-C self-lubricating coatings were deposited by d.c. magnetron sputtering from carbon and molybdenum disulphide targets. The power ratio of the targets was varied in order to prepare films with carbon content in the range 0-55 at.%. Whatever the carbon content, the S/Mo ratio was higher than 1.25. The hardness of the films increased almost linearly with the carbon content. X-ray photoelectron spectroscopy showed evidence of Mo-C bonds; nevertheless, the size of molybdenum carbide grains was expected to be very small, since X-ray diffraction did not reveal any peaks related to any Mo-C phase. The coatings tested by pin-on-disc exhibited low friction, decreasing with increasing carbon content, when humid air was present. In nitrogen, the friction of all films was lower than 0.02 except for the reference MoS₂ (0.04). Mo-S-C outperformed the wear resistance of MoS₂; on the other hand, the results were in some cases hindered by the low adhesion of the coatings. The films were very sensitive to air exposure leading to surface oxidation.     

Fabrication, microstructure and tribological behavior of pulsed laser deposited a-CNx/TiN multilayer films

a-CN_x/TiN multilayer films were deposited onto high-speed steel substrates by pulsed laser ablation of graphite and Ti target alternately in nitrogen gas. The composition, morphology and microstructure of the films were characterized by energy dispersive X-ray spectroscopy (EDS), scanning electron microscopy (SEM), X-ray diffraction (XRD) and Raman spectroscopy. The tribological properties of the films in humid air were investigated using a ball-on-disk tribometer. The multilayer films consist of crystalline TiN, metallic Ti and amorphous CN_x (a-CN_x). With an increase in thickness ratio of CN_x to bilayer, the hardness of multilayer film decreases, friction coefficient decreases from 0.26 to 0.135, and wear rate increases. The film with thickness ratio of CN_x to bilayer of 0.47 exhibits a maximum hardness of 30 GPa and excellent wear rate of 2.5 × 10^− 7 mm³ N^− 1 m^− 1. The formation of tribo-layer was observed at contact area of Si₃N₄ ball. The film undergoes the combined wear mechanism of abrasion wear and adhesion wear.     

Study on nanocrystalline Cr2O3 films deposited by arc ion plating: II. Mechanical and tribological properties

In this work, the influence of substrate bias voltage on the microhardness, adhesive strength, friction coefficient, and wear rate of AIP Cr₂O₃ films deposited on AISI 304 stainless steel substrates was investigated systematically. In the meantime, the wear failure mechanism of AIP Cr₂O₃ films in dry sliding contact was also analyzed and discussed. The results showed that the mechanical properties, adhesive behaviors, and tribological performance of AIP Cr₂O₃ films were greatly altered by applying a negative bias voltage. With increasing the bias voltage, the hardness, critical load, and tribological performance of AIP Cr₂O₃ films first were improved gradually, and then were impaired slightly again. When the bias voltage is − 100 V, the Cr₂O₃ film possessed the highest hardness, the strongest adhesion, and the best wear resistance. The essence of above phenomena was attributed to the variations of microstructure and defect density in the films induced by the substrate bias voltage increase. The main wear failure mechanism of AIP Cr₂O₃ films is crack initiation and propagation under the high contact stresses, inducing the local film with small area to flake off gradually, and eventually leading to the formation of a wear scar.     

Influence of deposition conditions on mechanical and tribological properties of nanostructured TiN/CNx multilayer films

Nanostructured TiN/CN_x multilayer films were deposited onto Si (100) wafers and M42 high-speed-steel substrates using closed-filed unbalanced magnetron sputtering in which the deposition process was controlled by a closed loop optical emission monitor (OEM) to regulate the flow of N₂ gas. Multilayers with different carbon nitride (CN_x) layer thickness could be attained by varying the C target current (0.5 A to 2.0 A) during the deposition. It was found that the different bilayer thickness periods (i.e. the TiN layer thickness Λ_TiN was fixed at 3.0 nm while the CN_x layer thickness Λ_CNx was varied from 0.3 to 1.2 nm) significantly affected the mechanical and tribological properties of TiN/CN_x multilayer films. These multilayer films were characterized and analyzed by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), atomic force microscopy (AFM), Rockwell-C adhesion test, scratch test, pin-on-disc tribometer, and nanoindentation measurements. XPS analyses revealed that the chemical states, such as TiN, TiC, TiN_xO_y and TiO_2, existed in a TiN layer. Nanoindentation results showed that the hardness was highly dependent on the bilayer thickness. A maximum hardness of ~ 41.0 GPa was observed in a multilayer film at bilayer thickness Λ_TiN = 3.0 nm and Λ_CNx = 0.9 nm. All multilayer films exhibited extreme elasticity with elastic recoveries as high as 80% at 5 mN maximum load. The compressive stresses in the films (in a range of 1.5-3.0 GPa) were strongly related to their microstructure, which depended mainly on the incorporation of nitrogen in the films. By scratch and Rockwell-C adhesion tests, the multilayer films with smaller bilayer thicknesses (Λ_TiN = 3.0 nm, Λ_CNx = 0.3 and 0.6 nm) exhibited the best adhesion and cohesive strength. The critical load value obtained was as high as ~ 78 N for the films with Λ_TiN = 3.0 nm, Λ_CNx = 0.9 nm. The friction coefficient value for a multilayer at Λ_TiN = 3.0 nm and Λ_CNx = 0.9 nm was found to be low 0.11. These adhesive properties and wear performance are also discussed on the basis of microstructure, mechanical properties and tribochemical wear mechanisms.     

MoS2-Zr复合薄膜的摩擦学性能研究

目的改善MoS_2薄膜的疏松结构,提高其硬度及摩擦磨损性能。方法采用离子源辅助磁控溅射技术在GCr15基体上沉积不同Zr含量的MoS_2-Zr复合薄膜,通过SEM分析薄膜的表面及截面形貌。采用EDS检测薄膜的成分,采用显微维氏硬度计测试薄膜的硬度,采用Rockwell-C硬度计进行压痕测试实验,采用球-盘式旋转摩擦磨损试验机评价薄膜的摩擦磨损性能。结果 MoS_2-Zr复合薄膜的致密程度和硬度随着Zr含量的增加而增大,其硬度值为300~500HV。复合薄膜与基体的结合力随着Zr含量的增加而增强,但当Zr含量过高时,结合力下降。含Zr原子数分数为15%的MoS_2-Zr复合薄膜具有最好的摩擦学性能,其平均摩擦系数为0.09,磨损率为9.33×10~7 mm~3·N~(–1)·m~(–1),耐磨寿命达5.25×105 r。结论 Zr的掺杂改善了纯MoS_2薄膜的疏松结构,提高了MoS_2薄膜的硬度和结合力,合适的Zr掺杂可以获得较低的摩擦系数和较长的耐磨寿命。     

CNx层厚度对DLC/CNx多层膜结构和力学性能的影响

为了降低DLC膜的内应力,提高其力学性能,采用磁控溅射法在Si(100)基体上交替沉积了不同CN_x层厚度的DLC/CN_x纳米多层膜。利用X射线衍射仪(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)、拉曼光谱(Raman)、纳米压痕仪、涂层附着力划痕仪和球盘式摩擦磨损试验机等分析了多层膜的微观组织、成键结构、力学和摩擦学性能。结果表明:所有DLC/CN_x多层膜均为非晶结构,结构致密,内应力低(约-475~-170 MPa),强化效应显著。随着CN_x层厚度的增大,CN_x膜内sp3键含量降低,DLC/CN_x多层膜的硬度和结合力逐渐降低,磨损率则逐渐上升。多层膜在真空和大气中的摩擦状态平稳,摩擦因数分别为0.16和0.2,CN_x层厚度的影响很小。CN_x层厚度为0.5 nm的多层膜的硬度可达36.9 GPa,结合力为27 N,在两种测试环境中均具有优异的摩擦学性能。