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81.
Mott–Schottky and photoelectrochemical measurements were used to explore the effects of hydrogen and chloride ions on the electronic properties of the passive film on X70 micro-alloyed steel in a solution of 0.5 M NaHCO3. Mott–Schottky analyses have shown that hydrogen increases the capacitance and donor density, and decreases the flat band potential and the space charge layer thickness of the passive film. The photocurrent of the film is remarkably increased by hydrogen. The effects of hydrogen become more pronounced with an increase in the hydrogen charging current densities. Hydrogen has no noticeable effect on the band gap energy Eg and the process by which hole-electron pairs are photo-generated in the film. The presence of chloride ions in the solution produces some similar effects on the electronic properties of the passive film to those observed with hydrogen, but reduces the photocurrent and increases the band gap energy of the film. No significant synergistic effects on the electronic properties of the passive film were observed in the presence of hydrogen and Cl−. These results provide very useful information for elucidating the mechanism by which hydrogen changes the properties of passive film and then promotes localized corrosion. 相似文献
82.
Toshiharu Makino Hiromitsu Kato Sung-Gi Ri Yigang Chen Hideyo Okushi 《Diamond and Related Materials》2005,14(11-12):1995
Electrical properties of homoepitaxial diamond p–n+ junction of boron (B)-doped p-type layer and phosphorus-doped n-type layer on Ib (111) diamond single crystal have been characterized. Current–voltage characteristics show a clear rectifying property with rectification ratio of over 105 at ± 10 V. From capacitance–voltage characteristics, it is found that a spatial distribution of space-charge density Ni of the p–n+ junction is not uniform and Ni at a middle region of the space-charge layer formed at zero bias voltage is higher than that of other region of the space-charge layer. This peculiar characteristic can be explained by superposition of two effects; one is the deep dopant effect due to B atoms in the p-type layer, which makes to reduce Ni at around the edge of the space-charge layer formed at zero bias voltage. The other is the compensation of B acceptors by impurity atoms diffusing during the p–n+ interface and incorporating during the growth of p-type layer, which makes to reduce Ni at the vicinity of the p–n+ interface. 相似文献
83.
籼米淀粉超微粉体的制备及其性质 总被引:3,自引:0,他引:3
研究了籼米淀粉超微粉体的一种新的制备方法 ,通过正交实验确定了酶处理淀粉的最佳条件 ,考察了淀粉的溶解度和膨润力。结果表明 ,酶处理淀粉的最佳工艺参数为 :水解温度45℃ ,时间为25h ,酶用量为水解淀粉的45%。随着粒径的减小 ,淀粉的溶解度增大 ,膨润力下降。 相似文献
84.
本文综术了集成电路工艺的Cu布线中Cu薄膜化学气相沉积(CVD)的研究背景,详细介绍了CVD生长Cu金属薄膜的国内外研究进展及CVD对前趋物的要求,并对前趋物的一些物理、化学性质进行了总结,最后,对薄膜沉积的计算机摸拟作了简要介绍。 相似文献
85.
In this paper, we examine, both experimentally and theoretically, the kinetics of formation and microstructure of product
phases in thin film reactions, using the Nb/Al and Ti/Al systems as our prototypes. The results of calorimetry and microscopy
studies are interpreted using simple kinetic and morphology models. In particular, the kinetic models employed here focus
on the nucleation and growth components of the phase formation process and the morphology models provide a starting point
for the classification of product grain structures.
An erratum to this article is available at . 相似文献
86.
提出了溅射-气体-聚集共沉积制备金属/金属(介质)复合团簇镶嵌薄膜的新方法,并利用该方法成功地在方华膜衬底上制备了系列Fe/Ag及CaF2复合团簇镶嵌薄膜样品。透射电镜分析结果表明,样品中Fe(Cu)团簇都较好地镶嵌于Ag(CaF2)基质中,其结构为两种材料的多晶共存形态。进一步分析发现,与块材相比,Fe/Ag样品中Fe团簇晶格常数呈现出不同程度的收缩,而Cu/CaF2样品中Cu团簇晶格常数则呈现出不同程度的膨胀。运用附加压力的模型对该现象进行了解释。 相似文献
87.
88.
89.
薄膜干涉型光学全通滤波器的设计与分析 总被引:1,自引:0,他引:1
设计并分析了用于多信道色谱补偿的薄膜Gires-Tournois干涉仪(GTI)型光学全通滤波(OAPF),讨论了反射镜的膜层结构对器件 的群延迟谱和反射谱的影响,。以及大角度入射引起的偏分离现象和幅度畸变现象,给出了单级和多级串拉OAPF的初步设计结果。 相似文献
90.
A mathematical model of evaporation process from a laminar falling liquid film on a vertical plate of constant temperature is presented. The model is developed with and without interfacial shear stress due to the vapor flow at the liquid film surface. The vapor pressure drop, vapor exit velocity and cooling rate are calculated for different liquid mass flow values. It is shown that lower liquid mass flow produces higher cooling rate. The results also show that the interfacial shear stress has a considerable negative effect on the cooling rate. It is proved that there exists an optimum distance between the plates, which gives the maximum volumetric cooling rate. 相似文献