基于经验数据的温室内的温湿度过程控制系统

针对温室内的温湿度过程控制中参数人工设定的困难和参数自设定的必要性,提出了一种新颖的基于经验数据的适用于温室内的温湿度过程控制系统.该系统硬件采用新型的数字式温湿度一体化传感器LTM8901.温湿度过程控制系统采用具有大容量Flash存储器的C8051F023微控制器,它可在1年时间内以小时为单位设定经验温湿度值,用于控制并记录实测值,实现在1年时间内完全自动控制,无须操作人员干预.具有数据可靠、安装简单、使用和维修方便的特点.     

Immunoelectron localization of mitochondrial F1 factor in cryosections of heart muscle cells

Immunocytochemistry was used to investigate the localization of F1 ATPase in mitochondria of cryosections of adult mouse heart muscle cells. The initial aldehyde fixation was the only denaturation step for antigens. The fine structure was preserved with contrast enhancement as the sections were maintained hydrated, with the advantage that the entire procedure is completed in one working day. The reaction was highly specific, and entire mitochondria were labeled with the Protein A-gold complex. A new analytical technique, electron spectroscopic imaging (ESI), contributed to a better visualization of the localization of the F1 factor.     

SD2300在新型TMS320F28x DSP实时监测系统中的应用

SD2300是兴威帆电子公司生产的一种新型高精度实时时钟芯片。TMS320F2812是TI公司最新推出的DSP芯片，该芯片广泛地运用于测控和控制场合。文中给出了基于SD2300和TMS320F2812的时钟输入、低功耗“软件时间锁”的硬件和软件设计方法。     

Measurements ofPVTx properties of refrigerant mixture HFC-32+HFC-125 in the gaseous phase

The experimental 156PVTx properties of an important binary refrigerant mixture, HFC-32 (difluoromethane)+HFC-125 (pentafluorethane), have been measured for three compositions, i.e., 50, 60, and 80 wt% HFC-32, by a constant-mass-method coupled with expansion procedure in an extensive range of temperaturesT from 320 to 440 K, of pressuresP from 1.8 to 5.3 M Pa, and of densities p from 50 to 124 kg · m^–3. The experimental uncertainties of the present measurements are estimated to be within ±7 mK in temperature, ±2 kPa in pressure, ±0.2% in density and ±0.02 wt% of HFC-32. The sample purities are 99.998 wt% for HFC-32 and 99.99 wt% for HFC-125. Seventy-eight second and third virial coeflicients for temperatures from 320 to 440 K have been determined by the present measurements.Paper presented at the Twelfth Symposium on Thermophysical Properties, June 19–24, 1994, Boulder, Colorado, U.S.A.     

TMS320 F206定点DSP芯片开发实践

以TMS320F206为例,着重探讨了DSP系统开发过程中的硬件设计与调试、软件设计中的流水线冲突、等待状态设置以及如何利用闪速存储器等相关问题.     

Immobilization of inert TRISO-coated fuel in glass for geological disposal

Vitrification of TRISO-coated gas reactor fuel particles was achieved via two methods: glass melting and sintering. Inert TRISO-coated fuel particles and a borosilicate glass were used. With glass melting at 1200-1300 °C floatation and decomposition of carbon and silicon carbide occurred. Thermal pre-treatment of the particles for oxidation of pyrocarbon did not improve the coating properties of the glass. During cooling most of the particles floated and sorbed on the crucible or mold walls. The sintered glass at 700 °C showed better coating properties of the TRISO-coated fuel particles despite higher porosity compared to glass made by melting. Aqueous leaching properties of glass with particles are similar regardless the mode of fabrication, indicating the good chemical durability of the sintered glass. Sintered glasses may constitute a good technique for TRISO-coated fuel particles immobilization for an eventual deep geological disposal.     

包钢选矿厂降低铁精矿中氟含量的技术攻关

为了降低铁精矿氟含量,通过采取控制磨矿粒度、改进浮选工艺、采用高效捕收剂等措施,使包钢选矿厂铁精矿氟含量由1999年的0.75%降低到2000年的0.65%、2001年的0.58%,为包钢环保工作目标的完成做出了突出贡献.     

Oxygen glow discharge experiment to remove deposited layers and to release trapped hydrogen isotopes in HT-7 superconducting tokamak

An experiment to remove re-deposited layers and to release hydrogen using a glow discharge in oxygen (O-GDC) has been performed in the HT-7 superconducting tokamak. In the absence of magnetic fields, the O-GDC wall conditioning had produced rapid, controlled co-deposit removal. Average removal rates, 5.2 × 10²² H-atoms/h, 5.65 × 10²¹ D-atoms/h and 5.53 × 10²² C-atoms/h, respectively, were obtained during 145 min O-GDC experiment in the pressure range 0.5-1.5 Pa. The corresponding removal rate of co-deposited films was ∼1.19 μm/day (26.5 g/day for carbon) based on an area of 12 m². Compared to thermo-oxidation and O-ICR experiment, high pressure O-GDC wall conditioning promoted the oxidation and improved the C and D atoms removal. In the O-GDC experiment, the removal rates of H-atoms and D-atoms as H₂O, HDO and D₂O were higher than that of H₂ and D₂ by factors of about 20 and 50, respectively. During the 145 min O-GDC experiment, about 14.5% O-atoms were converted into carbon oxides and hydroxides, and about 5.37 × 10²² O-atoms were adsorbed on the walls corresponding to a coverage of 4.5 × 10²¹ O/m² on an wall area of 12 m². In a 100 min helium glow discharge (He-GDC) following the O-GDC experiment, 1.53 × 10²² O-atoms, about 28.5% oxygen retained on the walls, were removed. The removal rate of H-atoms in He-GDC cleaning after O-GDC experiment was lower than that in He-GDC cleaning before O-GDC experiment, which indicates that the O-GDC wall conditioning had effectively reduced hydrogen retention on the walls.     

Influence of growth rate on the structural and morphological properties of TiN, ZrN and TiN/ZrN multilayers

The effect of the deposition rate on the structural and morphological properties of TiN and ZrN single layers and TiN/ZrN multilayers deposited by radiofrequency reactive magnetron sputtering has been studied. The total pressure was kept constant and the growth rate variation was obtained by small difference of nitrogen concentration in the fed gas. The decreasing deposition rate results in a structural change in the thin films from (111) orientation to (100) one. As consequence the surface morphology becomes smoother. Films roughness is strongly related with texture and it decreases with an increase in the (100) X-ray diffraction line intensity. In order to achieve a clear interpretation of our experimental results, the ratio between the N⁺ ions of the plasma and the atoms number reaching the substrate was considered. At high deposition rate with respect to the N⁺ concentration, the chemical potential of transition metal on (100) growth surface is higher than (111) one favouring the (111) orientation of the films. On the contrary, when the growth rate is low with respect to the nitrogen concentration, the chemical potential of transition metal on (111) growth surface is higher than the (100) one leading to a preferential growth in the (100) direction.     

源气体流量比对F-DLC薄膜结构的影响

以高纯石墨作靶，CHF3/Ar作源气体采用反应磁控溅射法制备出了氟化类金刚石（F-DLC）薄膜。拉曼光谱表明，CHF3相对流量的增加会引起薄膜的D峰与G峰强度之比I（D）/I（G）减小，晶粒增大，芳香环结构出例下降。红外吸收光谱分析证实了这些推论，指出这是由于薄膜中氟含量上升的结果。