The dielectric,thermal properties and crystallization mechanism of Li–Al – B–Si – O glass – Ceramic systems as a new ULTCC material

Li–Al–B–Si–O (LABS) glass-ceramics with a sintering temperature of 600 °C were studied for ultra-low temperature co-fired ceramics (ULTCC) applications. The crystal phase of LABS glass-ceramics is dendritic β-spodumene. The permittivity and dielectric loss of LABS glass-ceramics are ε_r = 5.8 and tgδ = 1.3 × 10⁻³ at 10 MHz, respectively. The coefficient of thermal expansion (CTE) of LABS glass-ceramics is 3.23 ppm/°C, which is close to that of silicon. The dielectric and thermal properties of LABS glass-ceramics are closely correlated to the degree of its crystallization. The permittivity decreases continually while the dielectric loss decreases first and slightly increases with the increasing of crystallization of β-spodumene. The CTE of LABS glass-ceramics decreases as β-spodumene crystallized from LABS glass. The crystallization kinetic and mechanism of LABS glass-ceramics indicate that the β-spodumene crystallizes in a two-dimensional interfacial growth mechanism due to the migration of Li-ions. The diffusion coefficients derived from energy-dispersive X-ray spectroscopy (EDS) results indicated that both Al and Ag electrodes have good compatibilities with ULTCC tapes, which could reduce the cost of multilayer electro-ceramic devices dramatically by using the ULTCC and base metallization.     

单相硼化物的制备及摩擦磨损性能研究

为了深入研究渗硼层中硼化物的性能，采用真空感应熔炼法制备单相硼化物材料。观察分析制备的硼化物微观组织，测试其力学性能。采用MMU-5G型销-盘式摩擦磨损试验机，在干摩擦条件下，研究了不同载荷下单相硼化物的摩擦学性能，观察其磨损表面形貌特征，探讨其磨损方式。结果表明：制备的硼化物为单一相，试样纯度高，试样的平均显微硬度为HV2065，平均断裂韧性值为1.68 MPa·m1/2；硼化物的断口处没有宏观的塑性变形，断口齐平光亮，表现为脆性断裂特征；干摩擦条件下随着载荷从10 N增加到30 N，硼化物的摩擦因数先降低后增加，20 N载荷时达到最小值，而其磨损量随着载荷的增加不断上升；随着载荷从10 N增加到30 N，磨损表面的粗糙度先逐渐上升后急剧上升； 10~20 N载荷下，硼化物的磨损以磨粒磨损为主，而25~30 N载荷下，硼化物的主要磨损方式从磨粒磨损转变为脆性破损。     

Metalorganic chemical vapor deposition of silver thin films for future interconnects by direct liquid injection system

Deposition of Ag films by direct liquid injection-metal organic chemical vapor deposition (DLI-MOCVD) was chosen because this preparation method allows precise control of precursor flow and prevents early decomposition of the precursor as compared to the bubbler-delivery. Silver(I)-2,2-dimethyl-6,6,7,7,8,8,8-heptafluoro-3,5-octanedionato-triethylphosphine [Ag(fod)(PEt₃)] as the precursor for Ag CVD was studied, which is liquid at 30 °C. Ag films were grown on different substrates of SiO₂/Si and TiN/Si. Argon and nitrogen/hydrogen carrier gas was used in a cold wall reactor at a pressure of 50–500 Pa with deposition temperature ranging between 220 °C and 350 °C. Ag films deposited on a TiN/Si diffusion barrier layer have favorable properties over films deposited on SiO₂/Si substrate. At lower temperature (220 °C), film growth is essentially reaction-limited on SiO₂ substrate. Significant dependence of the surface morphology on the deposition conditions exists in our experiments. According to XPS analysis pure Ag films are deposited by DLI-MOCVD at 250 °C by using argon as carrier gas.     

超临界流体萃取技术生产重交通道路沥青的研究

研究了采用超临界流体萃取技术(SFEF),以减压渣油和催化裂化油浆为原料,制备重交通道路沥青产品的可行性.结果表明:当原料中油浆掺入量为10%～30%时,可以生产出牌号为AH70,AH90,AH110的重交通道路沥青产品.工业试验表明,生产牌号为AH70,AH90的重交通道路沥青,采用此技术方案是可行的.     

基于单片机加压控制的PCD复合片真空扩散焊接

文章针对普通钎焊的聚晶金刚石钻头剪切强度不高，提出了采用单片机加压控制的PCD复合片真空扩散焊接的设计思想，在对原真空扩散焊机液压改造的基础上给出如何由单片机控制加压的电路和程序流程设计。实际应用表明，该技术经济实用，有较好的经济效益。     

金刚石膜在真空电子器件输出窗中的应用

综述了金刚石膜的性能和制备方法，着重介绍丁国内外常用的封接工艺，讨论了该材料在mm波器件中的应用前景。     

原油常减压装置节能技术

由于常减压装置消耗能量约占炼油厂总用能的25％～30％，已成为炼油厂中消耗量最大的装置，因此，我国各炼油厂对常减压装置进行以降低能耗为中心的技术改造就显得十分必要。详细介绍了适用于常减压装置节能的新工艺、新设备以及优化操作。工艺方面主要有采用过滤脱盐新技术对原油进行深度脱盐、采用强化蒸馏新工艺提高原油蒸馏拔出率、优化产出、增产柴油；设备方面主要使用规整填料和新型塔板改善分馏塔分馏效率、使用新型燃烧器提高加热炉效率、使用新型换热器提高热回收率、采用变频技术降低装置电耗；优化操作方面主要有利用计算机进行监控与管理和改善操作条件。最后对国内原油常减压装置节能改造提出了一些建议，以供炼油企业在进行原油常减压装置改造时参考。     

Evaluation of Atmospheric and Vacuum Residues Using Molecular Distillation and Optimization

The term atmospheric residue describes the material at the bottom of the atmospheric distillation tower having a lower boiling point limit of about 340°C; the term vacuum residue (heavy petroleum fractions) refers to the bottom of the vacuum distillation, which has an atmospheric equivalent boiling point (AEBP) above 540°C. In this work, the objective is to evaluate the behavior of different kinds of Brazilian atmospheric and vacuum residues using molecular distillation. The Falling Film Molecular Distillator was used. For the results obtained through this process, a significant range of temperature can be explored avoiding the thermal decomposition of the material. So these results are very important to the refinery decisions and improvements. The Experimental Factorial Design results showed that the temperature has more influence on the process than the feed flow rate, when a higher percentage of distillate is required.     

小型低温真空光学实验装置设计

为适应未来遥感光学系统研究的需要,研制了一套低温真空实验装置.该实验装置包括低温真空腔体、真空抽气系统、ZYGO干涉仪和防震平台以及监控测温系统.其中的低温真空腔体是针对小型光学元件实验设计的,主要用于测量光学元件的温度场和低温变形,并且把电机产生的局部热量尽可能导出系统.文中还对真空低温腔的关键部件光学窗口和梯形支撑的设计进行了详细分析.     

罗茨真空泵主轴输入端动密封问题探讨

分析了罗茨真空泵轴封漏油的原因，介绍了提高轴封有效性的措施。