ZnO掺杂纳米CeO2的共沸蒸馏法合成

采用化学共沉淀法结合正丁醇共沸蒸馏处理前驱体合成了ZnO掺杂纳米CeO2颗粒,通过XRD,DSC/TG,IR,TEM,原子吸收光谱以及紫外透过率分析等方法对其结构和性能进行了表征;并根据XRD线宽法,由Scherrer公式计算其晶粒尺寸,研究了共沸蒸馏、ZnO掺杂、以及焙烧温度和时间对CeO2纳米晶粒尺寸的影响.结果表明:正丁醇共沸蒸馏法能有效脱除前驱体凝胶中的水分,防止干燥和焙烧过程中硬团聚的形成,从而得到粒径更小、分布更均匀、分散性更好的纳米CeO2颗粒;2 mol%～10 mol%掺杂ZnO能与纳米CeO2形成固溶体,且掺入量增加引起纳米CeO2晶粒有所增大;随焙烧温度提高,ZnO掺杂纳米CeO2晶粒显著长大,而高温下随焙烧时间延长,其晶格进一步趋于完整,晶粒尺寸增加;纳米CeO2具有良好的可见光透过和紫外光吸收能力,ZnO掺杂不会影响纳米CeO2的紫外遮蔽效果.     

ZnO掺杂纳米CeO2的共沸蒸馏法合成

采用化学共沉淀法结合正丁醇共沸蒸馏处理前驱体合成了ZnO掺杂纳米CeO2颗粒,通过XRD,DSC/TG,IR,TEM,原子吸收光谱以及紫外透过率分析等方法对其结构和性能进行了表征;并根据XRD线宽法,由Scherrer公式计算其晶粒尺寸,研究了共沸蒸馏、ZnO掺杂、以及焙烧温度和时间对CeO2纳米晶粒尺寸的影响.结果表明正丁醇共沸蒸馏法能有效脱除前驱体凝胶中的水分,防止干燥和焙烧过程中硬团聚的形成,从而得到粒径更小、分布更均匀、分散性更好的纳米CeO2颗粒;2 mol%～10 mol%掺杂ZnO能与纳米CeO2形成固溶体,且掺入量增加引起纳米CeO2晶粒有所增大;随焙烧温度提高,ZnO掺杂纳米CeO2晶粒显著长大,而高温下随焙烧时间延长,其晶格进一步趋于完整,晶粒尺寸增加;纳米CeO2具有良好的可见光透过和紫外光吸收能力,ZnO掺杂不会影响纳米CeO2的紫外遮蔽效果.     

ZnO掺杂对ZnSb相变薄膜结构和电学特性的影响

目的通过掺杂不同量的ZnO提升ZnSb相变薄膜的晶化温度和晶态膜电阻。方法采用磁控溅射双靶共溅方式制备不同含量ZnO掺杂的ZnSb薄膜,使用真空四探针设备原位测试薄膜电阻随温度的变化情况,用EDS、DSC、XRD、Raman、FESEM、UV-Vis分别对薄膜的成分、晶化温度和熔点、掺杂薄膜的结构、薄膜厚度、表面形貌以及光学带隙进行分析。结果 ZnO掺杂量为1.6%时,Zn O掺杂提升了薄膜的晶化温度和晶态薄膜的电阻,并抑制了ZnSb晶粒的长大。薄膜的晶化温度由253℃提升至263℃,光学带隙由0.37 eV提升至0.38 eV,掺杂薄膜晶粒大小为20 nm左右,远低于未掺杂的50 nm。掺杂薄膜内的O原子更易与Sb结合,过多的Zn O掺杂会使薄膜结晶后形成Sb_2O_3晶粒,使薄膜的晶化温度下降。结论低含量ZnO掺杂的ZnSb薄膜具有更高的晶化温度、更细小的ZnSb晶粒以及更高的膜电阻;过量的Zn O掺杂使薄膜在结晶后产生分离的Sb_2O_3相,恶化薄膜性能。     

稀土共掺杂对Li2O-Al2O3-SiO2系微晶玻璃晶化行为及发光性能的影响

采用熔融-晶化法在空气气氛下制备了CeO2、Sm2O3共掺杂的Li2O-Al2O3-SiO2系微晶玻璃,利用差热分析仪、紫外-可见分光光度计、X射线衍射仪、扫描电镜以及荧光分光光度计等,研究了共掺杂对微晶玻璃晶化行为及其发光性能的影响.结果表明:随着CeO2掺杂量增大,微晶玻璃结晶度明显提高,玻璃的晶化温度先下降后升高,而470 nm光激发下微晶玻璃发光强度先增大后降低,晶化温度达到最低时微晶玻璃的发光强度最高.稀土离子的聚集作用是影响微晶玻璃晶化行为和发光性能的关键因素.     

溶胶-凝胶法制备Y_2O_3掺杂ZnO压敏薄膜及其电性能(英文)

研究溶胶-凝胶法制备不同浓度Y2O3掺杂对ZnO-Bi2O3压敏薄膜微观结构和电性能的影响。研究结果表明:Y2O3掺杂ZnO薄膜在750°C空气气氛下退火1h,ZnO薄膜的特征峰与ZnO的六方纤锌矿结构相匹配;ZnO晶粒直径随着掺杂量的增加而减小,Y2O3稀土掺杂氧化锌晶粒细化;薄膜厚度均匀且每一层厚度约80nm。研究结果还表明:当Y3+掺杂浓度为0.2%(摩尔分数)时,ZnO薄膜的非线性伏安特性最好,其漏电流为0.46mA,电位梯度为110V/mm,非线性系数为3.1。     

溶胶-凝胶法制备Y2O3掺杂ZnO压敏薄膜及其电性能（英文）

研究溶胶-凝胶法制备不同浓度Y2O3掺杂对ZnO-Bi2O3压敏薄膜微观结构和电性能的影响。研究结果表明:Y2O3掺杂ZnO薄膜在750°C空气气氛下退火1h,ZnO薄膜的特征峰与ZnO的六方纤锌矿结构相匹配;ZnO晶粒直径随着掺杂量的增加而减小,Y2O3稀土掺杂氧化锌晶粒细化;薄膜厚度均匀且每一层厚度约80nm。研究结果还表明:当Y3+掺杂浓度为0.2%(摩尔分数)时,ZnO薄膜的非线性伏安特性最好,其漏电流为0.46mA,电位梯度为110V/mm,非线性系数为3.1。     

稀土掺杂对Li2O-Al2O3-SiO2微晶玻璃组织和光学性能的影响

通过熔融法制备了掺杂CeO2和Nd2O3的Li2O-Al2O3-SiO2（LAS）透明微晶玻璃,利用差热分析仪、X射线衍射仪、扫描电镜、紫外可见分光光度计等检测技术,研究稀土掺杂对Li2O-Al2O3-SiO2（LAS）玻璃析晶行为以及微晶玻璃的微观结构和光学性能的影响。稀土掺杂明显提高玻璃的析晶活化能和晶化温度,抑制了微晶玻璃由石英固溶体向锂辉石固溶体的转变,使LAS微晶玻璃的热稳定性增强。微晶玻璃晶化后紫外吸收边出现＂红移＂,掺杂稀土的微晶玻璃晶粒出现细化。稀土离子的能级跃迁,导致微晶玻璃的颜色发生变化,并在晶界光散射和晶格光吸收的共同作用下,使微晶玻璃的透过率降低。     

La_2O_3与Sb_2O_3掺杂钛酸锶钡陶瓷的介电性能及相变(英文)

采用固相法制备La2O3与Sb2O3掺杂的钛酸锶钡陶瓷,研究其介电性能及相变特性。通过X射线衍射法分析体系微观结构并利用扫描电镜观察其表面微观形貌。(La,Sb)共掺杂的钛酸锶钡陶瓷具有典型的钙钛矿结构,且随着Sb2O3掺杂量的增多其平均粒径显著减小。La3+离子以及Sb3+离子均占据钙钛矿晶格的A位。La2O3与Sb2O3添加量的改变显著影响钛酸锶钡基陶瓷的介电常数以及介电损耗。La2O3改性的钛酸锶钡陶瓷其四方?立方相变为二级相变,且居里温度随着La2O3掺杂量的增多向低温方向移动。(La,Sb)共掺杂的钛酸锶钡陶瓷则体现为弥散相变,随着Sb2O3含量的增大而偏离居里-外斯定律越显著。由于Sb3+离子对晶格原位离子的取代使得(La,Sb)共掺杂的钛酸锶钡陶瓷的介电常数最大值下的温度亦随着Sb2O3含量的增大而降低。     

La2O3与Sb2O3掺杂钛酸锶钡陶瓷的介电性能及相变（英文）

采用固相法制备La2O3与Sb2O3掺杂的钛酸锶钡陶瓷,研究其介电性能及相变特性。通过X射线衍射法分析体系微观结构并利用扫描电镜观察其表面微观形貌。(La,Sb)共掺杂的钛酸锶钡陶瓷具有典型的钙钛矿结构,且随着Sb2O3掺杂量的增多其平均粒径显著减小。La3+离子以及Sb3+离子均占据钙钛矿晶格的A位。La2O3与Sb2O3添加量的改变显著影响钛酸锶钡基陶瓷的介电常数以及介电损耗。La2O3改性的钛酸锶钡陶瓷其四方?立方相变为二级相变,且居里温度随着La2O3掺杂量的增多向低温方向移动。(La,Sb)共掺杂的钛酸锶钡陶瓷则体现为弥散相变,随着Sb2O3含量的增大而偏离居里-外斯定律越显著。由于Sb3+离子对晶格原位离子的取代使得(La,Sb)共掺杂的钛酸锶钡陶瓷的介电常数最大值下的温度亦随着Sb2O3含量的增大而降低。     

基片温度对Co掺杂ZnO薄膜室温铁磁性的影响

采用磁控共溅射法在Al2O3(0001)基片上沉积了Zn1-xCoxO(x=0.08～0.3%)薄膜,研究了基片温度对Co掺杂ZnO薄膜结构和磁性的影响.结果表明:Al2O3(001)基片很好地诱导了ZnCoO薄膜(002)取向生长,并且所有的薄膜均显示室温铁磁性.较低的基片温度不仅能有效抑制薄膜中Co2O3杂质相的产生,而且薄膜磁矩较大.紫外-可见光谱也表明,薄膜中Co2 取代了ZnO中Zn2 的位置.     

分子吸附和表面缺陷对 ZnO 薄膜紫外探测的影响

目的研究分子吸附在不同的ZnO表面时,体系的稳定性、电子结构、紫外光吸收情况。方法根据第一性原理密度泛函理论,首先对O2和H_2O分子分别吸附在完备的ZnO和具有氧空位的ZnO单层膜表面进行结构优化,然后分析不同体系的电子结构和光学性质。结果通过吸附能可知,分子吸附有利于系统稳定性的提高,其中氧分子吸附最为明显;能带和态密度图显示,分子吸附有利于电子在导带和价带之间的跃迁;差分电荷密度图表明,分子吸附的所有体系都存在电子转移,吸附分子和薄膜之间存在相互作用;光吸收图显示,分子吸附的ZnO体系光吸收明显增强。水分子吸附在含氧空位的ZnO单层膜上时,体系具有较强的紫外吸收、较高的载流子浓度、较小的载流子有效质量以及较好的稳定性,是比较理想的紫外探测材料。结论ZnO单层膜中氧空位和实验环境中的氧气和水汽均能影响体系的紫外响。研究结果可为ZnO基薄膜紫外探测器的发展提供参考。     

衬底与缓冲层的晶格失配对CeO_2缓冲层外延生长的影响

采用金属有机沉积(MOD)技术在La Al O3(LAO)、Y稳定的氧化锆(YSZ)和Ni-W衬底上沉积了Ce O2缓冲层薄膜,并研究了衬底与缓冲层的晶格失配对其外延生长的影响。结果表明,随着衬底和缓冲层薄膜之间晶格失配的增大,缓冲层薄膜内部的压应变增加,晶界浓度增加,晶粒生长速率减小。衬底和缓冲层薄膜之间的晶格失配越小,越有利于薄膜织构度的增大。Ce O2薄膜的表面形貌及粗糙度的演化对衬底和缓冲层薄膜之间的晶格失配并没有明确的依赖关系。     

A comparison of transmittance properties between ZnO∶Al films for transparent conductors for solar cells deposited by sputtering of AZO and cosputtering of AZO/ZnO

Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire (002) andglass substrates by two different sputtering techniques radio frequency magnetron cosputtering of AZO and ZnO targets and sputtering of an AZO target. The dependence of the photoluminescence (PL) and transmittance properties of the AZO films deposited by cosputtering and sputtering on the AZO/ZnO target power ratio, R and the O2/Ar flow ratio, r were investigated, respectively. Only a deep level emission peak appears in the PL spectra of cosputtered AZO films whereas both UV emission and deep level emission peaks are observed in the PL spectra of sputtered AZO films. The absorption edges in the transmittance spectra of the AZO films shift to the lower wavelength region as R and r increase. Effects ofcrystallinity, surface roughness, PL on the transmittance of the AZO films werealso explained using the X-ray diffraction (XRD), atomic force microscopy (AFM), and PL analysis results.     

Synthesis of GaN nanorods on Si substrates with assistance of the volatilization of ZnO middle layers

GaN nanorods have successfully been synthesized on Si(111) substrates via ammoniating ZnO/Ga2O3 films at 950℃. Ga2O3 thin films and ZnO middle layers were deposited in turn on Si(111) substrates by r.f. magnetron sputtering system. ZnO volatilized at 950℃ in the ammonia ambience and Ga2O3 reacted to NH3 to fabricate GaN nanorods in the later ammoniating process. The volatilization of ZnO layers played an important role in the fabrication. The structure and composition of the GaN nanorods were studied by X-ray diffraction (XRD) and Fourier transform infrared spectrophotometer (FTIR). The orphology ofGaN nanorods was investigated using scanning electron microscopy (SEM) and transmission electronic microscope (TEM). The analyses of measured results revealed that GaN nanorods with hexagonal wurtzite stxucture were prepared by this method.     

Morphology and optical properties of Co doped ZnO textured thin films

Depending on the ZnO seed-layers, a new kind of cobalt doped zinc oxide (Zn_1−xCo_xO) thin films with controllable morphology were prepared by a facile solvothermal method. A series of ZnO thin films with different Co contents were applied to study the effect of doped Co on morphology, structural and optical properties. It is found that the doped content plays an important role on morphology evolution of Zn_1−xCo_xO films. The results of scanning electron microscope (SEM) indicate that the Zn_1−xCo_xO films are highly uniform and porous. Co has been successfully doped into the ZnO lattice structure and revealed by X-ray diffraction (XRD) and energy dispersive spectrum (EDS). It can be found that Zn_1−xCo_xO thin films possess good crystalline quality through the characterization of transmission electron microscope (TEM) and high-resolution transmission electron microscopy (HRTEM). All of the samples show a stronger violet emission and ultraviolet absorption, and the violet emission peaks shift towards red with increasing of Co content. In addition, the magnetic result demonstrates that the prepared Co-doped ZnO thin films are room-temperature ferromagnetic materials.     

离子束辅助沉积法制备重掺N氧化铈提高其可见光吸收性能

氧化铈是一种潜在的可见光催化材料,但是如何实现在氧化铈晶格内的N掺杂是阻碍其发展的主要原因。本研究中,我们采用离子束辅助沉积法制备了N掺杂的氧化铈薄膜材料,采用该方法实现了对氧化铈薄膜的高含量N掺杂,N含量可高达25%,远远高于采用传统方法制备的氮掺杂氧化铈。N 1s的高分辨谱显示,掺杂的N替代了氧化铈中的O而实现了N在氧化铈晶格中的掺杂。XRD结果显示,氧化铈薄膜在生长过程中,N离子的轰击并没有改变氧化铈的晶体结果,但是改变了氧化铈薄膜表面形貌,从SEM结果上可以看出氧化铈表面颗粒变得细小,薄膜表面变得光滑。紫外可见吸收光谱结果显示,随着掺N量的增加,氧化铈的光吸收发生红移。     

Structural and optical properties of electrodeposited ZnO thin films on conductive RuO2 oxides

ZnO thin films were grown on the 150 nm-thick RuO₂-coated SiO₂/Si substrates by electrochemical deposition in zinc nitrate aqueous solution with various electrolyte concentrations and deposition currents. Crystal orientation and surface structure of the electrodeposited ZnO thin films were characterized by X-ray diffraction (XRD) and scanning electron microscopy, respectively. The XRD results show the as-electrodeposited ZnO thin films on the RuO₂/SiO₂/Si substrates have mixed crystallographic orientations. The higher electrolyte concentration results in the ZnO thin films with a higher degree of c-axis orientation. Moreover, the use of an ultra-thin 5 nm-thick ZnO buffer layer on the RuO₂/SiO₂/Si substrate markedly improves the degree of preferential c-axis orientation of the electrodeposited ZnO crystalline. The subsequent annealing in vacuum at a low temperature of 300 °C reduces the possible hydrate species in the electrodeposited films. The electrodeposited ZnO thin films on the 5 nm-thick ZnO buffered RuO₂/SiO₂/Si substrates grown in 0.02 M electrolyte at −1.5 mA with a subsequent annealing in vacuum at 300 °C had the best structural and optical properties. The UV to visible emission intensity ratio of the film can reach 7.62.     

Comparison of photocatalytic activity of TiO2 film doped nonuniformly by Mn and Zn

1INTRODUCTIONHeterogeneous photocatalysis attracts muchattention as a friendly environment technique valu-able for water and air purification.However,thereare some problems in application,and one of thekey problems is the low photon-quantum efficien-cy.From1990s,the modification of Ti O2by metalions has become a hot topic,andthe effect of metal(such as Cu,Fe,Ag,Au,Pt,W,V,Pb,Cr,Rh,Co and Ni)ions doping on photocatalytic ac-tivity of Ti O2has been studied widely[14].Howev-er,there wer…     

Surface morphology and photoluminescence properties of ZnO thin films obtained by PLD

ZnO thin films on Si(111) substrate were deposited by laser ablation of Zn target in oxygen reactive atmosphere, Nd-YAG laser with wavelength of 1 064 nm was used as laser source. XRD and FESEM microscopy were applied to characterize the structure and surface morphology of the deposited ZnO films. The optical properties of the ZnO thin films were characterized by photoluminescence. The UV and deep level (yellow-green) light were observed from the films. The UV light is the intrinsic property and deep level light is attributed to the existence of antisite defects (Ozn). The intensity of UV and deep level light depends strongly on the surface morphology and is explained by the surface roughness of ZnO film. A strongly UV emission can be obtained from ZnO film with surface roughness in nanometer range.