Material properties and growth control of undoped and Sn-doped In2O3 thin films prepared by using ion beam technologies

Undoped (IO) and Sn-doped In₂O₃ (ITO) films have been deposited on glass and polymer substrates by an advanced ion beam technologies including ion-assisted deposition (IAD), hybrid ion beam, ion beam sputter deposition (IBSD), and ion-assisted reaction (IAR). Physical and chemical properties of the oxide films and adhesion between films and substrates were improved significantly by these technologies. By using the IAD method, non-stoichiometry and microstructure of the films were controlled by changing assisted oxygen ion energy and arrival ratio of assisted oxygen ion to evaporated atoms. Relationships between structural and electrical properties in ITO films on glass substrates were intensively investigated by using the IBSD method with changing ion energy, reactive gas environment, and substrate temperature. Smooth-surface ITO films (R_rms ≤ 1 nm and R_p-v ≤ 10 nm) for organic light-emitting diodes were developed with a combination of deposition conditions with controlling microstructure of a seed layer on glass. IAR surface treatment enormously enhanced the adhesion of oxide films to polymer substrate. The different dependence of IO and ITO films' properties on the experimental parameters, such as ion energy and oxygen gas environment, will be intensively discussed.     

Electrochemical characteristics of silicon-metals coated graphites for anode materials of lithium secondary batteries

Four kinds of silicon-metals (Cu, Ni, Sn)-graphite composites for anode active materials of lithium secondary batteries were prepared by sequential employment of PECVD (Plasma enhance chemical vapor deposition) and RF(Radio-frequency)-magnetron sputtering method. The silicon-copper-graphite composite showed the highest reversible capacity and cyclability among the silicon-metal composite graphite samples prepared. The enhanced electrochemical performance of silicon-copper-graphite composite is attributed to the formation of copper silicide on the surface of graphite. The copper silicide plays an important role as a buffering layer against volume change of silicon during the intercalation/deintercalation due to the chemical bonding of silicon and copper, and has lower interfacial impedance than that of other silicon-metal-graphite composites which may lead to low irreversible capacity.     

Preparation of a sensor substrate using functionalized mesoporous silica on a gold film for surface plasmon resonance (SPR) spectroscopy

The use of surface plasmon resonance (SPR) spectroscopy has been applied to a wide variety of fields such as biosensors and surface analysis instruments. In general, a SPR substrate is prepared using self-assembled monolayer (SAM) method of organic molecules as receptor for the target on a layer of gold or silver. However, mesoporous inorganic materials such as SBA-15 have benefits as sensor substrate for SPR. Mesoporous silica has a large surface area which receptor molecule can be attached and has a rigid body which has an excellent stability in the extreme condition compared to organic sensing layer. We prepared an organic modified mesoporous silica and successfully immobilized it on a gold surface, in an attempt to use as a substrate for SPR spectroscopy. For the comparison of sensitivity of prepared substrate, Pt²⁺ detection was selected as a model system. Substrate prepared in this study exhibited the capability of selective sensing for Pt²⁺ ions.     

Electron beam evaporated carbon nanotube dispersed SnO2 thin film gas sensor

Carbon nanotube (CNT) is a useful material for gas-sensing applications because of its high surface to volume ratio structure. In this work, multi-wall CNTs are incorporated into tin oxide thin film by means of powder mixing and electron beam evaporation and the enhancement of gas-sensing properties is presented. The CNTs were combined with SnO₂powder with varying concentration in the range of 0.25–5% by weight and electron beam evaporated onto glass substrates. From AFM and TEM characterization, CNT inclusion in SnO₂thin film results in the production of circular cone protrusions of CNT clusters or single tube coated with SnO₂layer. Experimental results indicate that the sensitivity to ethanol of SnO₂thin film increases by the factors of 3 to 7, and the response time and recovery time were reduced by the factors of 2 or more with CNT inclusion. However, if the CNT concentration is too high, the sensitivity is decreased. Moreover, the CNT doped film can operate with good sensitivity and stability at a relatively low temperature of 250–300^∘C. The improved gas-sensing properties should be attributed to the increasing of surface adsorption area of metal oxide produced by CNT protrusion.     

高压脉冲电子束在模具表面处理中的应用

模具的表面处理在模具加工中具有十分重要的地位,而电子束加工技术正是一种完全不同于传统机械加工的新的模具表面处理工艺.介绍了电子束技术在国内外的发展现状,概述了脉冲电子枪的加工特点及工作原理,以及该技术在模具表面精密加工中的应用以及工作台的设计思路.     

硫酸盐长期侵蚀下混凝土受弯构件受力性能试验

通过硫酸盐介质环境中长期工作混凝土构件受弯试验和混凝土材料性能试验,指出在某些情况下受硫酸盐侵蚀混凝土受弯构件可会有更好的抗裂性能。     

锂离子电池正极材料LiFePO4的合成及其改性

采用共沉淀法合成了锂离子正极材料LiFePO4,考察了不同合成条件对材料结构及性能的影响.研究结果表明:通过碳包覆改性后,LiFePO4的容量可明显提高,SiO2的掺杂对LiFePO4的结构没有影响.同时讨论了上述两种改性方法对材料性能的影响机制.     

纳滤法处理电厂离子交换树脂再生废水的研究

采用纳滤法处理电厂离子交换树脂再生废水,试验结果表明:废水中绝大部分有机污染物的分子量小于1 000,且含有的大量C l-;以出水的TOC浓度来评价纳滤试验的处理效果比CODC r值更合理,采用纳滤法处理废水,出水的TOC浓度将稳定在14~18 mg/L范围内,达到废水的处理要求.     

电弧离子镀制备TiAlN膜工艺研究

采用阴极电弧离子镀技术在1Cr18Ni9Ti不锈钢基材上制备TiAlN膜层,镀膜装置为俄罗斯科学院UVN 0.5D2I电弧离子镀膜机,该设备由一个大功率的气体离子源和两个金属蒸发源组成.气体离子源具有气体离子轰击和辅助沉积的特点.研究了电弧电流、负偏压和气体离子源功率等工艺参数对膜层的影响规律.实验结果表明:气体离子源具有明显的细化金属颗粒的作用.提出了制备TiAlN膜层的最佳工艺,得到了厚度为5 ～10μm、相结构为Ti0.5Al0.5N、显微硬度为1200HV0.01的TiAlN膜层.     

强流脉冲碳离子束辐照钛合金表面的热效应数值模拟

建立了强流脉冲碳离子束辐照Ti6A l4V靶材的热传导理论模型,采用Msc.Marc有限元程序,对功率密度为1.4×107W/cm2的强流脉冲碳离子束辐照靶材时产生的热效应进行了数值计算,确定了辐照后靶材表面温度场,得到了温度梯度和温度变化速率的变化规律,并进行了实验验证.